IT1198454B - Sostrato monocristallino di silicio ad alto contenuto di ossigeno per dispositivi semiconduttori e procedimento per produrlo - Google Patents

Sostrato monocristallino di silicio ad alto contenuto di ossigeno per dispositivi semiconduttori e procedimento per produrlo

Info

Publication number: IT1198454B
Authority: IT; Italy
Prior art keywords: procedure; produce; silicon substrate; oxygen content; monocrystalline silicon
Prior art date: 1985-10-31

Application number

IT48592/86A

Other languages

English (en)

Other versions

IT8648592A0 (it

Inventor

Toshihiko Suzuki

Yasaburo Kato

Motonobu Fhtagami

Original Assignee

Sony Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-10-31

Filing date

1986-10-28

Publication date

1988-12-21

1986-10-28 Application filed by Sony Corp filed Critical Sony Corp

1986-10-28 Publication of IT8648592A0 publication Critical patent/IT8648592A0/it

1988-12-21 Application granted granted Critical

1988-12-21 Publication of IT1198454B publication Critical patent/IT1198454B/it

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Crystallography & Structural Chemistry (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Condensed Matter Physics & Semiconductors (AREA)
General Physics & Mathematics (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Crystals, And After-Treatments Of Crystals (AREA)
Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

IT48592/86A 1985-10-31 1986-10-28 Sostrato monocristallino di silicio ad alto contenuto di ossigeno per dispositivi semiconduttori e procedimento per produrlo IT1198454B (it)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP60244562A JPS62105998A (ja)	1985-10-31	1985-10-31	シリコン基板の製法

Publications (2)

Publication Number	Publication Date
IT8648592A0 IT8648592A0 (it)	1986-10-28
IT1198454B true IT1198454B (it)	1988-12-21

Family

ID=17120560

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IT48592/86A IT1198454B (it)	1985-10-31	1986-10-28	Sostrato monocristallino di silicio ad alto contenuto di ossigeno per dispositivi semiconduttori e procedimento per produrlo

Country Status (14)

