GB1151310A - Production of Photographic Materials using Photosensitive Compounds other than Silver Halides - Google Patents
Production of Photographic Materials using Photosensitive Compounds other than Silver HalidesInfo
- Publication number
- GB1151310A GB1151310A GB38265/67A GB3826567A GB1151310A GB 1151310 A GB1151310 A GB 1151310A GB 38265/67 A GB38265/67 A GB 38265/67A GB 3826567 A GB3826567 A GB 3826567A GB 1151310 A GB1151310 A GB 1151310A
- Authority
- GB
- United Kingdom
- Prior art keywords
- photo
- layer
- sensitive
- photographic materials
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
Landscapes
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
1,151,310. Photographic materials. INSTITUT PO PHISIKOHIMIA PRI BULGARSKA AKADEMIA NA NAUKITE. Nov. 17, 1967 [Dec. 31, 1966], No. 38265/67. Heading G2C. Photographic material yielding a positive latent image on imagewise exposure comprises a supported layer of at least one photo-sensitive substance other than silver halide, and in direct contact therewith, a layer of a metal which reacts with the sensitive substance on exposure and which is thin enough to allow radiation to pass therethrough. The photo-sensitive substance may be a photo-decomposable substance or a photo-conductor, and exemplified substances are halides of Cd, Cu, Pb, Hg and T1, oxides of Cd, Cu, and Zn, sulphides and selenides of Sb, Bi, Cd, Pb and T1, tellurides of Cd, In, Pb, Hg and T1, and GaAs, GaSb and InSb. The photo-sensitive layer may be 0À1-10 thick. The metal layer may be Ag, Bi, Cd, Cr, Cu, Fe, In, Pb, Se or Te, deposited at 10<SP>-8</SP>-10<SP>-5</SP> g/cm<SP>2</SP>. The material is exposed to u.v., visible or I. R radiation as appropriate and developed with a conventional physical developer containing e.g. AgNo 3 .
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BG156766 | 1966-12-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1151310A true GB1151310A (en) | 1969-05-07 |
Family
ID=3897240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB38265/67A Expired GB1151310A (en) | 1966-12-31 | 1967-11-17 | Production of Photographic Materials using Photosensitive Compounds other than Silver Halides |
Country Status (4)
Country | Link |
---|---|
US (1) | US3658540A (en) |
BE (1) | BE703208A (en) |
FR (1) | FR1534597A (en) |
GB (1) | GB1151310A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3637379A (en) * | 1967-06-20 | 1972-01-25 | Teeg Research Inc | Method for making a relief pattern by means of electromagnetic radiation and heat-sensitive elements |
US3637381A (en) * | 1966-09-22 | 1972-01-25 | Teeg Research Inc | Radiation-sensitive self-revealing elements and methods of making and utilizing the same |
US3637377A (en) * | 1966-11-03 | 1972-01-25 | Teeg Research Inc | Method for making a pattern on a support member by means of actinic radiation sensitive element |
US3637378A (en) * | 1966-11-03 | 1972-01-25 | Teeg Research Inc | Radiation-sensitive element, provided with flexible base and methods for exposing and processing the same |
US3637383A (en) * | 1966-11-03 | 1972-01-25 | Teeg Research Inc | Radiation-sensitive elements and etch processes using the same |
US3650743A (en) * | 1967-10-06 | 1972-03-21 | Teeg Research Inc | Methods for making lithographic offset plates by means of electromagnetic radiation sensitive elements |
US3663224A (en) * | 1966-11-03 | 1972-05-16 | Teeg Research Inc | Electrical components, electrical circuits, and the like, and methods for making the same by means of radiation sensitive elements |
US3933496A (en) * | 1972-11-15 | 1976-01-20 | Zlafop Pri Ban | Direct-positive photographic material and method for its production |
US4052211A (en) * | 1972-11-30 | 1977-10-04 | Fuji Photo Film Co., Ltd. | Image forming material |
