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FR2936360B1 - Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique. - Google Patents

Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique.

Info

Publication number
FR2936360B1
FR2936360B1 FR0856429A FR0856429A FR2936360B1 FR 2936360 B1 FR2936360 B1 FR 2936360B1 FR 0856429 A FR0856429 A FR 0856429A FR 0856429 A FR0856429 A FR 0856429A FR 2936360 B1 FR2936360 B1 FR 2936360B1
Authority
FR
France
Prior art keywords
submillimetric
mask
electroconductive grid
manufacturing
openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0856429A
Other languages
English (en)
Other versions
FR2936360A1 (fr
Inventor
Georges Zagdoun
Bernard Nghiem
Emmanuel Valentin
Svetoslav Tchakarov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0856429A priority Critical patent/FR2936360B1/fr
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to JP2011528401A priority patent/JP5677961B2/ja
Priority to EP09752408A priority patent/EP2326602A1/fr
Priority to PCT/FR2009/051816 priority patent/WO2010034945A1/fr
Priority to CN2009801376368A priority patent/CN102164868A/zh
Priority to KR1020117009189A priority patent/KR20110060946A/ko
Priority to US13/120,292 priority patent/US8697186B2/en
Publication of FR2936360A1 publication Critical patent/FR2936360A1/fr
Application granted granted Critical
Publication of FR2936360B1 publication Critical patent/FR2936360B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/252—Al
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/34—Masking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Biophysics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
FR0856429A 2008-09-24 2008-09-24 Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique. Expired - Fee Related FR2936360B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR0856429A FR2936360B1 (fr) 2008-09-24 2008-09-24 Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique.
EP09752408A EP2326602A1 (fr) 2008-09-24 2009-09-24 Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique
PCT/FR2009/051816 WO2010034945A1 (fr) 2008-09-24 2009-09-24 Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique
CN2009801376368A CN102164868A (zh) 2008-09-24 2009-09-24 制备用于亚毫米级导电格栅的具有亚毫米级开口的掩模的方法、掩模及亚毫米级导电格栅
JP2011528401A JP5677961B2 (ja) 2008-09-24 2009-09-24 サブミリメートル導電性グリッド用のサブミリメートル開口部を有するマスクの製造方法、並びにマスク及びサブミリメートル導電性グリッド
KR1020117009189A KR20110060946A (ko) 2008-09-24 2009-09-24 서브밀리미터 전기전도성 그리드를 위한 서브밀리미터 개구부를 갖는 마스크의 제조 방법 및 마스크 및 서브밀리미터 전기전도성 그리드
US13/120,292 US8697186B2 (en) 2008-09-24 2009-09-24 Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, and mask and submillimetric electrically conductive grid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0856429A FR2936360B1 (fr) 2008-09-24 2008-09-24 Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique.

Publications (2)

Publication Number Publication Date
FR2936360A1 FR2936360A1 (fr) 2010-03-26
FR2936360B1 true FR2936360B1 (fr) 2011-04-01

Family

ID=40796219

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0856429A Expired - Fee Related FR2936360B1 (fr) 2008-09-24 2008-09-24 Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique.

Country Status (7)

Country Link
US (1) US8697186B2 (fr)
EP (1) EP2326602A1 (fr)
JP (1) JP5677961B2 (fr)
KR (1) KR20110060946A (fr)
CN (1) CN102164868A (fr)
FR (1) FR2936360B1 (fr)
WO (1) WO2010034945A1 (fr)

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KR20090129927A (ko) * 2008-06-13 2009-12-17 주식회사 엘지화학 발열체 및 이의 제조방법
FR2958750B1 (fr) * 2010-04-13 2012-03-30 Commissariat Energie Atomique Procede de determination de la viscosite d'un film mince.
TWI584485B (zh) 2011-10-29 2017-05-21 西瑪奈米技術以色列有限公司 於基材上對齊的網路
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EP3347220B1 (fr) 2015-09-07 2021-04-14 SABIC Global Technologies B.V. Surfaces de vitrage en matière plastique de hayons arrière
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JP6732912B2 (ja) 2015-11-23 2020-07-29 サビック グローバル テクノロジーズ ビー．ブイ． プラスチックグレージングを有するウィンドウ用の点灯システム
TWI737870B (zh) 2016-12-21 2021-09-01 德商馬克專利公司 包含金屬氧化物奈米粒子及有機聚合物之旋轉塗佈材料組合物
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CN110600165B (zh) * 2019-08-24 2023-12-08 厦门派恩杰科技有限公司 一种柔性透明导电膜及其制备工艺
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CN114843035B (zh) * 2022-05-23 2024-06-21 中国人民解放军国防科技大学 基于逆向提拉法的曲面裂纹模板制备方法及金属网格导电薄膜制备方法

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Also Published As

Publication number Publication date
JP2012503852A (ja) 2012-02-09
CN102164868A (zh) 2011-08-24
WO2010034945A1 (fr) 2010-04-01
KR20110060946A (ko) 2011-06-08
US8697186B2 (en) 2014-04-15
FR2936360A1 (fr) 2010-03-26
US20110250387A1 (en) 2011-10-13
JP5677961B2 (ja) 2015-02-25
EP2326602A1 (fr) 2011-06-01

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