GB787076A - Improvements in or relating to gas plating - Google Patents
Improvements in or relating to gas platingInfo
- Publication number
- GB787076A GB787076A GB3014854A GB3014854A GB787076A GB 787076 A GB787076 A GB 787076A GB 3014854 A GB3014854 A GB 3014854A GB 3014854 A GB3014854 A GB 3014854A GB 787076 A GB787076 A GB 787076A
- Authority
- GB
- United Kingdom
- Prior art keywords
- carbonyl
- temperature
- compound
- metal
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
787,076. Coating with metals. COMMONWEALTH ENGINEERING CO. OF OHIO. Oct. 20, 1954, No. 30148/54. Class 82(2) An object is coated with metal by heating a thermally decomposable metal-bearing compound to a temperature sufficient to produce vapours of the compound but insufficient to cause its decomposition, separately heating a carrier gas to a temperature above that required to vaporize the compound but below the decomposition temperature of the compound, flowing the heated carrier gas into contact with the heated compound to produce a mixture thereof, and heating the mixture to a temperature below the decomposition temperature of the compound immediately prior to introducing the mixture into a coating zone which contains the object at a temperature high enough to cause decomposition of the metal-bearing compound. Compounds which may be employed are molybdenum carbonyl, tungsten carbonyl, cobalt carbonyl, nickel carbonyl, iron pentacarbonyl, antimony hydride, tin hydride, chromyl chloride, copper nitroxyl and cobalt nitroxyl carbonyl. The carrier gas may be carbon dioxide, nitrogen, helium or argon. As shown in Fig. 1, carbon dioxide from a source 10 is passed into a carburettor 4 containing chromium carbonyl maintained at a constant temperature by a thermostatically controlled oil bath 2, the carbon dioxide being preheated to the same temperature by circulation through the coil 7. The carbon dioxide charged with chromium carbonyl vapour passes through heating jacket 11 and thence into heated chamber 24 the interior of which is thus coated with chromium. In two modifications (i) the carburetter 4 is not enclosed by the coil 7 but is separated from it by a short length of connecting pipe which is also immersed in the oil (Fig; 3, not shown), and (ii) the gas mixture emanat-i ing from heating jacket 11 is passed; through a second coil maintained in a con- stant temperature oil bath, the gas mixture issuing from this coil passing through a second heating jacket before entering the < coating chamber (Fig. 4, not shown). Methods of packing the carburettor are described in which (a) layers of chromium - carbonyl are supported on metal screens which may be separated by layers of glass wool (Figs. 2 and 6, not shown), and (b) glass beads are interspersed with fragments of chromium carbonyl - (Fig. 5, not shown). When the metal-bearing compound is liquid, a carburettor is employed having perforated horizontal screens spaced along its vertical axis.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3014854A GB787076A (en) | 1954-10-20 | 1954-10-20 | Improvements in or relating to gas plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3014854A GB787076A (en) | 1954-10-20 | 1954-10-20 | Improvements in or relating to gas plating |
Publications (1)
Publication Number | Publication Date |
---|---|
GB787076A true GB787076A (en) | 1957-12-04 |
Family
ID=10303084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3014854A Expired GB787076A (en) | 1954-10-20 | 1954-10-20 | Improvements in or relating to gas plating |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB787076A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2210583A1 (en) * | 1972-12-15 | 1974-07-12 | Ppg Industries Inc | |
EP0323145A1 (en) * | 1987-12-24 | 1989-07-05 | MITSUI TOATSU CHEMICALS, Inc. | Equipment and method for supply of organic metal compound |
US5160542A (en) * | 1989-09-12 | 1992-11-03 | Stec Inc. | Apparatus for vaporizing and supplying organometal compounds |
US10141209B2 (en) * | 2014-02-28 | 2018-11-27 | Tokyo Electron Limited | Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium |
CN112969814A (en) * | 2018-11-14 | 2021-06-15 | Dnf有限公司 | Method for producing molybdenum-containing thin film and molybdenum-containing thin film produced by the method |
-
1954
- 1954-10-20 GB GB3014854A patent/GB787076A/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2210583A1 (en) * | 1972-12-15 | 1974-07-12 | Ppg Industries Inc | |
EP0323145A1 (en) * | 1987-12-24 | 1989-07-05 | MITSUI TOATSU CHEMICALS, Inc. | Equipment and method for supply of organic metal compound |
US5019423A (en) * | 1987-12-24 | 1991-05-28 | Mitsui Toatsu Chemicals, Inc. | Equipment and method for supply of organic metal compound |
US5160542A (en) * | 1989-09-12 | 1992-11-03 | Stec Inc. | Apparatus for vaporizing and supplying organometal compounds |
US10141209B2 (en) * | 2014-02-28 | 2018-11-27 | Tokyo Electron Limited | Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium |
CN112969814A (en) * | 2018-11-14 | 2021-06-15 | Dnf有限公司 | Method for producing molybdenum-containing thin film and molybdenum-containing thin film produced by the method |
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