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HK1066833A1 - Refractory metal plates with uniform texture and methods of making the same - Google Patents

Refractory metal plates with uniform texture and methods of making the same Download PDF

Info

Publication number
HK1066833A1
HK1066833A1 HK04109794A HK04109794A HK1066833A1 HK 1066833 A1 HK1066833 A1 HK 1066833A1 HK 04109794 A HK04109794 A HK 04109794A HK 04109794 A HK04109794 A HK 04109794A HK 1066833 A1 HK1066833 A1 HK 1066833A1
Authority
HK
Hong Kong
Prior art keywords
refractory metal
metal plate
thickness
tantalum
billet
Prior art date
Application number
HK04109794A
Other languages
English (en)
Chinese (zh)
Other versions
HK1066833B (en
Inventor
P．R．杰普森
H．乌伦胡特
P.库马尔
Original Assignee
H.C.施塔克公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23029400&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1066833(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by H.C.施塔克公司 filed Critical H.C.施塔克公司
Publication of HK1066833A1 publication Critical patent/HK1066833A1/xx
Publication of HK1066833B publication Critical patent/HK1066833B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Forging (AREA)
  • Powder Metallurgy (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Aerials With Secondary Devices (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Manufacture And Refinement Of Metals (AREA)
HK04109794.5A 2001-02-20 2002-02-20 Refractory metal plates with uniform texture and methods of making the same HK1066833B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26998301P 2001-02-20 2001-02-20
US60/269,983 2001-02-20
PCT/US2002/005033 WO2002070765A1 (en) 2001-02-20 2002-02-20 Refractory metal plates with uniform texture and methods of making the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
HK06109099.5A Division HK1088640A (en) 2001-02-20 2004-12-10 Refractory metal plates with uniform texture and methods of making the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
HK06109099.5A Addition HK1088640A (en) 2001-02-20 2004-12-10 Refractory metal plates with uniform texture and methods of making the same

Publications (2)

Publication Number Publication Date
HK1066833A1 true HK1066833A1 (en) 2005-04-01
HK1066833B HK1066833B (en) 2006-09-01

Family

ID=

Also Published As

Publication number Publication date
CZ20032246A3 (cs) 2004-03-17
JP4327460B2 (ja) 2009-09-09
HUP0303269A2 (hu) 2004-01-28
ZA200306399B (en) 2004-08-18
ATE339532T1 (de) 2006-10-15
WO2002070765A1 (en) 2002-09-12
IL157279A0 (en) 2004-02-19
ES2272707T3 (es) 2007-05-01
HUP0303269A3 (en) 2004-05-28
NZ527628A (en) 2004-07-30
CN1789476A (zh) 2006-06-21
MXPA03007490A (es) 2004-09-06
AU2002257005B2 (en) 2007-05-31
DE60214683D1 (de) 2006-10-26
KR100966682B1 (ko) 2010-06-29
BR0207384A (pt) 2004-02-10
CA2438819A1 (en) 2002-09-12
DE60214683T2 (de) 2007-09-13
KR20030090645A (ko) 2003-11-28
CN1238547C (zh) 2006-01-25
PT1366203E (pt) 2006-12-29
EP1366203B1 (en) 2006-09-13
JP2004526863A (ja) 2004-09-02
EP1366203A4 (en) 2004-07-28
CN1535322A (zh) 2004-10-06
EP1366203A1 (en) 2003-12-03
NO20033547L (no) 2003-09-26
NO20033547D0 (no) 2003-08-11
US20020112789A1 (en) 2002-08-22

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20100220