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GB1556244A - Open tube gallium diffusion process for semiconductor devices - Google Patents

Open tube gallium diffusion process for semiconductor devices

Info

Publication number
GB1556244A
GB1556244A GB41263/76A GB4126376A GB1556244A GB 1556244 A GB1556244 A GB 1556244A GB 41263/76 A GB41263/76 A GB 41263/76A GB 4126376 A GB4126376 A GB 4126376A GB 1556244 A GB1556244 A GB 1556244A
Authority
GB
United Kingdom
Prior art keywords
semiconductor devices
diffusion process
open tube
gallium diffusion
tube gallium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB41263/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of GB1556244A publication Critical patent/GB1556244A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165Diffusion sources
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/08Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state the diffusion materials being a compound of the elements to be diffused

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
GB41263/76A 1975-10-07 1976-10-05 Open tube gallium diffusion process for semiconductor devices Expired GB1556244A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US62043975A 1975-10-07 1975-10-07

Publications (1)

Publication Number Publication Date
GB1556244A true GB1556244A (en) 1979-11-21

Family

ID=24485946

Family Applications (1)

Application Number Title Priority Date Filing Date
GB41263/76A Expired GB1556244A (en) 1975-10-07 1976-10-05 Open tube gallium diffusion process for semiconductor devices

Country Status (6)

Country Link
JP (1) JPS5246763A (en)
BE (1) BE847005A (en)
CA (1) CA1065498A (en)
DE (1) DE2644879A1 (en)
FR (1) FR2326974A1 (en)
GB (1) GB1556244A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2751163C3 (en) * 1977-11-16 1982-02-25 Brown, Boveri & Cie Ag, 6800 Mannheim Method for controlling open gallium diffusion and apparatus for carrying out the same
US4235650A (en) * 1978-09-05 1980-11-25 General Electric Company Open tube aluminum diffusion
DE3147245C1 (en) * 1981-11-28 1983-03-10 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Diffusion process for producing gallium-doped silicon layers having low surface concentration

Also Published As

Publication number Publication date
CA1065498A (en) 1979-10-30
FR2326974A1 (en) 1977-05-06
BE847005A (en) 1977-04-06
JPS5246763A (en) 1977-04-13
JPS5344794B2 (en) 1978-12-01
FR2326974B3 (en) 1979-06-15
DE2644879A1 (en) 1977-04-21

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19921005