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FR2092930B2 - - Google Patents

Info

Publication number
FR2092930B2
FR2092930B2 FR7039638A FR7039638A FR2092930B2 FR 2092930 B2 FR2092930 B2 FR 2092930B2 FR 7039638 A FR7039638 A FR 7039638A FR 7039638 A FR7039638 A FR 7039638A FR 2092930 B2 FR2092930 B2 FR 2092930B2
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7039638A
Other languages
French (fr)
Other versions
FR2092930A2 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of FR2092930A2 publication Critical patent/FR2092930A2/fr
Application granted granted Critical
Publication of FR2092930B2 publication Critical patent/FR2092930B2/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
FR7039638A 1970-05-05 1970-11-04 Expired FR2092930B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702022025 DE2022025C3 (en) 1970-05-05 1970-05-05 Device for producing a hollow body from semiconductor material

Publications (2)

Publication Number Publication Date
FR2092930A2 FR2092930A2 (en) 1972-01-28
FR2092930B2 true FR2092930B2 (en) 1973-02-02

Family

ID=5770320

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7039638A Expired FR2092930B2 (en) 1970-05-05 1970-11-04

Country Status (10)

Country Link
JP (1) JPS4918917B1 (en)
AT (1) AT306105B (en)
CH (1) CH561079A5 (en)
CS (1) CS163774B2 (en)
DE (1) DE2022025C3 (en)
FR (1) FR2092930B2 (en)
GB (1) GB1315167A (en)
IT (1) IT951574B (en)
NL (1) NL7017481A (en)
SE (1) SE368912B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE789719A (en) * 1972-05-16 1973-02-01 Siemens Ag METHOD AND DEVICE FOR MANUFACTURING HOLLOW BODIES FROM A SEMICONDUCTOR MATERIAL, IN PARTICULAR SILICON TUBES
DE2618273C3 (en) * 1976-04-27 1984-04-19 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Process for the deposition of polycrystalline silicon
JPH0166340U (en) * 1987-10-21 1989-04-27

Also Published As

Publication number Publication date
DE2022025B2 (en) 1979-06-28
FR2092930A2 (en) 1972-01-28
SE368912B (en) 1974-07-29
CH561079A5 (en) 1975-04-30
JPS4918917B1 (en) 1974-05-14
DE2022025A1 (en) 1971-11-18
NL7017481A (en) 1971-11-09
IT951574B (en) 1973-07-10
GB1315167A (en) 1973-04-26
AT306105B (en) 1973-03-26
DE2022025C3 (en) 1980-03-20
CS163774B2 (en) 1975-11-07

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