GB1438737A - Method and apparatus for positioning movable means - Google Patents
Method and apparatus for positioning movable meansInfo
- Publication number
- GB1438737A GB1438737A GB3634674A GB3634674A GB1438737A GB 1438737 A GB1438737 A GB 1438737A GB 3634674 A GB3634674 A GB 3634674A GB 3634674 A GB3634674 A GB 3634674A GB 1438737 A GB1438737 A GB 1438737A
- Authority
- GB
- United Kingdom
- Prior art keywords
- line
- memory
- exposure
- predetermined position
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
1438737 Automatic control systems INTERNATIONAL BUSINESS MACHINES CORP 19 Aug 1974 [19 Sept 1973] 36346/74 Heading G3N A line by line scan is controlled by a memory and, at a predetermined position on a line, a function of the scan at that predetermined position and at the same position in the next line is determined, and the memory control for the next line updated if these functions differ. In the embodiment, an electron beam forms a desired pattern on a semi-conductor chip with line by line control of the beam exposure and position by a memory fed from a computer. The beam is moved to a predetermined position on a line and the desired exposure given. Then the memory is examined to determine the exposure and position offset required at the same predetermined position on the next line, and if a difference is found the memory is updated. The beam is then moved to the next desired position and the exposure/offset control (and updating if necessary) is repeated. Since.the memory updating is limited, faster writing of the pattern on the semi-conductor chip can be achieved. The apparatus is similar to that disclosed in Specification 1329559 and the digital exposure/offset control is described with reference to Figs. 2A and 2B (not shown).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US398734A US3866013A (en) | 1973-09-19 | 1973-09-19 | Method and apparatus for controlling movable means such as an electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1438737A true GB1438737A (en) | 1976-06-09 |
Family
ID=23576583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3634674A Expired GB1438737A (en) | 1973-09-19 | 1974-08-19 | Method and apparatus for positioning movable means |
Country Status (7)
Country | Link |
---|---|
US (1) | US3866013A (en) |
JP (2) | JPS5248061B2 (en) |
CA (1) | CA1013074A (en) |
DE (1) | DE2443625C2 (en) |
FR (1) | FR2244202B1 (en) |
GB (1) | GB1438737A (en) |
IT (1) | IT1020326B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2294489A1 (en) * | 1974-12-13 | 1976-07-09 | Thomson Csf | DEVICE FOR THE PROGRAM TRACE OF DRAWINGS BY PARTICLE BOMBARDING |
US4056730A (en) * | 1976-07-12 | 1977-11-01 | International Business Machines Corporation | Apparatus for detecting registration marks on a target such as a semiconductor wafer |
US4099062A (en) * | 1976-12-27 | 1978-07-04 | International Business Machines Corporation | Electron beam lithography process |
US4147937A (en) * | 1977-11-01 | 1979-04-03 | Fujitsu Limited | Electron beam exposure system method and apparatus |
JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
JPS5521156A (en) * | 1978-08-02 | 1980-02-15 | Fujitsu Ltd | Electronic beam exposing system |
JPS5778814U (en) * | 1980-10-31 | 1982-05-15 | ||
DE102014105452B3 (en) * | 2014-04-16 | 2015-08-27 | Von Ardenne Gmbh | Arrangement for deflecting an electron beam generated by means of an electron beam gun, method for generating a deflection signal and method for operating an electron beam gun |
DE102014105451B3 (en) * | 2014-04-16 | 2015-08-27 | Von Ardenne Gmbh | Arrangement for deflecting an electron beam generated by means of an electron beam gun, method for generating a deflection signal and method for operating an electron beam gun |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
US3789185A (en) * | 1969-12-15 | 1974-01-29 | Ibm | Electron beam deflection control apparatus |
-
1973
- 1973-09-19 US US398734A patent/US3866013A/en not_active Expired - Lifetime
-
1974
- 1974-08-02 FR FR7427488A patent/FR2244202B1/fr not_active Expired
- 1974-08-07 JP JP49089915A patent/JPS5248061B2/ja not_active Expired
- 1974-08-19 GB GB3634674A patent/GB1438737A/en not_active Expired
- 1974-08-22 CA CA207,581A patent/CA1013074A/en not_active Expired
- 1974-08-30 IT IT26771/74A patent/IT1020326B/en active
- 1974-09-12 DE DE2443625A patent/DE2443625C2/en not_active Expired
-
1977
- 1977-05-10 JP JP5274177A patent/JPS5333584A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5328749B2 (en) | 1978-08-16 |
JPS5248061B2 (en) | 1977-12-07 |
US3866013A (en) | 1975-02-11 |
FR2244202A1 (en) | 1975-04-11 |
FR2244202B1 (en) | 1976-10-22 |
CA1013074A (en) | 1977-06-28 |
IT1020326B (en) | 1977-12-20 |
DE2443625A1 (en) | 1975-03-20 |
JPS5058986A (en) | 1975-05-22 |
DE2443625C2 (en) | 1983-10-27 |
JPS5333584A (en) | 1978-03-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930819 |