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HK1250792A1 - 光學積分器系統、照明光學裝置、曝光裝置和設備製造方法 - Google Patents

光學積分器系統、照明光學裝置、曝光裝置和設備製造方法

Info

Publication number
HK1250792A1
HK1250792A1 HK18110105.1A HK18110105A HK1250792A1 HK 1250792 A1 HK1250792 A1 HK 1250792A1 HK 18110105 A HK18110105 A HK 18110105A HK 1250792 A1 HK1250792 A1 HK 1250792A1
Authority
HK
Hong Kong
Prior art keywords
device manufacturing
optical
integrator system
exposure apparatus
illumination optical
Prior art date
Application number
HK18110105.1A
Other languages
English (en)
Inventor
Naonori Kita
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1250792A1 publication Critical patent/HK1250792A1/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
HK18110105.1A 2007-03-13 2018-08-06 光學積分器系統、照明光學裝置、曝光裝置和設備製造方法 HK1250792A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US90652007P 2007-03-13 2007-03-13
US12/068,818 US8587764B2 (en) 2007-03-13 2008-02-12 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method

Publications (1)

Publication Number Publication Date
HK1250792A1 true HK1250792A1 (zh) 2019-01-11

Family

ID=39762317

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18110105.1A HK1250792A1 (zh) 2007-03-13 2018-08-06 光學積分器系統、照明光學裝置、曝光裝置和設備製造方法

Country Status (7)

Country Link
US (1) US8587764B2 (zh)
EP (2) EP3301503A1 (zh)
JP (1) JP5392454B2 (zh)
KR (1) KR101493536B1 (zh)
HK (1) HK1250792A1 (zh)
TW (1) TWI515766B (zh)
WO (1) WO2008114836A1 (zh)

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DE102010030089A1 (de) * 2010-06-15 2011-12-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikro-Lithografie sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102010046133B4 (de) * 2010-09-13 2014-01-09 Klaus Becker Lichtbandgenerator
KR102040341B1 (ko) * 2011-08-04 2019-11-04 가부시키가이샤 니콘 조명 장치
JP6089603B2 (ja) * 2012-11-06 2017-03-08 岩崎電気株式会社 疑似太陽光照射装置
JP6715241B2 (ja) * 2014-06-06 2020-07-01 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系
CN116184681B (zh) * 2023-04-27 2023-08-04 成都莱普科技股份有限公司 二氧化碳激光的光束整形设备以及光束整形方法

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Also Published As

Publication number Publication date
TW200849331A (en) 2008-12-16
TWI515766B (zh) 2016-01-01
US8587764B2 (en) 2013-11-19
EP3301503A1 (en) 2018-04-04
WO2008114836A1 (en) 2008-09-25
JP2008227497A (ja) 2008-09-25
KR101493536B1 (ko) 2015-02-13
US20080225256A1 (en) 2008-09-18
JP5392454B2 (ja) 2014-01-22
EP2122407A1 (en) 2009-11-25
KR20090119825A (ko) 2009-11-20

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