FR2992465B1 - Procede de fabrication collective de leds et structure pour la fabrication collective de leds - Google Patents
Procede de fabrication collective de leds et structure pour la fabrication collective de ledsInfo
- Publication number
- FR2992465B1 FR2992465B1 FR1255931A FR1255931A FR2992465B1 FR 2992465 B1 FR2992465 B1 FR 2992465B1 FR 1255931 A FR1255931 A FR 1255931A FR 1255931 A FR1255931 A FR 1255931A FR 2992465 B1 FR2992465 B1 FR 2992465B1
- Authority
- FR
- France
- Prior art keywords
- leds
- collective
- manufacture
- production
- collective production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/831—Electrodes characterised by their shape
- H10H20/8314—Electrodes characterised by their shape extending at least partially onto an outer side surface of the bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
- H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/139—Manufacture or treatment of devices covered by this subclass using temporary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/93—Interconnections
- H10F77/933—Interconnections for devices having potential barriers
- H10F77/935—Interconnections for devices having potential barriers for photovoltaic devices or modules
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/032—Manufacture or treatment of electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0364—Manufacture or treatment of packages of interconnections
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
- H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
- H10H29/142—Two-dimensional arrangements, e.g. asymmetric LED layout
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Priority Applications (18)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1255934A FR2992466A1 (fr) | 2012-06-22 | 2012-06-22 | Procede de realisation de contact pour led et structure resultante |
FR1255931A FR2992465B1 (fr) | 2012-06-22 | 2012-06-22 | Procede de fabrication collective de leds et structure pour la fabrication collective de leds |
FR1257617A FR2992473B1 (fr) | 2012-06-22 | 2012-08-06 | Procede de fabrication de structures de led ou de cellules solaires |
CN201380032574.0A CN104396030B (zh) | 2012-06-22 | 2013-06-14 | 制造led或太阳能电池的结构的方法 |
PCT/EP2013/062423 WO2013189857A1 (fr) | 2012-06-22 | 2013-06-14 | Procédé de fabrication de structures de del de cellules solaires |
EP13728426.1A EP2865019B1 (fr) | 2012-06-22 | 2013-06-14 | Procédé de fabrication de structures de del ou de cellules solaires |
KR1020147036038A KR102087754B1 (ko) | 2012-06-22 | 2013-06-14 | Led들 또는 태양 전지들의 구조들을 제조하는 방법 |
JP2015517701A JP6269664B2 (ja) | 2012-06-22 | 2013-06-14 | Led又は太陽電池セルの構造を製造する方法 |
US14/405,632 US9478707B2 (en) | 2012-06-22 | 2013-06-14 | Method of manufacturing structures of LEDs or solar cells |
KR1020147036042A KR102011351B1 (ko) | 2012-06-22 | 2013-06-18 | Led들의 일괄 제조를 위한 방법 및 led들의 일괄 제조를 위한 구조 |
EP13729948.3A EP2865021B1 (fr) | 2012-06-22 | 2013-06-18 | Procédé et structure de fabrication collective de del |
PCT/EP2013/062658 WO2013189949A1 (fr) | 2012-06-22 | 2013-06-18 | Procédé et structure de fabrication collective de del |
US14/409,650 US20150155331A1 (en) | 2012-06-22 | 2013-06-18 | Method of collective manufacture of leds and structure for collective manufacture of leds |
JP2015517733A JP6103276B2 (ja) | 2012-06-22 | 2013-06-18 | Ledの集合的製造の方法及びledの集合的製造のための構造 |
CN201380032606.7A CN104396033B (zh) | 2012-06-22 | 2013-06-18 | Led的集体制造的方法及led的集体制造的结构 |
TW102122243A TWI493761B (zh) | 2012-06-22 | 2013-06-21 | 製造LEDs或太陽能電池結構之方法 |
TW102122240A TWI518954B (zh) | 2012-06-22 | 2013-06-21 | LEDs集體製造之方法及用於LEDs集體製造之結構 |
US15/332,412 US9865786B2 (en) | 2012-06-22 | 2016-10-24 | Method of manufacturing structures of LEDs or solar cells |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1255934A FR2992466A1 (fr) | 2012-06-22 | 2012-06-22 | Procede de realisation de contact pour led et structure resultante |
FR1255931A FR2992465B1 (fr) | 2012-06-22 | 2012-06-22 | Procede de fabrication collective de leds et structure pour la fabrication collective de leds |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2992465A1 FR2992465A1 (fr) | 2013-12-27 |
FR2992465B1 true FR2992465B1 (fr) | 2015-03-20 |
Family