Country	Link
JP (1)	JPS62105998A (it)
KR (1)	KR870004498A (it)
CN (1)	CN1016191B (it)
AT (1)	ATA289086A (it)
AU (1)	AU597599B2 (it)
CA (1)	CA1336061C (it)
DE (1)	DE3637006A1 (it)
DK (1)	DK518486A (it)
FR (1)	FR2589489B1 (it)
GB (1)	GB2182262B (it)
IT (1)	IT1198454B (it)
MY (1)	MY100449A (it)
NL (1)	NL8602738A (it)
SE (1)	SE8604627L (it)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5196085A (en) *	1990-12-28	1993-03-23	Massachusetts Institute Of Technology	Active magnetic flow control in Czochralski systems
JP2613498B2 (ja) *	1991-03-15	1997-05-28	信越半導体株式会社	Ｓｉ単結晶ウエーハの熱処理方法
JPH07247197A (ja) *	1994-03-09	1995-09-26	Fujitsu Ltd	半導体装置とその製造方法
JP3443822B2 (ja) *	1996-03-27	2003-09-08	信越半導体株式会社	シリコン単結晶の製造方法
DE19711922A1 (de) *	1997-03-21	1998-09-24	Wacker Siltronic Halbleitermat	Vorrichtung und Verfahren zum Ziehen eines Einkristalls
CN100547122C (zh)	1997-04-09	2009-10-07	Memc电子材料有限公司	缺陷密度低，空位占优势的硅
KR20040102230A (ko)	1997-04-09	2004-12-03	엠이엠씨 일렉트로닉 머티리얼즈 인코포레이티드	저결함밀도, 이상적 산소침전 실리콘
US6379642B1 (en)	1997-04-09	2002-04-30	Memc Electronic Materials, Inc.	Vacancy dominated, defect-free silicon
JPH11268987A (ja) *	1998-03-20	1999-10-05	Shin Etsu Handotai Co Ltd	シリコン単結晶およびその製造方法
CN1326518A (zh)	1998-06-26	2001-12-12	Memc电子材料有限公司	任意大直径无缺陷硅晶体的生长方法
US6236104B1 (en)	1998-09-02	2001-05-22	Memc Electronic Materials, Inc.	Silicon on insulator structure from low defect density single crystal silicon
WO2000022197A1 (en)	1998-10-14	2000-04-20	Memc Electronic Materials, Inc.	Epitaxial silicon wafers substantially free of grown-in defects
US6312516B2 (en)	1998-10-14	2001-11-06	Memc Electronic Materials, Inc.	Process for preparing defect free silicon crystals which allows for variability in process conditions
DE69908965T2 (de)	1998-10-14	2004-05-13	Memc Electronic Materials, Inc.	Wärmegetempertes einkristallines silizium mit niedriger fehlerdichte
US7105050B2 (en)	2000-11-03	2006-09-12	Memc Electronic Materials, Inc.	Method for the production of low defect density silicon
US6858307B2 (en)	2000-11-03	2005-02-22	Memc Electronic Materials, Inc.	Method for the production of low defect density silicon
US6846539B2 (en)	2001-01-26	2005-01-25	Memc Electronic Materials, Inc.	Low defect density silicon having a vacancy-dominated core substantially free of oxidation induced stacking faults
DE10103691A1 (de) *	2001-01-26	2002-08-08	Crystal Growing Systems Gmbh	Elektrische Energieversorgung für eine elektrische Heizung
US8216362B2 (en)	2006-05-19	2012-07-10	Memc Electronic Materials, Inc.	Controlling agglomerated point defect and oxygen cluster formation induced by the lateral surface of a silicon single crystal during CZ growth
JP5974978B2 (ja)	2013-05-29	2016-08-23	信越半導体株式会社	シリコン単結晶製造方法
CN105780113B (zh) *	2016-03-10	2017-11-28	江西赛维Ldk太阳能高科技有限公司	一种表征晶体硅生长界面和生长速度的方法
CN112095154B (zh) *	2019-06-18	2021-05-14	上海新昇半导体科技有限公司	一种半导体晶体生长装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5556098A (en) *	1978-10-17	1980-04-24	Chiyou Lsi Gijutsu Kenkyu Kumiai	Method and apparatus for producing si single crystal rod
EP0042901B1 (fr) *	1980-06-26	1984-10-31	International Business Machines Corporation	Procédé pour contrôler la teneur en oxygène des barreaux de silicium tirés selon la méthode de Czochralski
GB2084046B (en) *	1980-08-27	1984-07-25	Secr Defence	Method and apparatus for crystal growth
EP0055619B1 (en) *	1980-12-29	1985-05-29	Monsanto Company	Method for regulating concentration and distribution of oxygen in czochralski grown silicon
NL8102102A (nl) *	1981-04-29	1982-11-16	Philips Nv	Werkwijze voor het optrekken van een siliciumstaaf en halfgeleiderinrichting vervaardigd uit de siliciumstaaf.
JPH0244799B2 (ja) *	1981-10-26	1990-10-05	Sony Corp	Ketsushoseichohoho
US4511428A (en) *	1982-07-09	1985-04-16	International Business Machines Corporation	Method of controlling oxygen content and distribution in grown silicon crystals
JPS6027684A (ja) *	1983-07-26	1985-02-12	Fujitsu Ltd	単結晶製造装置
JPS6033289A (ja) *	1983-07-29	1985-02-20	Toshiba Corp	シリコン単結晶の製造方法
JPS6094722A (ja) *	1983-08-16	1985-05-27	インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション	シリコン・ウエハ
JPS6153187A (ja) *	1984-08-24	1986-03-17	Sony Corp	単結晶成長装置
IT1207497B (it) *	1985-05-29	1989-05-25	Montedison Spa	Monocristalli di arseniuro di gallio a bassa densita' di dislocazioni e di elevata purezza.

1985
- 1985-10-31 JP JP60244562A patent/JPS62105998A/ja active Pending
1986
- 1986-08-25 KR KR1019860007019A patent/KR870004498A/ko not_active Application Discontinuation
- 1986-10-16 CA CA000520610A patent/CA1336061C/en not_active Expired - Fee Related
- 1986-10-28 IT IT48592/86A patent/IT1198454B/it active
- 1986-10-29 FR FR868615075A patent/FR2589489B1/fr not_active Expired - Fee Related
- 1986-10-30 AU AU64550/86A patent/AU597599B2/en not_active Ceased
- 1986-10-30 DK DK518486A patent/DK518486A/da not_active Application Discontinuation
- 1986-10-30 DE DE19863637006 patent/DE3637006A1/de not_active Ceased
- 1986-10-30 SE SE8604627A patent/SE8604627L/ not_active Application Discontinuation
- 1986-10-30 NL NL8602738A patent/NL8602738A/nl not_active Application Discontinuation
- 1986-10-30 AT AT0289086A patent/ATA289086A/de not_active Application Discontinuation
- 1986-10-31 MY MYPI86000057A patent/MY100449A/en unknown
- 1986-10-31 CN CN86106346A patent/CN1016191B/zh not_active Expired
- 1986-10-31 GB GB8626074A patent/GB2182262B/en not_active Expired

