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IT992983B - Metodo per asportare materiale fotoresistente da un supporto - Google Patents

Metodo per asportare materiale fotoresistente da un supporto

Info

Publication number
IT992983B
IT992983B IT27905/73A IT2790573A IT992983B IT 992983 B IT992983 B IT 992983B IT 27905/73 A IT27905/73 A IT 27905/73A IT 2790573 A IT2790573 A IT 2790573A IT 992983 B IT992983 B IT 992983B
Authority
IT
Italy
Prior art keywords
support
photoresistant material
photoresistant
removing photoresistant
Prior art date
Application number
IT27905/73A
Other languages
English (en)
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Application granted granted Critical
Publication of IT992983B publication Critical patent/IT992983B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
IT27905/73A 1972-08-18 1973-08-14 Metodo per asportare materiale fotoresistente da un supporto IT992983B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US28176472A 1972-08-18 1972-08-18

Publications (1)

Publication Number Publication Date
IT992983B true IT992983B (it) 1975-09-30

Family

ID=23078694

Family Applications (1)

Application Number Title Priority Date Filing Date
IT27905/73A IT992983B (it) 1972-08-18 1973-08-14 Metodo per asportare materiale fotoresistente da un supporto

Country Status (5)

Country Link
JP (1) JPS5815939B2 (it)
DE (1) DE2341216C2 (it)
FR (1) FR2196611A5 (it)
GB (1) GB1408067A (it)
IT (1) IT992983B (it)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4341592A (en) * 1975-08-04 1982-07-27 Texas Instruments Incorporated Method for removing photoresist layer from substrate by ozone treatment
JPS5856340A (ja) * 1981-09-30 1983-04-04 Toshiba Corp 半導体ウエハ浄化方法
GB2118028B (en) * 1982-04-05 1985-12-18 Maxwell Lab Inc Decontaminating surfaces
JPH0612766B2 (ja) * 1983-03-04 1994-02-16 株式会社精密エンタプライズ 光照射装置
JPS6039239U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6039240U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6039238U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6049630A (ja) * 1983-08-29 1985-03-18 Fujitsu Ltd 半導体装置の製造方法
JPS6053029A (ja) * 1983-09-02 1985-03-26 Ushio Inc 紫外線洗浄装置
JPS6127635A (ja) * 1984-07-17 1986-02-07 Samuko Internatl Kenkyusho:Kk フオトレジストの高能率乾式除去装置
JPS6153335A (ja) * 1984-08-22 1986-03-17 Tohoku Richo Kk プラスチツクのドライエツチング法
JPS6177852A (ja) * 1984-09-26 1986-04-21 Fujitsu Ltd パターン形成方法
JPH0622220B2 (ja) * 1984-11-19 1994-03-23 富士通株式会社 レジスト灰化方法
JPS61163342A (ja) * 1985-01-14 1986-07-24 Ricoh Co Ltd フオトレジスト除去方法
JPH0810690B2 (ja) * 1987-01-29 1996-01-31 東京エレクトロン株式会社 アッシング方法及びアッシング装置
US4923486A (en) * 1988-12-22 1990-05-08 University Of Dayton Gas chromatography methods and apparatus
US5028243A (en) * 1988-12-22 1991-07-02 University Of Dayton Gas chromatography methods and apparatus
US5068040A (en) * 1989-04-03 1991-11-26 Hughes Aircraft Company Dense phase gas photochemical process for substrate treatment
DE4113523A1 (de) * 1991-04-25 1992-10-29 Abb Patent Gmbh Verfahren zur behandlung von oberflaechen
JPH05109674A (ja) * 1991-10-18 1993-04-30 Ushio Inc レジスト膜の灰化方法と灰化装置
DE4202158C1 (it) * 1992-01-27 1993-07-22 Siemens Ag, 8000 Muenchen, De
US5417826A (en) * 1992-06-15 1995-05-23 Micron Technology, Inc. Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443373A (en) * 1943-08-20 1948-06-15 Victor N Borsoff Method of removing carbon and carbonaceous matter
US3664899A (en) * 1969-12-29 1972-05-23 Gen Electric Removal of organic polymeric films from a substrate

Also Published As

Publication number Publication date
GB1408067A (en) 1975-10-01
DE2341216A1 (de) 1974-02-28
DE2341216C2 (de) 1985-11-07
JPS5815939B2 (ja) 1983-03-28
FR2196611A5 (it) 1974-03-15
JPS503958A (it) 1975-01-16

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