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GB1198312A - Corrosion Inhibiting Chemical Compositions - Google Patents

Corrosion Inhibiting Chemical Compositions

Info

Publication number
GB1198312A
GB1198312A GB3380967A GB3380967A GB1198312A GB 1198312 A GB1198312 A GB 1198312A GB 3380967 A GB3380967 A GB 3380967A GB 3380967 A GB3380967 A GB 3380967A GB 1198312 A GB1198312 A GB 1198312A
Authority
GB
United Kingdom
Prior art keywords
benzotriazole
composition
acid
derivative
alkali metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3380967A
Inventor
Alan Francis Popplewell
Michael Anthony Finan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Geigy Co Ltd
Original Assignee
Geigy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Geigy Co Ltd filed Critical Geigy Co Ltd
Priority to GB3380967A priority Critical patent/GB1198312A/en
Priority to CH1079368A priority patent/CH496804A/en
Priority to BE718337D priority patent/BE718337A/xx
Priority to FR1577582D priority patent/FR1577582A/fr
Publication of GB1198312A publication Critical patent/GB1198312A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3245—Aminoacids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
    • C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Detergent Compositions (AREA)

Abstract

1,198,312. Cleaning composition. GEIGY (UK) Ltd. July 19, 1968 [July 22, 1967], No.33809/67. Heading C7E. A composition for cleaning copper or its alloys and imparting tarnish-resistance thereto comprises an acidic material having a pK value of not more than 5‹0, thiourea, and benzotriazole or a copper-protecting derivative of benzotriazole. The said acidic material may be HC1, H 2 SO 4 sulphamic acid, citric acid, tartaric acid, or acetic acid, or a polyamino-polycarboxylic acid such as E.D.T.A. or hydroxyethyl ethylenediamine triacetic acid. The benzotriazole derivative may be a 5-alkyl benzotriazole derivative having from 2 to 20 C atoms in the alkyl group, or a 5- alkanolylamino-benzotriazole having 3 to 20 C atoms in the alkanoylamino group, or a bisbenzotriazole. The composition may contain 50- 80 wt. per cent acidic material, 0À1-30% thiourea, and 0À1-46À67% of benzotriazole (derivative), and preferably also up to 40% of surfactant, which may be a compound of formula ROSO 3 M where R is an aliphatic hydrocarbon group and M is alkali metal or ammonium, or which surfactant may be an alkali metal alkylbenzene sulphonate or an alkali metal salt of a secondary alkyl sulphate. Copper may be treated with an aqueous solution of the composition, or a solution in a suitable inert carrier, or else the composition may be impregnated into a paper, or formulated into a paste for rubbing the surface. The paste may contain a mild abrasive such as 325 mesh diatomaceous earth or silica, and a softener such as ethylene glycol.
GB3380967A 1967-07-22 1967-07-22 Corrosion Inhibiting Chemical Compositions Expired GB1198312A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB3380967A GB1198312A (en) 1967-07-22 1967-07-22 Corrosion Inhibiting Chemical Compositions
CH1079368A CH496804A (en) 1967-07-22 1968-07-18 Acid detergent
BE718337D BE718337A (en) 1967-07-22 1968-07-19
FR1577582D FR1577582A (en) 1967-07-22 1968-07-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3380967A GB1198312A (en) 1967-07-22 1967-07-22 Corrosion Inhibiting Chemical Compositions

Publications (1)

Publication Number Publication Date
GB1198312A true GB1198312A (en) 1970-07-08

Family

ID=10357728

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3380967A Expired GB1198312A (en) 1967-07-22 1967-07-22 Corrosion Inhibiting Chemical Compositions

Country Status (4)

Country Link
BE (1) BE718337A (en)
CH (1) CH496804A (en)
FR (1) FR1577582A (en)
GB (1) GB1198312A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5746947A (en) * 1990-06-20 1998-05-05 Calgon Corporation Alkylbenzotriazole compositions and the use thereof as copper and copper alloy corrosion inhibitors
WO1998026025A1 (en) * 1996-12-09 1998-06-18 Cabot Corporation Chemical mechanical polishing copper substrates
US5954997A (en) * 1996-12-09 1999-09-21 Cabot Corporation Chemical mechanical polishing slurry useful for copper substrates
US6063306A (en) * 1998-06-26 2000-05-16 Cabot Corporation Chemical mechanical polishing slurry useful for copper/tantalum substrate
US6126853A (en) * 1996-12-09 2000-10-03 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6217416B1 (en) 1998-06-26 2001-04-17 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper/tantalum substrates
US6432828B2 (en) 1998-03-18 2002-08-13 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
EP2451929A2 (en) * 2009-07-06 2012-05-16 Honeywell International Inc. Methods and composition for cleaning a heat transfer system having an aluminum component

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2849894A1 (en) * 1978-11-17 1980-05-29 Hoechst Ag METHOD FOR CLEANING METAL SURFACES CONTAINING COPPER
US4430128A (en) * 1980-12-05 1984-02-07 The Dow Chemical Company Aqueous acid composition and method of use
US4636327A (en) * 1980-12-05 1987-01-13 Dowell Schlumberger Incorporated Aqueous acid composition and method of use

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5746947A (en) * 1990-06-20 1998-05-05 Calgon Corporation Alkylbenzotriazole compositions and the use thereof as copper and copper alloy corrosion inhibitors
US6593239B2 (en) 1996-12-09 2003-07-15 Cabot Microelectronics Corp. Chemical mechanical polishing method useful for copper substrates
US5954997A (en) * 1996-12-09 1999-09-21 Cabot Corporation Chemical mechanical polishing slurry useful for copper substrates
US6126853A (en) * 1996-12-09 2000-10-03 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6309560B1 (en) 1996-12-09 2001-10-30 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6569350B2 (en) 1996-12-09 2003-05-27 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
WO1998026025A1 (en) * 1996-12-09 1998-06-18 Cabot Corporation Chemical mechanical polishing copper substrates
US6432828B2 (en) 1998-03-18 2002-08-13 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6620037B2 (en) 1998-03-18 2003-09-16 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US7381648B2 (en) 1998-03-18 2008-06-03 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6063306A (en) * 1998-06-26 2000-05-16 Cabot Corporation Chemical mechanical polishing slurry useful for copper/tantalum substrate
US6217416B1 (en) 1998-06-26 2001-04-17 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper/tantalum substrates
EP2451929A2 (en) * 2009-07-06 2012-05-16 Honeywell International Inc. Methods and composition for cleaning a heat transfer system having an aluminum component
EP2451929A4 (en) * 2009-07-06 2013-08-28 Prestone Products Corp Methods and composition for cleaning a heat transfer system having an aluminum component

Also Published As

Publication number Publication date
BE718337A (en) 1969-01-20
CH496804A (en) 1970-09-30
FR1577582A (en) 1969-08-08

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Legal Events

Date Code Title Description
PS Patent sealed
PLE Entries relating assignments, transmissions, licences in the register of patents
PLNP Patent lapsed through nonpayment of renewal fees