[go: up one dir, main page]

GB767985A - Improvements in photomechanical processes and materials therefor - Google Patents

Improvements in photomechanical processes and materials therefor

Info

Publication number
GB767985A
GB767985A GB1948354A GB1948354A GB767985A GB 767985 A GB767985 A GB 767985A GB 1948354 A GB1948354 A GB 1948354A GB 1948354 A GB1948354 A GB 1948354A GB 767985 A GB767985 A GB 767985A
Authority
GB
United Kingdom
Prior art keywords
rubber
image
cyclicized
trichloroethylene
sensitizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1948354A
Inventor
Martin Hepher
Hans Max Wagner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE570732D priority Critical patent/BE570732A/xx
Priority to BE570791D priority patent/BE570791A/xx
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB1948354A priority patent/GB767985A/en
Priority to FR1139859D priority patent/FR1139859A/en
Publication of GB767985A publication Critical patent/GB767985A/en
Priority to GB2722857A priority patent/GB886100A/en
Priority to GB2805359A priority patent/GB892812A/en
Priority to FR773380A priority patent/FR74132E/en
Priority to FR74466D priority patent/FR74466E/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C8/00—Diffusion transfer processes or agents therefor; Photosensitive materials for such processes
    • G03C8/02—Photosensitive materials characterised by the image-forming section
    • G03C8/08—Photosensitive materials characterised by the image-forming section the substances transferred by diffusion consisting of organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

767,985. Light-sensitive coating composition for photomechanical procedure. KODAK, Ltd. July 1, 1955 [July 2, 1954], No. 19483/54. Class 98(2) For making an image suitable as etching resist or as the ink-accepting portion of a lithographic plate, the composition comprises an organic solvent soluble colloid sensitized with a water-insoluble aryl azide compound; and this may be coated on to a support as of metal, glass, film, paper carrying a hydrophilic layer or surface hydrolyzed cellulose ester sheet, imagewise exposed as usual and treated with a solvent to remove unexposed areas and leave the image. In Example 1 smoked rubber sensitized with 4, 4' - diazidostilbene in warm trichloroethylene is coated on to a copper sheet by pouring, or by whirling when toluene is included in the solvent, dried, exposed in contact with a line or halftone transparency to mercury vapour illumination and agitated in trichloroethylene to produce the image. In Exampdes 2-5 the rubber is replaced respectively by butadiene-acrylonitrile copolymer, butadiene - styrene copolymer, cyclicized rubber, and cyclicized rubber mixed with chlorinated rubber. Example 6 specifies 4, 4' - diazidobenzophenone as sensitizer. Examples 7 - 9 quote a condensation product of epichlorohydrin and diphenylolpropane, bitumen, and a condensation product of epichlorohydrin and bisphenol, as colloids with use of certain other solvents; and in Example 10 cyclicized rubber is used with 4, 4' - diazidodiphenylmethane as sensitizer. Specifications 533,630, 537,146 [both Group V] and 579.698 [Group IV] are referred to.
GB1948354A 1954-07-02 1954-07-02 Improvements in photomechanical processes and materials therefor Expired GB767985A (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
BE570732D BE570732A (en) 1954-07-02
BE570791D BE570791A (en) 1954-07-02
GB1948354A GB767985A (en) 1954-07-02 1954-07-02 Improvements in photomechanical processes and materials therefor
FR1139859D FR1139859A (en) 1954-07-02 1955-06-30 New photosensitive compositions and products containing these compositions
GB2722857A GB886100A (en) 1954-07-02 1957-08-29 Improvements in photomechanical processes and materials therefor
GB2805359A GB892812A (en) 1954-07-02 1957-09-05 Improvements in photographic reproduction processes
FR773380A FR74132E (en) 1954-07-02 1958-08-28 New photosensitive compositions and products containing these compositions
FR74466D FR74466E (en) 1954-07-02 1958-08-29 New photosensitive compositions and products containing these compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1948354A GB767985A (en) 1954-07-02 1954-07-02 Improvements in photomechanical processes and materials therefor

Publications (1)

Publication Number Publication Date
GB767985A true GB767985A (en) 1957-02-13

Family

ID=10130119

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1948354A Expired GB767985A (en) 1954-07-02 1954-07-02 Improvements in photomechanical processes and materials therefor

Country Status (1)

Country Link
GB (1) GB767985A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3718474A (en) * 1970-04-23 1973-02-27 Agfa Gevaert Ag Layers crosslinkable by light
CN102666969A (en) * 2009-10-21 2012-09-12 美利肯公司 Flame resistant textile

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3718474A (en) * 1970-04-23 1973-02-27 Agfa Gevaert Ag Layers crosslinkable by light
CN102666969A (en) * 2009-10-21 2012-09-12 美利肯公司 Flame resistant textile
CN102666969B (en) * 2009-10-21 2015-07-01 美利肯公司 Flame resistant textile

Similar Documents

Publication Publication Date Title
US3785825A (en) Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
US2852379A (en) Azide resin photolithographic composition
US2848328A (en) Light sensitive diazo compound and binder composition
US3971660A (en) Lithographic printing plate comprising hydrophilic layer of polyvinylacetate crosslinked with tetraethylorthosilicate
US3860426A (en) Subbed lithographic printing plate
US2940853A (en) Azide sensitized resin photographic resist
US3669658A (en) Photosensitive printing plate
US3211553A (en) Presensitized positive-acting diazotype printing plate
US3146104A (en) Silver halide sensitized lithographic printing plate
GB1151532A (en) Photomechanical production of Bimetallic Printing Plates
US3488194A (en) Photosensitive metal plate
US3736872A (en) Lithographic printing plate and process
US3591378A (en) Process for making positive-working relief plate
US3650754A (en) Photoresist compositions containing limed rosin and photoactinator
GB767985A (en) Improvements in photomechanical processes and materials therefor
US3620736A (en) Photofabrication system using developed negative and positive images in combination with negative-working and positive-working photoresist compositions to produce resists on opposite sides of a workpiece
US1587269A (en) Synthetic resins, photographic process, and media
US1911955A (en) Phototransfer process
US3053658A (en) Photolithography
GB692366A (en) Improvements in or relating to lithographic printing
GB825866A (en) Method of making a lithographic printing plate suitable for lithographic printing and hardening solution therefor
US3711285A (en) Light-sensitive compounds
US2982648A (en) Process of producing a master plate for offset printing and the master plate so produced
US4486518A (en) Duplicating film mask with radiation absorbing benzophenone in processed positive-working radiation sensitive layer on transparent substrate
US3725069A (en) Diazo lithographic composition and article