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FR2904690A1 - Dispositif de caracterisation d'objets uniques - Google Patents

Dispositif de caracterisation d'objets uniques Download PDF

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Publication number
FR2904690A1
FR2904690A1 FR0653248A FR0653248A FR2904690A1 FR 2904690 A1 FR2904690 A1 FR 2904690A1 FR 0653248 A FR0653248 A FR 0653248A FR 0653248 A FR0653248 A FR 0653248A FR 2904690 A1 FR2904690 A1 FR 2904690A1
Authority
FR
France
Prior art keywords
unique objects
formation
characterizing
characterizing unique
coherent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR0653248A
Other languages
English (en)
Other versions
FR2904690B1 (fr
Inventor
Serge Gidon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0653248A priority Critical patent/FR2904690B1/fr
Priority to PCT/EP2007/057956 priority patent/WO2008015230A1/fr
Priority to EP07788125A priority patent/EP2047209A1/fr
Priority to JP2009522270A priority patent/JP2009545734A/ja
Priority to US12/375,983 priority patent/US8306306B2/en
Publication of FR2904690A1 publication Critical patent/FR2904690A1/fr
Application granted granted Critical
Publication of FR2904690B1 publication Critical patent/FR2904690B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Holo Graphy (AREA)
  • Character Input (AREA)

Abstract

L'invention concerne un procédé d'examen d'un objet unique (1) comportant :- la formation d'un faisceau de rayonnement (9) cohérent à l'aide d'une source (24) cohérente,- l'illumination de l'objet par le faisceau (9) de rayonnement cohérent, focalisé à l'aide de moyens (4) de focalisation placés directement au contact de l'objet ou en position très proche de l'objet,- la formation, à l'aide de moyens (14) de détection, de l'image de la transformée de Fourier (TF) optique de la lumière diffractée par l'objet.
FR0653248A 2006-08-02 2006-08-02 Dispositif de caracterisation d'objets uniques Expired - Fee Related FR2904690B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0653248A FR2904690B1 (fr) 2006-08-02 2006-08-02 Dispositif de caracterisation d'objets uniques
PCT/EP2007/057956 WO2008015230A1 (fr) 2006-08-02 2007-08-01 Dispositif de caracterisation d'objets uniques
EP07788125A EP2047209A1 (fr) 2006-08-02 2007-08-01 Dispositif de caracterisation d'objets uniques
JP2009522270A JP2009545734A (ja) 2006-08-02 2007-08-01 ユニークオブジェクトの特徴解析装置
US12/375,983 US8306306B2 (en) 2006-08-02 2007-08-01 Device for characterizing unique objects

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0653248A FR2904690B1 (fr) 2006-08-02 2006-08-02 Dispositif de caracterisation d'objets uniques

Publications (2)

Publication Number Publication Date
FR2904690A1 true FR2904690A1 (fr) 2008-02-08
FR2904690B1 FR2904690B1 (fr) 2009-04-03

Family

ID=37635668

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0653248A Expired - Fee Related FR2904690B1 (fr) 2006-08-02 2006-08-02 Dispositif de caracterisation d'objets uniques

Country Status (5)

Country Link
US (1) US8306306B2 (fr)
EP (1) EP2047209A1 (fr)
JP (1) JP2009545734A (fr)
FR (1) FR2904690B1 (fr)
WO (1) WO2008015230A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036886A1 (nl) 2008-05-12 2009-11-16 Asml Netherlands Bv A method of measuring a target, an inspection apparatus, a scatterometer, a lithographic apparatus and a data processor.
WO2016030227A1 (fr) 2014-08-29 2016-03-03 Asml Netherlands B.V. Procédé de contrôle d'une distance entre deux objets, appareil et procédé d'inspection
KR102030100B1 (ko) 2015-03-05 2019-10-08 에이에스엠엘 네델란즈 비.브이. 검사와 계측을 위한 방법 및 장치
WO2016142214A2 (fr) * 2015-03-11 2016-09-15 Asml Netherlands B.V. Procédé et appareil d'inspection et de métrologie
IL264903B (en) 2016-09-12 2022-09-01 Asml Netherlands Bv Method of determining a property of a structure, inspection apparatus and device manufacturing method
CN109690410B (zh) 2016-09-12 2021-08-17 Asml荷兰有限公司 用于导出校正的方法和设备、用于确定结构性质的方法和设备、器件制造方法
WO2018233951A1 (fr) 2017-06-21 2018-12-27 Asml Netherlands B.V. Procédé et appareil pour détecter des variations de surface de substrat