FR2460205A1 (en) * | 1979-07-03 | 1981-01-23 | Inst Elektrodinamiki Akademii | Radiation-sensitive recording material - with a metallic layer e.g. of copper or silver and an inorganic layer of arsenic, antimony or bismuth chalcogenide, with an intermediate s |
FR2487102A1 (en) * | 1980-07-18 | 1982-01-22 | Sony Corp | OPTICAL INFORMATION RECORDING DEVICE |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3907566A (en) * | 1971-07-23 | 1975-09-23 | Canon Kk | Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes |
JPS5815319B2 (en) * | 1975-08-11 | 1983-03-24 | 富士写真フイルム株式会社 | Kirokuzairiyou |
DD123023A5 (en) * | 1975-01-07 | 1976-11-12 | Zlafop Pri Ban | EN METAL PICTURE |
US4188214A (en) * | 1975-08-11 | 1980-02-12 | Fuji Photo Film Co., Ltd. | Recording material |
US4318978A (en) * | 1976-11-05 | 1982-03-09 | Corning Glass Works | Photosensitive film and methods |
US4275141A (en) * | 1979-10-22 | 1981-06-23 | Corning Glass Works | Polycrystalline tin oxide-silver chloride-cadmium chloride UV photosensitive film and method of use |
US4323640A (en) * | 1980-11-05 | 1982-04-06 | Corning Glass Works | Positive imaging method using doped silver halide medium |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3152903A (en) * | 1959-04-30 | 1964-10-13 | Minnesota Mining & Mfg | Reproduction system |
US3152904A (en) * | 1959-12-21 | 1964-10-13 | Minncsota Mining And Mfg Compa | Print-out process and image reproduction sheet therefor |
BE637058A (en) * | 1962-09-07 | |||
US3453639A (en) * | 1964-04-15 | 1969-07-01 | Itek Corp | Electron beam recording on a photoconductive record medium |
-
1967
- 1967-08-23 FR FR118810A patent/FR1534597A/en not_active Expired
- 1967-08-29 BE BE703208D patent/BE703208A/xx unknown
- 1967-09-12 US US667080A patent/US3658540A/en not_active Expired - Lifetime
- 1967-11-17 GB GB38265/67A patent/GB1151310A/en not_active Expired
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3637381A (en) * | 1966-09-22 | 1972-01-25 | Teeg Research Inc | Radiation-sensitive self-revealing elements and methods of making and utilizing the same |
US3637377A (en) * | 1966-11-03 | 1972-01-25 | Teeg Research Inc | Method for making a pattern on a support member by means of actinic radiation sensitive element |
US3637378A (en) * | 1966-11-03 | 1972-01-25 | Teeg Research Inc | Radiation-sensitive element, provided with flexible base and methods for exposing and processing the same |
US3637383A (en) * | 1966-11-03 | 1972-01-25 | Teeg Research Inc | Radiation-sensitive elements and etch processes using the same |
US3663224A (en) * | 1966-11-03 | 1972-05-16 | Teeg Research Inc | Electrical components, electrical circuits, and the like, and methods for making the same by means of radiation sensitive elements |
US3637379A (en) * | 1967-06-20 | 1972-01-25 | Teeg Research Inc | Method for making a relief pattern by means of electromagnetic radiation and heat-sensitive elements |
US3650743A (en) * | 1967-10-06 | 1972-03-21 | Teeg Research Inc | Methods for making lithographic offset plates by means of electromagnetic radiation sensitive elements |
US3933496A (en) * | 1972-11-15 | 1976-01-20 | Zlafop Pri Ban | Direct-positive photographic material and method for its production |
US4052211A (en) * | 1972-11-30 | 1977-10-04 | Fuji Photo Film Co., Ltd. | Image forming material |
FR2460205A1 (en) * | 1979-07-03 | 1981-01-23 | Inst Elektrodinamiki Akademii | Radiation-sensitive recording material - with a metallic layer e.g. of copper or silver and an inorganic layer of arsenic, antimony or bismuth chalcogenide, with an intermediate s |
FR2487102A1 (en) * | 1980-07-18 | 1982-01-22 | Sony Corp | OPTICAL INFORMATION RECORDING DEVICE |
Also Published As
Publication number | Publication date |
---|---|
DE1597606A1 (en) | 1970-06-04 |
US3658540A (en) | 1972-04-25 |
BE703208A (en) | 1968-01-15 |
FR1534597A (en) | 1968-07-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |