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FR2607820B1 - Composition de revetement photosensible et procede de preparation d'un polymere sensible aux ultraviolets - Google Patents

Composition de revetement photosensible et procede de preparation d'un polymere sensible aux ultraviolets

Info

Publication number
FR2607820B1
FR2607820B1 FR878717087A FR8717087A FR2607820B1 FR 2607820 B1 FR2607820 B1 FR 2607820B1 FR 878717087 A FR878717087 A FR 878717087A FR 8717087 A FR8717087 A FR 8717087A FR 2607820 B1 FR2607820 B1 FR 2607820B1
Authority
FR
France
Prior art keywords
ultraviolet
preparing
coating composition
sensitive polymer
photosensitive coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR878717087A
Other languages
English (en)
French (fr)
Other versions
FR2607820A1 (fr
Inventor
Songvit Setthachayanon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Armstrong World Industries Inc
Original Assignee
Armstrong World Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Armstrong World Industries Inc filed Critical Armstrong World Industries Inc
Publication of FR2607820A1 publication Critical patent/FR2607820A1/fr
Application granted granted Critical
Publication of FR2607820B1 publication Critical patent/FR2607820B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
FR878717087A 1986-12-08 1987-12-08 Composition de revetement photosensible et procede de preparation d'un polymere sensible aux ultraviolets Expired - Lifetime FR2607820B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US93960486A 1986-12-08 1986-12-08
US4546487A 1987-05-04 1987-05-04

Publications (2)

Publication Number Publication Date
FR2607820A1 FR2607820A1 (fr) 1988-06-10
FR2607820B1 true FR2607820B1 (fr) 1994-06-10

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
FR878717087A Expired - Lifetime FR2607820B1 (fr) 1986-12-08 1987-12-08 Composition de revetement photosensible et procede de preparation d'un polymere sensible aux ultraviolets

Country Status (13)

Country Link
KR (1) KR910001523B1 (es)
CN (1) CN1031227C (es)
BR (1) BR8706609A (es)
CA (1) CA1332093C (es)
CH (1) CH680622A5 (es)
DE (1) DE3741385C2 (es)
FR (1) FR2607820B1 (es)
GB (1) GB2199335B (es)
HK (1) HK60692A (es)
IT (1) IT1233418B (es)
MX (1) MX168832B (es)
NL (1) NL190785C (es)
SG (1) SG61192G (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910021456A (ko) * 1990-02-20 1991-12-20 우메모토 요시마사 수용성 광경화성 폴리우레탄 폴리(메트)아크릴레이트, 그것을 함유한 접착제 및 라미네이트된 물품의 제조방법
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
BR0014422A (pt) * 1999-09-30 2002-06-11 Basf Ag Dispersão aquosa de poliuretano curável por u.v. e calor, e, uso da dispersão de poliuretano
US20120097329A1 (en) * 2010-05-21 2012-04-26 Merck Patent Gesellschaft Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same
CN104193944A (zh) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (nl) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie.
AU597257B2 (en) * 1985-05-17 1990-05-31 M And T Chemicals Inc. Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings

Also Published As

Publication number Publication date
IT1233418B (it) 1992-03-31
GB2199335A (en) 1988-07-06
SG61192G (en) 1992-09-04
BR8706609A (pt) 1988-07-19
FR2607820A1 (fr) 1988-06-10
KR880014415A (ko) 1988-12-23
DE3741385A1 (de) 1988-06-09
NL190785C (nl) 1994-08-16
KR910001523B1 (ko) 1991-03-15
NL190785B (nl) 1994-03-16
DE3741385C2 (de) 1996-06-05
HK60692A (en) 1992-08-21
CA1332093C (en) 1994-09-20
IT8722899A0 (it) 1987-12-04
CN1031227C (zh) 1996-03-06
MX168832B (es) 1993-06-10
CH680622A5 (es) 1992-09-30
GB8728631D0 (en) 1988-01-13
GB2199335B (en) 1991-01-09
NL8702942A (nl) 1988-07-01
CN87107321A (zh) 1988-06-22

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Legal Events

Date Code Title Description
ER Errata listed in the french official journal (bopi)

Free format text: 23/88