Also Published As

Publication number	Publication date
AU597599B2 (en)	1990-06-07
JPS62105998A (ja)	1987-05-16
IT8648592A0 (it)	1986-10-28
DK518486A (da)	1987-05-01
CN1016191B (zh)	1992-04-08
DE3637006A1 (de)	1987-05-07
FR2589489A1 (fr)	1987-05-07
MY100449A (en)	1990-10-15
ATA289086A (de)	1996-01-15
CN86106346A (zh)	1987-06-17
CA1336061C (en)	1995-06-27
SE8604627L (sv)	1987-05-01
GB2182262B (en)	1989-09-27
GB2182262A (en)	1987-05-13
FR2589489B1 (fr)	1994-06-10
AU6455086A (en)	1987-05-07
DK518486D0 (da)	1986-10-30
SE8604627D0 (sv)	1986-10-30
GB8626074D0 (en)	1986-12-03
KR870004498A (ko)	1987-05-09
NL8602738A (nl)	1987-05-18

Publication	Publication Date	Title
IT1198454B (it)	1988-12-21	Sostrato monocristallino di silicio ad alto contenuto di ossigeno per dispositivi semiconduttori e procedimento per produrlo
KR870004526A (ko)	1987-05-11	실리콘 온 인슐레이터 구조를 갖는 반도체 장치
EP0207216A3 (en)	1988-11-30	Semiconductor device of the soi-type
DE3856475D1 (de)	2001-07-12	Monokristallines Dünnschichtsubstrat
KR870000801A (ko)	1987-02-20	직렬 및 병렬회로 기술을 사용하여 동적범위를 변경시키기 위한 회로장치
FI863712L (fi)	1987-03-14	Pao kiseldioxid baserat armerande fyllnadsmedel foer elastomerer.
IT1188671B (it)	1988-01-20	Dispositivo di trasporto per pacchi di lastre di vetro di grandi dimensioni
GB2169650B (en)	1988-04-20	Substrate support of integral construction
KR860005454U (ko)	1986-06-11	기판의 지지 구조체
IT8622572A1 (it)	1988-06-04	Procedimento e dispositivo per produrre blocchi di foglietti autoadesivi
DK554486D0 (da)	1986-11-19	Substrat til kulturplante
KR880701692A (ko)	1988-11-04	질화 알루미늄 소결체 및 그 반도체 기판
DE3672911D1 (de)	1990-08-30	Aluminiumbegierung und daraus gefertigtes substrat fuer magnetplatte.
IT1181952B (it)	1987-09-30	Circuito integrato e metodo per polarizzare uno strato epitassiale
IT1197176B (it)	1988-11-30	Dispositivo per produrre neutroni termici
IT8619999A1 (it)	1987-10-07	Dispositivo per il trasporto di bottiglie
IT1163553B (it)	1987-04-08	Procedimento e dispositivo per produrre granulato di silicio di elevata purezza
KR860006828A (ko)	1986-09-15	고캐리어 농도를 갖는 화합물 반도체층 및 그의 제조방법
IT1184108B (it)	1987-10-22	Procedimento e dispositivo per incollare substrati
EP0198320A3 (en)	1987-12-02	Thin film transistor using polycrystalline silicon
KR870000580A (ko)	1987-02-19	기판온도 측정 방법 및 장치
IT8506614A0 (it)	1985-09-26	Dispositivo di potenza a semiconduttore, normalmente interdetto per al te tensioni e con ron modulata
IT206200Z2 (it)	1987-07-13	Dispositivo per il trasporto dilastre di vetro piane
GB8608218D0 (en)	1986-05-08	Polycrystalline silicon thin film
SE8602041D0 (sv)	1986-05-02	Anordning for hoghastighetsavsokning av dokument

Legal Events

Date	Code	Title	Description
1999-10-27	TA	Fee payment date (situation as of event date), data collected since 19931001	Effective date: 19961021