[go: up one dir, main page]

GB2347784B - Scanning wheel for ion implantation process chamber - Google Patents

Scanning wheel for ion implantation process chamber

Info

Publication number
GB2347784B
GB2347784B GB9905620A GB9905620A GB2347784B GB 2347784 B GB2347784 B GB 2347784B GB 9905620 A GB9905620 A GB 9905620A GB 9905620 A GB9905620 A GB 9905620A GB 2347784 B GB2347784 B GB 2347784B
Authority
GB
United Kingdom
Prior art keywords
ion implantation
process chamber
implantation process
scanning wheel
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9905620A
Other versions
GB9905620D0 (en
GB2347784A (en
Inventor
Stephen Young
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to GB9905620A priority Critical patent/GB2347784B/en
Publication of GB9905620D0 publication Critical patent/GB9905620D0/en
Priority to US09/522,916 priority patent/US6677594B1/en
Priority to EP00301983A priority patent/EP1037255A3/en
Priority to JP2000069210A priority patent/JP5182998B2/en
Publication of GB2347784A publication Critical patent/GB2347784A/en
Application granted granted Critical
Publication of GB2347784B publication Critical patent/GB2347784B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
GB9905620A 1999-03-11 1999-03-11 Scanning wheel for ion implantation process chamber Expired - Fee Related GB2347784B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB9905620A GB2347784B (en) 1999-03-11 1999-03-11 Scanning wheel for ion implantation process chamber
US09/522,916 US6677594B1 (en) 1999-03-11 2000-03-10 Scanning wheel for ion implantation process chamber
EP00301983A EP1037255A3 (en) 1999-03-11 2000-03-10 Scanning wheel for ion implantation process chamber
JP2000069210A JP5182998B2 (en) 1999-03-11 2000-03-13 Scanning wheel for ion implantation processing chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9905620A GB2347784B (en) 1999-03-11 1999-03-11 Scanning wheel for ion implantation process chamber

Publications (3)

Publication Number Publication Date
GB9905620D0 GB9905620D0 (en) 1999-05-05
GB2347784A GB2347784A (en) 2000-09-13
GB2347784B true GB2347784B (en) 2004-02-11

Family

ID=10849436

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9905620A Expired - Fee Related GB2347784B (en) 1999-03-11 1999-03-11 Scanning wheel for ion implantation process chamber

Country Status (4)

Country Link
US (1) US6677594B1 (en)
EP (1) EP1037255A3 (en)
JP (1) JP5182998B2 (en)
GB (1) GB2347784B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040020789A1 (en) * 2000-02-17 2004-02-05 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US7374644B2 (en) * 2000-02-17 2008-05-20 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US20080156657A1 (en) * 2000-02-17 2008-07-03 Butterfield Paul D Conductive polishing article for electrochemical mechanical polishing
US20030072639A1 (en) * 2001-10-17 2003-04-17 Applied Materials, Inc. Substrate support
US6933511B2 (en) 2003-11-18 2005-08-23 Atomic Energy Council Institute Of Nuclear Energy Research Ion implanting apparatus
US7982197B2 (en) * 2009-06-30 2011-07-19 Twin Creeks Technologies, Inc. Ion implantation apparatus and a method for fluid cooling
US8044374B2 (en) * 2009-06-30 2011-10-25 Twin Creeks Technologies, Inc. Ion implantation apparatus
US7989784B2 (en) * 2009-06-30 2011-08-02 Twin Creeks Technologies, Inc. Ion implantation apparatus and a method
US8324599B2 (en) * 2009-09-29 2012-12-04 Twin Creeks Technologies, Inc. Ion implantation apparatus
US8426829B2 (en) * 2009-09-29 2013-04-23 Gtat Corporation Ion implantation apparatus
US12165905B2 (en) * 2019-05-20 2024-12-10 Applied Materials, Inc. Process kit enclosure system
CN111081628A (en) * 2019-12-24 2020-04-28 苏州晋宇达实业股份有限公司 Disk transfer clamp for etching
US20220208619A1 (en) * 2020-12-30 2022-06-30 Globalwafers Co., Ltd Methods for implanting semiconductor substrates

