GB9611090D0 - Polishing apparatus and method for planarizing layer on a semiconductor wafer - Google Patents
Polishing apparatus and method for planarizing layer on a semiconductor waferInfo
- Publication number
- GB9611090D0 GB9611090D0 GBGB9611090.3A GB9611090A GB9611090D0 GB 9611090 D0 GB9611090 D0 GB 9611090D0 GB 9611090 A GB9611090 A GB 9611090A GB 9611090 D0 GB9611090 D0 GB 9611090D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- semiconductor wafer
- polishing apparatus
- planarizing layer
- planarizing
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title 1
- 238000005498 polishing Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13297892A JP3335667B2 (en) | 1992-05-26 | 1992-05-26 | Method for manufacturing semiconductor device |
JP25688992A JP3187554B2 (en) | 1992-09-25 | 1992-09-25 | Method for manufacturing semiconductor device |
JP28119492 | 1992-10-20 | ||
JP31917592 | 1992-11-30 | ||
JP4331945A JPH06181192A (en) | 1992-12-11 | 1992-12-11 | Fabrication of semiconductor device |
GB9326510A GB2275130B (en) | 1992-05-26 | 1993-05-26 | Polishing apparatus and method for planarizing layer on a semiconductor wafer |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9611090D0 true GB9611090D0 (en) | 1996-07-31 |
GB2298960A GB2298960A (en) | 1996-09-18 |
GB2298960B GB2298960B (en) | 1997-01-08 |
Family
ID=27547212
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9611070A Expired - Lifetime GB2299895B (en) | 1992-05-26 | 1993-05-26 | polishing apparatus for planarizing layer on a semiconductor wafer |
GB9611104A Expired - Lifetime GB2298961B (en) | 1992-05-26 | 1993-05-26 | Polishing apparatus for planarizing layer on a semiconductor wafer |
GB9611090A Expired - Lifetime GB2298960B (en) | 1992-05-26 | 1993-05-26 | Polishing apparatus and method for planarizing layer on a semiconductor wafer |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9611070A Expired - Lifetime GB2299895B (en) | 1992-05-26 | 1993-05-26 | polishing apparatus for planarizing layer on a semiconductor wafer |
GB9611104A Expired - Lifetime GB2298961B (en) | 1992-05-26 | 1993-05-26 | Polishing apparatus for planarizing layer on a semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
GB (3) | GB2299895B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6283828B1 (en) * | 1998-11-09 | 2001-09-04 | Tokyo Seimitsu Co., Ltd. | Wafer polishing apparatus |
KR20000077147A (en) * | 1999-05-03 | 2000-12-26 | 조셉 제이. 스위니 | Method for chemical mechanical planarization |
JP2002126998A (en) | 2000-10-26 | 2002-05-08 | Hitachi Ltd | Polishing method and polishing device |
JP2003124171A (en) * | 2001-10-19 | 2003-04-25 | Nec Corp | Method of polishing and polishing apparatus |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7114274A (en) * | 1970-10-21 | 1972-04-25 | ||
DE2531431C3 (en) * | 1975-07-14 | 1979-03-01 | Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen | Polishing agents for producing haze-free semiconductor surfaces |
US4671851A (en) * | 1985-10-28 | 1987-06-09 | International Business Machines Corporation | Method for removing protuberances at the surface of a semiconductor wafer using a chem-mech polishing technique |
US5036015A (en) * | 1990-09-24 | 1991-07-30 | Micron Technology, Inc. | Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers |
US5069002A (en) * | 1991-04-17 | 1991-12-03 | Micron Technology, Inc. | Apparatus for endpoint detection during mechanical planarization of semiconductor wafers |
US5320706A (en) * | 1991-10-15 | 1994-06-14 | Texas Instruments Incorporated | Removing slurry residue from semiconductor wafer planarization |
-
1993
- 1993-05-26 GB GB9611070A patent/GB2299895B/en not_active Expired - Lifetime
- 1993-05-26 GB GB9611104A patent/GB2298961B/en not_active Expired - Lifetime
- 1993-05-26 GB GB9611090A patent/GB2298960B/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB2299895B (en) | 1997-01-08 |
GB9611070D0 (en) | 1996-07-31 |
GB2298960A (en) | 1996-09-18 |
GB2298961B (en) | 1997-01-08 |
GB2298961A (en) | 1996-09-18 |
GB2299895A (en) | 1996-10-16 |
GB9611104D0 (en) | 1996-07-31 |
GB2298960B (en) | 1997-01-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Expiry date: 20130525 |