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ITMI20011120A1 - Wafer di silicio aventi distribuzione controllata di difetti, metodi di preparazione degli stessi, ed estrattori czochralski per la fabbrica - Google Patents

Wafer di silicio aventi distribuzione controllata di difetti, metodi di preparazione degli stessi, ed estrattori czochralski per la fabbrica Download PDF

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Publication number
ITMI20011120A1
ITMI20011120A1 IT2001MI001120A ITMI20011120A ITMI20011120A1 IT MI20011120 A1 ITMI20011120 A1 IT MI20011120A1 IT 2001MI001120 A IT2001MI001120 A IT 2001MI001120A IT MI20011120 A ITMI20011120 A IT MI20011120A IT MI20011120 A1 ITMI20011120 A1 IT MI20011120A1
Authority
IT
Italy
Prior art keywords
wafer
ingot
silicon
concentration
silicon wafer
Prior art date
Application number
IT2001MI001120A
Other languages
English (en)
Italian (it)
Inventor
Jea-Gun Park
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2000-0057344A external-priority patent/KR100378184B1/ko
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of ITMI20011120A0 publication Critical patent/ITMI20011120A0/it
Publication of ITMI20011120A1 publication Critical patent/ITMI20011120A1/it

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
IT2001MI001120A 2000-09-29 2001-05-25 Wafer di silicio aventi distribuzione controllata di difetti, metodi di preparazione degli stessi, ed estrattori czochralski per la fabbrica ITMI20011120A1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2000-0057344A KR100378184B1 (ko) 1999-11-13 2000-09-29 제어된 결함 분포를 갖는 실리콘 웨이퍼, 그의 제조공정및 단결정 실리콘 잉곳의 제조를 위한 초크랄스키 풀러

Publications (2)

Publication Number Publication Date
ITMI20011120A0 ITMI20011120A0 (it) 2001-05-25
ITMI20011120A1 true ITMI20011120A1 (it) 2002-11-25

Family

ID=36772732

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2001MI001120A ITMI20011120A1 (it) 2000-09-29 2001-05-25 Wafer di silicio aventi distribuzione controllata di difetti, metodi di preparazione degli stessi, ed estrattori czochralski per la fabbrica

Country Status (4)

Country Link
CN (2) CN1289720C (zh)
IT (1) ITMI20011120A1 (zh)
MY (1) MY131022A (zh)
SG (2) SG135030A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4853027B2 (ja) * 2006-01-17 2012-01-11 信越半導体株式会社 シリコン単結晶ウエーハの製造方法
TWI580825B (zh) * 2012-01-27 2017-05-01 Memc新加坡有限公司 藉由定向固化作用製備鑄態矽之方法
JP6100226B2 (ja) * 2014-11-26 2017-03-22 信越半導体株式会社 シリコン単結晶ウェーハの熱処理方法
KR101759876B1 (ko) * 2015-07-01 2017-07-31 주식회사 엘지실트론 웨이퍼 및 웨이퍼 결함 분석 방법
KR102626492B1 (ko) * 2016-11-14 2024-01-17 신에쓰 가가꾸 고교 가부시끼가이샤 고광전변환효율 태양전지의 제조 방법 및 고광전변환효율 태양전지

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63315589A (ja) * 1987-06-16 1988-12-23 Osaka Titanium Seizo Kk 単結晶製造装置
FI901414A0 (fi) * 1989-03-30 1990-03-21 Nippon Kokan Kk Anordning foer framstaellning av kiselenkristaller.
KR960006262B1 (ko) * 1990-03-20 1996-05-13 닛뽕 고오깡 가부시기가이샤 실리콘 단결정의 제조장치
US5401669A (en) * 1993-05-13 1995-03-28 Memc Electronic Materials, Spa Process for the preparation of silicon wafers having controlled distribution of oxygen precipitate nucleation centers
JPH0761889A (ja) * 1993-08-26 1995-03-07 Komatsu Electron Metals Co Ltd 半導体単結晶引き上げ装置および引き上げ方法
JPH1179889A (ja) * 1997-07-09 1999-03-23 Shin Etsu Handotai Co Ltd 結晶欠陥が少ないシリコン単結晶の製造方法、製造装置並びにこの方法、装置で製造されたシリコン単結晶とシリコンウエーハ
JP3992800B2 (ja) * 1997-09-22 2007-10-17 Sumco Techxiv株式会社 単結晶製造装置および単結晶の製造方法
JP4166316B2 (ja) * 1998-02-27 2008-10-15 Sumco Techxiv株式会社 単結晶製造装置
JP3670493B2 (ja) * 1998-10-09 2005-07-13 東芝セラミックス株式会社 単結晶引上装置
US6197111B1 (en) * 1999-02-26 2001-03-06 Memc Electronic Materials, Inc. Heat shield assembly for crystal puller
JP3709494B2 (ja) * 1999-02-26 2005-10-26 株式会社Sumco シリコン単結晶引上げ装置の熱遮蔽部材

Also Published As

Publication number Publication date
SG108822A1 (en) 2005-02-28
CN1345986A (zh) 2002-04-24
ITMI20011120A0 (it) 2001-05-25
CN1782140A (zh) 2006-06-07
MY131022A (en) 2007-07-31
SG135030A1 (en) 2007-09-28
CN100430531C (zh) 2008-11-05
CN1289720C (zh) 2006-12-13

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