GB895879A - Improvements in and relating to the oxidation and/or transparency of thin partly oxidic layers - Google Patents
Improvements in and relating to the oxidation and/or transparency of thin partly oxidic layersInfo
- Publication number
- GB895879A GB895879A GB31384/59A GB3138459A GB895879A GB 895879 A GB895879 A GB 895879A GB 31384/59 A GB31384/59 A GB 31384/59A GB 3138459 A GB3138459 A GB 3138459A GB 895879 A GB895879 A GB 895879A
- Authority
- GB
- United Kingdom
- Prior art keywords
- transparency
- oxidation
- layer
- relating
- rare earth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A method of improving the oxidation and/or transparency of a thin, partly oxidic, layer on a carrier comprises adding a rare earth element or compound to the layer by cathode sputtering or decomposition from the vapour phase in vacuo. The rare earth may be mixed with the layer forming material, e.g. titanium, tin or silicon, before vaporization or the materials may be vaporized separately but simultaneously. The oxygen necessary for oxidising the film may be present as free oxygen under low partial pressure, in the form of water vapour desorbed from the walls of the vessel under reduced pressure, or may be obtained from air entering the vessel when the coating operation is complete. Specification 851,880 is referred to.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH895879X | 1958-10-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB895879A true GB895879A (en) | 1962-05-09 |
Family
ID=4546209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB31384/59A Expired GB895879A (en) | 1958-10-30 | 1959-09-15 | Improvements in and relating to the oxidation and/or transparency of thin partly oxidic layers |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB895879A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3418229A (en) * | 1965-06-30 | 1968-12-24 | Weston Instruments Inc | Method of forming films of compounds having at least two anions by cathode sputtering |
| US3420763A (en) * | 1966-05-06 | 1969-01-07 | Bell Telephone Labor Inc | Cathodic sputtering of films of stoichiometric zinc oxide |
| US3438885A (en) * | 1967-08-02 | 1969-04-15 | Northern Electric Co | Method of making ferrimagnetic films by cathodic sputtering |
| US4096026A (en) * | 1976-07-27 | 1978-06-20 | Toppan Printing Co., Ltd. | Method of manufacturing a chromium oxide film |
| WO1999029435A2 (en) * | 1997-12-04 | 1999-06-17 | Roche Diagnostics Gmbh | Modification of surfaces in order to increase surface tension |
-
1959
- 1959-09-15 GB GB31384/59A patent/GB895879A/en not_active Expired
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3418229A (en) * | 1965-06-30 | 1968-12-24 | Weston Instruments Inc | Method of forming films of compounds having at least two anions by cathode sputtering |
| US3420763A (en) * | 1966-05-06 | 1969-01-07 | Bell Telephone Labor Inc | Cathodic sputtering of films of stoichiometric zinc oxide |
| US3438885A (en) * | 1967-08-02 | 1969-04-15 | Northern Electric Co | Method of making ferrimagnetic films by cathodic sputtering |
| US4096026A (en) * | 1976-07-27 | 1978-06-20 | Toppan Printing Co., Ltd. | Method of manufacturing a chromium oxide film |
| WO1999029435A2 (en) * | 1997-12-04 | 1999-06-17 | Roche Diagnostics Gmbh | Modification of surfaces in order to increase surface tension |
| WO1999029435A3 (en) * | 1997-12-04 | 1999-07-22 | Roche Diagnostics Gmbh | Modification of surfaces in order to increase surface tension |
| US7025836B1 (en) | 1997-12-04 | 2006-04-11 | Roche Diagnostics Gmbh | Modification of surfaces in order to increase the surface tension |
| US8211245B2 (en) | 1997-12-04 | 2012-07-03 | Roche Diagnostics Operations, Inc. | Modification of surfaces to increase the surface tension |
| US8580049B2 (en) | 1997-12-04 | 2013-11-12 | Roche Diagnostics Gmbh | Modification of surfaces to increase the surface tension |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB978200A (en) | Improvements in pigment compositions | |
| GB916887A (en) | Improvements in or relating to the manufacture of semiconductor devices | |
| GB1117009A (en) | Improvements in and relating to depositing thin layers by vapour deposition or cathode sputtering | |
| GB895879A (en) | Improvements in and relating to the oxidation and/or transparency of thin partly oxidic layers | |
| GB1335782A (en) | Method for the production of blue-coloured layers permeable to light | |
| GB909658A (en) | Supported thin magnetic films | |
| JPS54130497A (en) | Production of indium oxide ( ) film | |
| GB1313635A (en) | Methods of providing films on solid bodies | |
| ES335297A1 (en) | Process for obtaining thin layers of a product by evaporation in vacuo | |
| GB1384109A (en) | Forming magnetic films on substrates | |
| JPS5210866A (en) | Process for production of compound thin film | |
| JPS5210872A (en) | Apparatus for production of compound thin films | |
| GB840803A (en) | A method of producing manganese of high purity | |
| JPS5216989A (en) | Process of semiconductor thin film | |
| GB1110946A (en) | Improvements in or relating to the deposition of epitaxial layers | |
| AU206949B2 (en) | Improvements in or relating to processes for coating luminescent screens with thin films of organic material | |
| JPS5565360A (en) | Metal coating forming method | |
| AU1687156A (en) | Improvements in or relating to processes for coating luminescent screens with thin films of organic material | |
| GB1436208A (en) | Method of producing films | |
| JPS5260993A (en) | Manufacturing of dieelctric thin film | |
| NL6917276A (en) | Prevention of scaling of coatings | |
| GB915568A (en) | Improvements in or relating to the formation of thin films | |
| GB966161A (en) | Improvements in or relating to coating objects with a metal oxide layer | |
| GB978049A (en) | Improvements in and relating to materials having a high dielectric constant | |
| GB858656A (en) | Treatment of uranium |