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GB201306306D0 - Semiconductor device with a gate stack - Google Patents

Semiconductor device with a gate stack

Info

Publication number
GB201306306D0
GB201306306D0 GBGB1306306.0A GB201306306A GB201306306D0 GB 201306306 D0 GB201306306 D0 GB 201306306D0 GB 201306306 A GB201306306 A GB 201306306A GB 201306306 D0 GB201306306 D0 GB 201306306D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor device
gate stack
stack
gate
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB1306306.0A
Other versions
GB2497257A (en
GB2497257B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB201306306D0 publication Critical patent/GB201306306D0/en
Publication of GB2497257A publication Critical patent/GB2497257A/en
Application granted granted Critical
Publication of GB2497257B publication Critical patent/GB2497257B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008Making conductor-insulator-semiconductor electrodes
    • H01L21/28255Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor belonging to Group IV and not being elemental silicon, e.g. Ge, SiGe, SiGeC
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/221Channel regions of field-effect devices of FETs
    • H10D62/235Channel regions of field-effect devices of FETs of IGFETs
    • H10D62/314Channel regions of field-effect devices of FETs of IGFETs having vertical doping variations 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/60Impurity distributions or concentrations
    • H10D62/605Planar doped, e.g. atomic-plane doped or delta-doped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82Heterojunctions
    • H10D62/822Heterojunctions comprising only Group IV materials heterojunctions, e.g. Si/Ge heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
    • H10D64/691Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator comprising metallic compounds, e.g. metal oxides or metal silicates 

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
GB1306306.0A 2010-09-28 2011-09-22 Semiconductor device with a gate stack Active GB2497257B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10180822 2010-09-28
PCT/IB2011/054162 WO2012042442A1 (en) 2010-09-28 2011-09-22 Semiconductor device with a gate stack

Publications (3)

Publication Number Publication Date
GB201306306D0 true GB201306306D0 (en) 2013-05-22
GB2497257A GB2497257A (en) 2013-06-05
GB2497257B GB2497257B (en) 2013-11-06

Family

ID=44789561

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1306306.0A Active GB2497257B (en) 2010-09-28 2011-09-22 Semiconductor device with a gate stack

Country Status (5)

Country Link
JP (1) JP5752254B2 (en)
CN (1) CN103125014B (en)
DE (1) DE112011103249B4 (en)
GB (1) GB2497257B (en)
WO (1) WO2012042442A1 (en)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001144087A (en) * 1999-11-12 2001-05-25 Natl Research Inst For Metals Ministry Of Education Culture Sports Science & Technology Method of stabilizing oxide / semiconductor interface with group V element and stabilized semiconductor
JP2003523630A (en) * 2000-02-17 2003-08-05 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Semiconductor device including CMOS integrated circuit including MOS transistor having silicon-germanium (Si1-xGex) gate electrode and method of manufacturing the same
JP2004006959A (en) * 2001-04-12 2004-01-08 Matsushita Electric Ind Co Ltd Semiconductor device and method of manufacturing the same
US6852645B2 (en) * 2003-02-13 2005-02-08 Texas Instruments Incorporated High temperature interface layer growth for high-k gate dielectric
JP4767843B2 (en) * 2004-04-14 2011-09-07 富士通セミコンダクター株式会社 Semiconductor device and manufacturing method thereof
US20060086950A1 (en) * 2004-10-13 2006-04-27 Matty Caymax Method for making a passivated semiconductor substrate
JP4992710B2 (en) * 2005-03-11 2012-08-08 富士通セミコンダクター株式会社 MOS transistor and manufacturing method thereof
US7446380B2 (en) 2005-04-29 2008-11-04 International Business Machines Corporation Stabilization of flatband voltages and threshold voltages in hafnium oxide based silicon transistors for CMOS
US8716812B2 (en) * 2008-06-25 2014-05-06 Nxp B.V. Interfacial layer regrowth control in high-K gate structure for field effect transistor

Also Published As

Publication number Publication date
DE112011103249T5 (en) 2013-08-14
GB2497257A (en) 2013-06-05
CN103125014B (en) 2015-09-23
JP2013543257A (en) 2013-11-28
JP5752254B2 (en) 2015-07-22
DE112011103249B4 (en) 2014-01-23
GB2497257B (en) 2013-11-06
WO2012042442A1 (en) 2012-04-05
CN103125014A (en) 2013-05-29

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Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)

Effective date: 20131107