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FR1363984A - Feuille composite à revêtement diazoïque photo-sensible - Google Patents

Feuille composite à revêtement diazoïque photo-sensible

Info

Publication number
FR1363984A
FR1363984A FR931982A FR931982A FR1363984A FR 1363984 A FR1363984 A FR 1363984A FR 931982 A FR931982 A FR 931982A FR 931982 A FR931982 A FR 931982A FR 1363984 A FR1363984 A FR 1363984A
Authority
FR
France
Prior art keywords
photo
composite sheet
coated composite
sensitive diazo
diazo coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR931982A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Priority to FR931982A priority Critical patent/FR1363984A/fr
Application granted granted Critical
Publication of FR1363984A publication Critical patent/FR1363984A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
FR931982A 1962-04-27 1963-04-19 Feuille composite à revêtement diazoïque photo-sensible Expired FR1363984A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR931982A FR1363984A (fr) 1962-04-27 1963-04-19 Feuille composite à revêtement diazoïque photo-sensible

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US19078962A 1962-04-27 1962-04-27
FR931982A FR1363984A (fr) 1962-04-27 1963-04-19 Feuille composite à revêtement diazoïque photo-sensible

Publications (1)

Publication Number Publication Date
FR1363984A true FR1363984A (fr) 1964-06-19

Family

ID=26200867

Family Applications (1)

Application Number Title Priority Date Filing Date
FR931982A Expired FR1363984A (fr) 1962-04-27 1963-04-19 Feuille composite à revêtement diazoïque photo-sensible

Country Status (1)

Country Link
FR (1) FR1363984A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2508188A1 (fr) * 1981-06-19 1982-12-24 Sericol Group Ltd Compositions photosensibles et leur utilisation
FR2510770A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations, pour plaques lithographiques
FR2510771A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations pour plaques lithographiques
EP0089506A2 (fr) * 1982-03-18 1983-09-28 American Hoechst Corporation Mélange sensible à la lumière à base de produits de polycondensation de sel de diazonium et matériau d'enregistrement sensible à la lumière produit à partir de ce mélange

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
EP0018860A1 (fr) * 1979-03-28 1980-11-12 Rhone-Poulenc Systemes Compositions photopolymérisables filmogènes développables à l'eau et plaque lithographique
FR2510770A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations, pour plaques lithographiques
FR2510771A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations pour plaques lithographiques
FR2508188A1 (fr) * 1981-06-19 1982-12-24 Sericol Group Ltd Compositions photosensibles et leur utilisation
EP0089506A2 (fr) * 1982-03-18 1983-09-28 American Hoechst Corporation Mélange sensible à la lumière à base de produits de polycondensation de sel de diazonium et matériau d'enregistrement sensible à la lumière produit à partir de ce mélange
EP0089506A3 (fr) * 1982-03-18 1984-04-11 American Hoechst Corporation Mélange sensible à la lumière à base de produits de polycondensation de sel de diazonium et matériau d'enregistrement sensible à la lumière produit à partir de ce mélange

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