FR2383522A1 - Procede de formation de zones metallisees sur une serie de dispositifs a semi-conducteurs - Google Patents
Procede de formation de zones metallisees sur une serie de dispositifs a semi-conducteursInfo
- Publication number
- FR2383522A1 FR2383522A1 FR7806301A FR7806301A FR2383522A1 FR 2383522 A1 FR2383522 A1 FR 2383522A1 FR 7806301 A FR7806301 A FR 7806301A FR 7806301 A FR7806301 A FR 7806301A FR 2383522 A1 FR2383522 A1 FR 2383522A1
- Authority
- FR
- France
- Prior art keywords
- semiconductor devices
- series
- forming metallized
- metallized zones
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/7688—Filling of holes, grooves or trenches, e.g. vias, with conductive material by deposition over sacrificial masking layer, e.g. lift-off
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53214—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being aluminium
- H01L23/53223—Additional layers associated with aluminium layers, e.g. adhesion, barrier, cladding layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01014—Silicon [Si]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/01015—Phosphorus [P]
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01022—Titanium [Ti]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
- Die Bonding (AREA)
- Physical Vapour Deposition (AREA)
Abstract
L'invention concerne un procédé de formation de zones métallisées sur une série de dispositifs à semi-conducteurs. Il est caractérisé par le fait qu'il comporte la préparation au soudage à bas point de fusion de l'aluminium déposé sur la partie avant de la plaquette au moyen de trois dépôts successifs sous vide et la préparation de la partie arrière par cinq dépôts successifs de métaux sous vide. L'invention s'applique à la fabrication des dispositifs à semi-conducteurs.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT21021/77A IT1075077B (it) | 1977-03-08 | 1977-03-08 | Metodo pr realizzare contatti su semiconduttori |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2383522A1 true FR2383522A1 (fr) | 1978-10-06 |
FR2383522B1 FR2383522B1 (fr) | 1983-01-28 |
Family
ID=11175492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7806301A Granted FR2383522A1 (fr) | 1977-03-08 | 1978-03-06 | Procede de formation de zones metallisees sur une serie de dispositifs a semi-conducteurs |
Country Status (5)
Country | Link |
---|---|
DE (1) | DE2809863A1 (fr) |
FR (1) | FR2383522A1 (fr) |
GB (1) | GB1563773A (fr) |
IT (1) | IT1075077B (fr) |
SE (1) | SE437589B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2591802A1 (fr) * | 1985-12-16 | 1987-06-19 | Nat Semiconductor Corp | Protection contre l'oxydation de pastilles de connexion en cuivre au moyen de palladium |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60119777A (ja) * | 1983-11-30 | 1985-06-27 | Mitsubishi Electric Corp | ゲ−トタ−ンオフサイリスタ |
DE3823347A1 (de) * | 1988-07-09 | 1990-01-11 | Semikron Elektronik Gmbh | Leistungs-halbleiterelement |
JPH07101736B2 (ja) * | 1990-06-28 | 1995-11-01 | 日本電装株式会社 | 半導体装置およびその製造方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1569479A (fr) * | 1967-07-13 | 1969-05-30 | ||
FR2097133A1 (fr) * | 1970-07-02 | 1972-03-03 | Siemens Ag | |
US3663184A (en) * | 1970-01-23 | 1972-05-16 | Fairchild Camera Instr Co | Solder bump metallization system using a titanium-nickel barrier layer |
GB1288564A (fr) * | 1969-01-24 | 1972-09-13 | ||
GB1360213A (en) * | 1971-12-16 | 1974-07-17 | Lucas Industries Ltd | Method of mounting a semi-conductor chip on a heat sink |
DE2359640A1 (de) * | 1973-11-30 | 1975-06-12 | Licentia Gmbh | Elektrischer anschlusskontakt an einen halbleiterkoerper |
-
1977
- 1977-03-08 IT IT21021/77A patent/IT1075077B/it active
-
1978
- 1978-03-06 FR FR7806301A patent/FR2383522A1/fr active Granted
- 1978-03-07 SE SE7802570A patent/SE437589B/sv not_active IP Right Cessation
- 1978-03-07 DE DE19782809863 patent/DE2809863A1/de not_active Withdrawn
- 1978-03-08 GB GB9231/78A patent/GB1563773A/en not_active Expired
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1569479A (fr) * | 1967-07-13 | 1969-05-30 | ||
GB1288564A (fr) * | 1969-01-24 | 1972-09-13 | ||
US3663184A (en) * | 1970-01-23 | 1972-05-16 | Fairchild Camera Instr Co | Solder bump metallization system using a titanium-nickel barrier layer |
FR2097133A1 (fr) * | 1970-07-02 | 1972-03-03 | Siemens Ag | |
GB1360213A (en) * | 1971-12-16 | 1974-07-17 | Lucas Industries Ltd | Method of mounting a semi-conductor chip on a heat sink |
DE2359640A1 (de) * | 1973-11-30 | 1975-06-12 | Licentia Gmbh | Elektrischer anschlusskontakt an einen halbleiterkoerper |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2591802A1 (fr) * | 1985-12-16 | 1987-06-19 | Nat Semiconductor Corp | Protection contre l'oxydation de pastilles de connexion en cuivre au moyen de palladium |
Also Published As
Publication number | Publication date |
---|---|
IT1075077B (it) | 1985-04-22 |
DE2809863A1 (de) | 1978-09-14 |
GB1563773A (en) | 1980-04-02 |
SE7802570L (sv) | 1978-09-09 |
FR2383522B1 (fr) | 1983-01-28 |
SE437589B (sv) | 1985-03-04 |
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