ID=48656041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1255931A Active FR2992465B1 (fr) | 2012-06-22 | 2012-06-22 | Procede de fabrication collective de leds et structure pour la fabrication collective de leds |
Country Status (8)
Country | Link |
---|---|
US (1) | US20150155331A1 (fr) |
EP (1) | EP2865021B1 (fr) |
JP (1) | JP6103276B2 (fr) |
KR (1) | KR102011351B1 (fr) |
CN (1) | CN104396033B (fr) |
FR (1) | FR2992465B1 (fr) |
TW (1) | TWI518954B (fr) |
WO (1) | WO2013189949A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11876073B2 (en) | 2018-11-08 | 2024-01-16 | Soitec | Process for collectively fabricating a plurality of semiconductor structures |
US11901483B2 (en) | 2019-01-09 | 2024-02-13 | Soitec | Optoelectronic semiconductor structure comprising a p-type injection layer based on InGaN |
Families Citing this family (38)
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US8816383B2 (en) * | 2012-07-06 | 2014-08-26 | Invensas Corporation | High performance light emitting diode with vias |
FR3007580B1 (fr) * | 2013-06-25 | 2016-10-21 | Commissariat Energie Atomique | Dispositif optoelectronique a reflectivite amelioree |
DE102014102029A1 (de) | 2014-02-18 | 2015-08-20 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung von Halbleiterbauelementen und Halbleiterbauelement |
FR3023061B1 (fr) | 2014-06-27 | 2017-12-15 | Commissariat Energie Atomique | Diode de structure mesa a surface de contact sensiblement plane |
FR3023065B1 (fr) | 2014-06-27 | 2017-12-15 | Commissariat Energie Atomique | Dispositif optoelectronique a jonction p-n permettant une ionisation de dopants par effet de champ |
JP6483246B2 (ja) | 2014-10-17 | 2019-03-13 | インテル・コーポレーション | 微小持ち上げ・接合組立法 |
CN106716641B (zh) * | 2014-10-17 | 2021-07-09 | 英特尔公司 | 微型led显示器和组装 |
FR3042913B1 (fr) | 2015-10-22 | 2019-07-12 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Diode micro-electronique a surface active optimisee |
DE102015121056A1 (de) * | 2015-12-03 | 2017-06-08 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung einer Mehrzahl von Bauelementen und Bauelement |
FR3046298B1 (fr) * | 2015-12-23 | 2018-01-26 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique d’emission de lumiere |
FR3046247B1 (fr) * | 2015-12-28 | 2018-06-15 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Circuit integre pour detection d’un defaut d’isolation avec une armature conductrice |
ES2896179T3 (es) * | 2016-05-13 | 2022-02-24 | Commissariat Energie Atomique | Procedimiento de fabricación de un dispositivo optoelectrónico que incluye una pluralidad de diodos de nitruro de galio |
FR3056825B1 (fr) * | 2016-09-29 | 2019-04-26 | Soitec | Structure comprenant des ilots semi-conducteurs monocristallins, procede de fabrication d'une telle structure |
DE112017005899T5 (de) * | 2016-11-22 | 2019-08-01 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung mindestens eines optoelektronischen Halbleiterbauelements und optoelektronisches Halbleiterbauelement |
FR3061357B1 (fr) * | 2016-12-27 | 2019-05-24 | Aledia | Procede de realisation d’un dispositif optoelectronique comportant une etape de gravure de la face arriere du substrat de croissance |
FR3079071B1 (fr) | 2018-03-13 | 2020-02-28 | Soitec | Procede de fabrication d'une pluralite d'ilots semi-conducteurs cristallins prensentant une variete de parametres de maille |
EP3596756B1 (fr) | 2017-03-17 | 2023-02-15 | Soitec | Procédé de fabrication d'une pluralité d'îlots semi-conducteurs cristallins présentant une variété de paramètres de maille |
FR3079070B1 (fr) | 2018-03-13 | 2020-02-28 | Soitec | Procede de fabrication d'une pluralite d'ilots semi-conducteurs cristallins presentant une variete de parametres de maille |
FR3064108B1 (fr) | 2017-03-17 | 2022-12-30 | Soitec Silicon On Insulator | Substrat de croissance pour la formation de dispositifs optoelectroniques, procede de fabrication d'un tel susbstrat, et utilisation du susbtrat notamment dans le domaine des micro-ecrans d'affichage |
FR3066317B1 (fr) | 2017-05-09 | 2020-02-28 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de fabrication d'un dispositif d'affichage emissif a led |
DE102017117414A1 (de) | 2017-08-01 | 2019-02-07 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optoelektronischen Bauelements und optoelektronisches Bauelement |