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5428442A (en) * 1993-09-30 1995-06-27 Optical Specialties, Inc. Inspection system with in-lens, off-axis illuminator
US5880838A (en) * 1996-06-05 1999-03-09 California Institute Of California System and method for optically measuring a structure
US20030227623A1 (en) * 2000-10-18 2003-12-11 Regents Of The University Of Minnesota Ellipsometry methods and apparatus using solid immersion tunneling
US20040004726A1 (en) * 2002-07-05 2004-01-08 Abdurrahman Sezginer Overlay targets with isolated, critical-dimension features and apparatus to measure overplay
WO2005026707A2 (fr) * 2003-09-17 2005-03-24 Commissariat A L'energie Atomique Utilisation de la transformee de fourier optique pour le controle dimensionnel en microelectronique
EP1628164A2 (fr) * 2004-08-16 2006-02-22 ASML Netherlands B.V. Procédé et dispositif pour caractérisation de la lithographie par spectrométrie à résolution angulaire

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3782827A (en) * 1971-08-04 1974-01-01 Itek Corp Optical device for characterizing the surface or other properties of a sample
US4828392A (en) * 1985-03-13 1989-05-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
US5463459A (en) * 1991-04-02 1995-10-31 Hitachi, Ltd. Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process
US5471066A (en) * 1993-08-26 1995-11-28 Nikon Corporation Defect inspection apparatus of rotary type
US6750968B2 (en) * 2000-10-03 2004-06-15 Accent Optical Technologies, Inc. Differential numerical aperture methods and device
AU2005307746B2 (en) * 2004-11-16 2011-05-12 Illumina, Inc. And methods and apparatus for reading coded microbeads

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5428442A (en) * 1993-09-30 1995-06-27 Optical Specialties, Inc. Inspection system with in-lens, off-axis illuminator
US5880838A (en) * 1996-06-05 1999-03-09 California Institute Of California System and method for optically measuring a structure
US20030227623A1 (en) * 2000-10-18 2003-12-11 Regents Of The University Of Minnesota Ellipsometry methods and apparatus using solid immersion tunneling
US20040004726A1 (en) * 2002-07-05 2004-01-08 Abdurrahman Sezginer Overlay targets with isolated, critical-dimension features and apparatus to measure overplay
WO2005026707A2 (fr) * 2003-09-17 2005-03-24 Commissariat A L'energie Atomique Utilisation de la transformee de fourier optique pour le controle dimensionnel en microelectronique
EP1628164A2 (fr) * 2004-08-16 2006-02-22 ASML Netherlands B.V. Procédé et dispositif pour caractérisation de la lithographie par spectrométrie à résolution angulaire

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
BOHER P ET AL: "Innovative rapid photo-goniometry method for CD metrology", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 5375, no. 1, May 2004 (2004-05-01), pages 1302 - 1313, XP002315685, ISSN: 0277-786X *
GHISLAIN L P ET AL: "Near-field photolithography with a solid immersion lens", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 74, no. 4, 25 January 1999 (1999-01-25), pages 501 - 503, XP012023099, ISSN: 0003-6951 *

Also Published As

Publication number Publication date
JP2009545734A (ja) 2009-12-24
EP2047209A1 (fr) 2009-04-15
FR2904690B1 (fr) 2009-04-03
US8306306B2 (en) 2012-11-06
US20090316979A1 (en) 2009-12-24
WO2008015230A1 (fr) 2008-02-07

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Year of fee payment: 11

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