FR2508188B1 - Compositions photosensibles et leur utilisation - Google Patents

Compositions photosensibles et leur utilisation

Info

Publication number: FR2508188B1
Authority: FR; France
Prior art keywords: photosensitive compositions; photosensitive; compositions
Prior art date: 1981-06-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

FR8210569A

Other languages

English (en)

Other versions

FR2508188A1 (fr

Inventor

John Robert Curtis

John D Renwick

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sericol Ltd

Original Assignee

Sericol Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-06-19

Filing date

1982-06-17

Publication date

1988-12-02

1982-06-17 Application filed by Sericol Ltd filed Critical Sericol Ltd

1982-12-24 Publication of FR2508188A1 publication Critical patent/FR2508188A1/fr

1988-12-02 Application granted granted Critical

1988-12-02 Publication of FR2508188B1 publication Critical patent/FR2508188B1/fr

Status Expired legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

FR8210569A 1981-06-19 1982-06-17 Compositions photosensibles et leur utilisation Expired FR2508188B1 (fr)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB8118929		1981-06-19

Publications (2)

Publication Number	Publication Date
FR2508188A1 FR2508188A1 (fr)	1982-12-24
FR2508188B1 true FR2508188B1 (fr)	1988-12-02

Family

ID=10522645

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FR8210569A Expired FR2508188B1 (fr)	1981-06-19	1982-06-17	Compositions photosensibles et leur utilisation

Country Status (7)

Country	Link
US (1)	US4564581A (fr)
AU (1)	AU557375B2 (fr)
BE (1)	BE893554A (fr)
CA (1)	CA1190783A (fr)
CH (1)	CH648137A5 (fr)
DE (1)	DE3222684A1 (fr)
FR (1)	FR2508188B1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4672021A (en) *	1985-06-03	1987-06-09	Fairmount Chemical Company	Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4777111A (en) *	1985-06-03	1988-10-11	Fairmount Chemical Company, Inc.	Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
EP0260712B1 (fr) *	1986-09-19	1995-12-27	Matsushita Electric Industrial Co., Ltd.	Procédé pour réaliser une structure à base de résine réticulée sur une couche transparente colorée
JP3059280B2 (ja) *	1991-02-22	2000-07-04	ヤマハ発動機株式会社	自動二輪車のラジエータ配置構造
US5359928A (en) *	1992-03-12	1994-11-01	Amtx, Inc.	Method for preparing and using a screen printing stencil having raised edges
US6020436A (en) *	1993-03-09	2000-02-01	The Chromaline Corporation	Photosensitive resin composition

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL94867C (fr) *	1955-02-25
NL108054C (fr) *	1959-06-09
NL275561A (fr) *	1961-03-15
FR1348383A (fr) *	1961-08-07	1964-01-10	Kalle Ag	Procédé et matériel pour l'impression sérographique
NL292007A (fr) *	1962-04-27
FR1363984A (fr) *	1962-04-27	1964-06-19	Minnesota Mining & Mfg	Feuille composite à revêtement diazoïque photo-sensible
DE1447011A1 (de) *	1963-07-12	1969-01-02	Kalle Ag	Mit o-Naphtholchinondiaziden vorsensibilisierte Druckplatten
FR1407899A (fr) *	1963-07-12	1965-08-06	Kalle Ag	Plaques d'impression sensibilisées préalablement par des o-naphtoquinone-diazides
DE1522496A1 (de) *	1966-02-12	1969-09-11	Kalle Ag	Lichtreprographische Kopiermasse und damit beschichtetes Kopiermaterial
DE2058178C2 (de) *	1970-11-26	1982-04-01	Hoechst Ag, 6000 Frankfurt	Verfahren zur Herstellung von Siebdruckformen
CH581334A5 (en) *	1973-06-27	1976-10-29	Premysl Vokral	Light-sensitive material for screen printing stencils prodn. - contg. light-sensitive or reducible silver cpds., giving stable contrast
DE2522225C2 (de) *	1975-05-20	1983-12-08	Nippon Paint Co., Ltd., Osaka	Wässriges lichtempfindliches Gemisch und seine Verwendung für die Herstellung von Siebdruckschablonen
FR2452729A1 (fr) *	1979-03-28	1980-10-24	Rhone Poulenc Syst	Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
JPS5657035A (en) *	1979-10-15	1981-05-19	Fuji Yakuhin Kogyo Kk	Positive type photosensitive composition

1982
- 1982-06-16 DE DE19823222684 patent/DE3222684A1/de not_active Withdrawn
- 1982-06-16 AU AU84905/82A patent/AU557375B2/en not_active Ceased
- 1982-06-17 FR FR8210569A patent/FR2508188B1/fr not_active Expired
- 1982-06-17 BE BE0/208379A patent/BE893554A/fr not_active IP Right Cessation
- 1982-06-17 CA CA000405362A patent/CA1190783A/fr not_active Expired
- 1982-06-18 CH CH3759/82A patent/CH648137A5/de not_active IP Right Cessation
1984
- 1984-07-13 US US06/629,759 patent/US4564581A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
CH648137A5 (de)	1985-02-28
AU557375B2 (en)	1986-12-18
DE3222684A1 (de)	1983-05-05
US4564581A (en)	1986-01-14
FR2508188A1 (fr)	1982-12-24
BE893554A (fr)	1982-10-18
AU8490582A (en)	1982-12-23
CA1190783A (fr)	1985-07-23

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Legal Events

Date	Code	Title	Description
1991-04-26	ST	Notification of lapse