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FR2133315A5 - - Google Patents

Info

Publication number
FR2133315A5
FR2133315A5 FR7113515A FR7113515A FR2133315A5 FR 2133315 A5 FR2133315 A5 FR 2133315A5 FR 7113515 A FR7113515 A FR 7113515A FR 7113515 A FR7113515 A FR 7113515A FR 2133315 A5 FR2133315 A5 FR 2133315A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7113515A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7113515A priority Critical patent/FR2133315A5/fr
Priority to NL7205025A priority patent/NL7205025A/xx
Priority to GB1741072A priority patent/GB1392358A/en
Priority to DE19722218153 priority patent/DE2218153A1/de
Application granted granted Critical
Publication of FR2133315A5 publication Critical patent/FR2133315A5/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/341Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/348Electrochemical processes, e.g. electrochemical deposition or anodisation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Electrochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Optics & Photonics (AREA)
  • Catalysts (AREA)
  • Physical Vapour Deposition (AREA)
FR7113515A 1971-04-16 1971-04-16 Expired FR2133315A5 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR7113515A FR2133315A5 (de) 1971-04-16 1971-04-16
NL7205025A NL7205025A (de) 1971-04-16 1972-04-14
GB1741072A GB1392358A (en) 1971-04-16 1972-04-14 Manufacture of catalytic members
DE19722218153 DE2218153A1 (de) 1971-04-16 1972-04-14 Katalytisches Element sowie Verfahren und Vorrichtung zu seiner Herstellung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7113515A FR2133315A5 (de) 1971-04-16 1971-04-16

Publications (1)

Publication Number Publication Date
FR2133315A5 true FR2133315A5 (de) 1972-11-24

Family

ID=9075390

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7113515A Expired FR2133315A5 (de) 1971-04-16 1971-04-16

Country Status (4)

Country Link
DE (1) DE2218153A1 (de)
FR (1) FR2133315A5 (de)
GB (1) GB1392358A (de)
NL (1) NL7205025A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
EP0066175A1 (de) * 1981-05-18 1982-12-08 Hitachi, Ltd. Ionenimplantationsvorrichtung

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
EP0066175A1 (de) * 1981-05-18 1982-12-08 Hitachi, Ltd. Ionenimplantationsvorrichtung

Also Published As

Publication number Publication date
NL7205025A (de) 1972-10-18
GB1392358A (en) 1975-04-30
DE2218153A1 (de) 1972-10-26

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Legal Events

Date Code Title Description
ST Notification of lapse