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0178803A2 (en) * 1984-09-19 1986-04-23 Applied Materials, Inc. Systems and methods for ion implantation of semiconductor wafers
GB2180093A (en) * 1985-09-03 1987-03-18 Eaton Corp Ion implanter target chamber
WO1988009563A1 (en) * 1987-05-21 1988-12-01 Ion Implant Services Ion implantation apparatus
EP0556865A1 (en) * 1986-04-28 1993-08-25 Varian Associates, Inc. Wafer transfer system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5389793A (en) * 1983-08-15 1995-02-14 Applied Materials, Inc. Apparatus and methods for ion implantation
US4776744A (en) * 1985-09-09 1988-10-11 Applied Materials, Inc. Systems and methods for wafer handling in semiconductor process equipment
US4836733A (en) * 1986-04-28 1989-06-06 Varian Associates, Inc. Wafer transfer system
US5040484A (en) * 1987-05-04 1991-08-20 Varian Associates, Inc. Apparatus for retaining wafers
US4911103A (en) * 1987-07-17 1990-03-27 Texas Instruments Incorporated Processing apparatus and method
GB8922225D0 (en) * 1989-10-03 1989-11-15 Superion Ltd Apparatus and methods relating to ion implantation
DE69123279T2 (en) * 1990-04-06 1997-04-24 Canon K.K., Tokio/Tokyo Transport device for substrates and method for control
JPH09506744A (en) 1993-12-17 1997-06-30 ブルックス オートメーション インコーポレイテッド Wafer heating / cooling device
JP3687877B2 (en) * 1996-12-18 2005-08-24 信越化学工業株式会社 Platen for ion implanter

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0178803A2 (en) * 1984-09-19 1986-04-23 Applied Materials, Inc. Systems and methods for ion implantation of semiconductor wafers
GB2180093A (en) * 1985-09-03 1987-03-18 Eaton Corp Ion implanter target chamber
EP0556865A1 (en) * 1986-04-28 1993-08-25 Varian Associates, Inc. Wafer transfer system
WO1988009563A1 (en) * 1987-05-21 1988-12-01 Ion Implant Services Ion implantation apparatus

Also Published As

Publication number Publication date
GB9905620D0 (en) 1999-05-05
EP1037255A2 (en) 2000-09-20
JP2000340164A (en) 2000-12-08
EP1037255A3 (en) 2001-05-09
GB2347784A (en) 2000-09-13
JP5182998B2 (en) 2013-04-17
US6677594B1 (en) 2004-01-13

Similar Documents

Publication Publication Date Title
AU6367099A (en) Improved process for water treatment
HUP0105299A3 (en) Process for producing nitrosonium ions
EP1189655A4 (en) Implanter apparatus
EP1047101A3 (en) Ion implanter
GB2347784B (en) Scanning wheel for ion implantation process chamber
GB2392549B (en) Improved double chamber ion implantation system
GB9908953D0 (en) Ion implanter
GB2347786B (en) Ion implantation method
HK1032561A1 (en) Process for treatment of contact lens.
EP1243657A4 (en) Process for producing glycine
GB9905512D0 (en) Process
EP1130623A4 (en) Apparatus for ion implantation
GB2336466B (en) Ion implantation apparatus
GB9908814D0 (en) Process
GB2327532B (en) Improved scanning wheel for ion implantation process chamber
GB9904162D0 (en) Process
GB9726191D0 (en) Ion implantation process
AU1972200A (en) Treatment for fabrics
AU6824400A (en) Process for treating fabrics
HUP0000559A3 (en) Process for preparing cyanoaceticacidesters
GB9905418D0 (en) Process
GB9912063D0 (en) Ion implantation apparatus
GB9903087D0 (en) Process
AU5985700A (en) Process for treating fabrics
GB9909973D0 (en) Process

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040511