KR102419593B1 (ko) * | 2017-10-23 | 2022-07-12 | 삼성전자주식회사 | 발광 다이오드 및 그의 제조 방법 |
FR3076170B1 (fr) * | 2017-12-22 | 2020-05-15 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de report de structures electroluminescentes |
US10615305B1 (en) | 2018-04-20 | 2020-04-07 | Facebook Technologies, Llc | Self-alignment of micro light emitting diode using planarization |
US11342479B2 (en) * | 2018-09-11 | 2022-05-24 | Facebook Technologies, Llc | Reducing bowing of materials before wafer-to-wafer bonding for LED manufacturing |
CN109496368A (zh) * | 2018-10-12 | 2019-03-19 | 京东方科技集团股份有限公司 | 微发光二极管装置及其制造方法 |
FR3087580B1 (fr) * | 2018-10-23 | 2020-12-18 | Aledia | Procede de realisation d’un dispositif optoelectronique comprenant des diodes electroluminescentes homogenes en dimensions |
FR3093862B1 (fr) * | 2019-03-11 | 2022-07-29 | Soitec Silicon On Insulator | Structure semi-conductrice optoélectronique comprenant une couche d’injection de type p à base d’InGaN |
KR102712725B1 (ko) * | 2019-07-10 | 2024-10-02 | 삼성디스플레이 주식회사 | 발광 소자, 이의 제조 방법 및 표시 장치 |
KR102275367B1 (ko) * | 2019-08-21 | 2021-07-13 | 주식회사 에스엘바이오닉스 | 반도체 발광소자 및 이의 제조방법 |
FR3102613A1 (fr) * | 2019-10-28 | 2021-04-30 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de realisation d’une diode photo-emettrice ou photo-receptrice |
GB2593693B (en) * | 2020-03-30 | 2022-08-03 | Plessey Semiconductors Ltd | LED precursor |
US11705534B2 (en) | 2020-12-01 | 2023-07-18 | Lumileds Llc | Methods of making flip chip micro light emitting diodes |
FR3127072B1 (fr) * | 2021-09-14 | 2023-08-04 | Commissariat Energie Atomique | Procédé de fabrication d’une diode semiconductrice par gravures sèche et humide |
US20230155065A1 (en) * | 2021-11-12 | 2023-05-18 | Lumileds Llc | Composite cathode contact for monolithically integrated micro-leds, mini-leds and led arrays |
US20230154969A1 (en) * | 2021-11-12 | 2023-05-18 | Lumileds Llc | Composite cathode contact with spacer layer for monolithically integrated micro-leds, mini-leds, and led arrays |
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JP7406292B1 (ja) * | 2023-07-27 | 2023-12-27 | アルディーテック株式会社 | マイクロ発光ダイオードチップ、マイクロ発光ダイオードチップの製造方法、マイクロ発光ダイオードチップ転写用基板、マイクロ発光ダイオードチップ転写用基板の製造方法、マイクロ発光ダイオードディスプレイおよびxrグラス |
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TWI414004B (zh) * | 2010-10-25 | 2013-11-01 | Univ Nat Chiao Tung | 具有氮化鎵層的多層結構基板及其製法 |
US9673363B2 (en) * | 2011-01-31 | 2017-06-06 | Cree, Inc. | Reflective mounting substrates for flip-chip mounted horizontal LEDs |
US8629531B2 (en) * | 2011-02-18 | 2014-01-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method to reduce wafer warp for gallium nitride on silicon wafer |
CN102290524B (zh) * | 2011-09-21 | 2013-03-06 | 晶科电子(广州)有限公司 | 一种led器件及其led模组器件 |
-
2012
- 2012-06-22 FR FR1255931A patent/FR2992465B1/fr active Active
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2013
- 2013-06-18 CN CN201380032606.7A patent/CN104396033B/zh active Active
- 2013-06-18 JP JP2015517733A patent/JP6103276B2/ja active Active
- 2013-06-18 US US14/409,650 patent/US20150155331A1/en not_active Abandoned
- 2013-06-18 KR KR1020147036042A patent/KR102011351B1/ko active Active
- 2013-06-18 EP EP13729948.3A patent/EP2865021B1/fr active Active
- 2013-06-18 WO PCT/EP2013/062658 patent/WO2013189949A1/fr active Application Filing
- 2013-06-21 TW TW102122240A patent/TWI518954B/zh active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11876073B2 (en) | 2018-11-08 | 2024-01-16 | Soitec | Process for collectively fabricating a plurality of semiconductor structures |
US11901483B2 (en) | 2019-01-09 | 2024-02-13 | Soitec | Optoelectronic semiconductor structure comprising a p-type injection layer based on InGaN |
Also Published As
Publication number | Publication date |
---|---|
TWI518954B (zh) | 2016-01-21 |
US20150155331A1 (en) | 2015-06-04 |
TW201405891A (zh) | 2014-02-01 |
JP2015524173A (ja) | 2015-08-20 |
KR20150032946A (ko) | 2015-03-31 |
KR102011351B1 (ko) | 2019-10-21 |
CN104396033B (zh) | 2017-07-18 |
EP2865021B1 (fr) | 2017-02-01 |
CN104396033A (zh) | 2015-03-04 |
JP6103276B2 (ja) | 2017-03-29 |
FR2992465A1 (fr) | 2013-12-27 |
WO2013189949A1 (fr) | 2013-12-27 |
EP2865021A1 (fr) | 2015-04-29 |
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