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FI93680C - Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi - Google Patents

Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi

Info

Publication number
FI93680C
FI93680C FI922060A FI922060A FI93680C FI 93680 C FI93680 C FI 93680C FI 922060 A FI922060 A FI 922060A FI 922060 A FI922060 A FI 922060A FI 93680 C FI93680 C FI 93680C
Authority
FI
Finland
Prior art keywords
making
thin film
support construction
construction
support
Prior art date
Application number
FI922060A
Other languages
English (en)
Swedish (sv)
Other versions
FI922060A (fi
FI93680B (fi
FI922060A0 (fi
Inventor
Veli-Pekka Viitanen
Original Assignee
Outokumpu Instr Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Outokumpu Instr Oy filed Critical Outokumpu Instr Oy
Priority to FI922060A priority Critical patent/FI93680C/fi
Publication of FI922060A0 publication Critical patent/FI922060A0/fi
Priority to FR9305427A priority patent/FR2691011B1/fr
Priority to GB9309399A priority patent/GB2266787B/en
Priority to DE4315240A priority patent/DE4315240A1/de
Publication of FI922060A publication Critical patent/FI922060A/fi
Application granted granted Critical
Publication of FI93680B publication Critical patent/FI93680B/fi
Publication of FI93680C publication Critical patent/FI93680C/fi
Priority to US08/447,737 priority patent/US5578360A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
    • H01J47/001—Details
    • H01J47/002—Vessels or containers
    • H01J47/004—Windows permeable to X-rays, gamma-rays, or particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/18—Windows permeable to X-rays, gamma-rays, or particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31721—Of polyimide

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Measurement Of Radiation (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FI922060A 1992-05-07 1992-05-07 Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi FI93680C (fi)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FI922060A FI93680C (fi) 1992-05-07 1992-05-07 Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi
FR9305427A FR2691011B1 (fr) 1992-05-07 1993-05-06 Structure de renfort pour une pellicule mince et procede pour fabriquer cette structure.
GB9309399A GB2266787B (en) 1992-05-07 1993-05-07 Thin film reinforcing structure and method for manufacturing the same
DE4315240A DE4315240A1 (de) 1992-05-07 1993-05-07 Verstärkungsstruktur für dünne Filme und Verfahren zu deren Herstellung
US08/447,737 US5578360A (en) 1992-05-07 1995-05-23 Thin film reinforcing structure and method for manufacturing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI922060A FI93680C (fi) 1992-05-07 1992-05-07 Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi
FI922060 1992-05-07

Publications (4)

Publication Number Publication Date
FI922060A0 FI922060A0 (fi) 1992-05-07
FI922060A FI922060A (fi) 1993-11-08
FI93680B FI93680B (fi) 1995-01-31
FI93680C true FI93680C (fi) 1995-05-10

Family

ID=8535241

Family Applications (1)

Application Number Title Priority Date Filing Date
FI922060A FI93680C (fi) 1992-05-07 1992-05-07 Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi

Country Status (5)

Country Link
US (1) US5578360A (fi)
DE (1) DE4315240A1 (fi)
FI (1) FI93680C (fi)
FR (1) FR2691011B1 (fi)
GB (1) GB2266787B (fi)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11505602A (ja) * 1995-01-04 1999-05-21 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 薄い放射線透過性窓の製造方法
WO1998025292A1 (en) * 1996-12-06 1998-06-11 Koninklijke Philips Electronics N.V. X-ray tube having an internal window shield
JP2000347054A (ja) * 1999-03-31 2000-12-15 Sharp Corp 光デバイス及びその製造方法、並びに、ポリイミド膜の製造方法
US7618906B2 (en) * 2005-11-17 2009-11-17 Oxford Instruments Analytical Oy Window membrane for detector and analyser devices, and a method for manufacturing a window membrane
US7474730B2 (en) * 2006-10-17 2009-01-06 Oxford Instruments Analytical Oy Compensation for fluctuations over time in the radiation characteristics of the X-ray source in an XRF analyser
US7737424B2 (en) * 2007-06-01 2010-06-15 Moxtek, Inc. X-ray window with grid structure
US7709820B2 (en) * 2007-06-01 2010-05-04 Moxtek, Inc. Radiation window with coated silicon support structure
US7660393B2 (en) 2007-06-19 2010-02-09 Oxford Instruments Analytical Oy Gas tight radiation window, and a method for its manufacturing
US9305735B2 (en) 2007-09-28 2016-04-05 Brigham Young University Reinforced polymer x-ray window
EP2190778A4 (en) 2007-09-28 2014-08-13 Univ Brigham Young CARBON NANO TUBE ASSEMBLY
US8498381B2 (en) 2010-10-07 2013-07-30 Moxtek, Inc. Polymer layer on X-ray window
US7684545B2 (en) * 2007-10-30 2010-03-23 Rigaku Innovative Technologies, Inc. X-ray window and resistive heater
US8247971B1 (en) 2009-03-19 2012-08-21 Moxtek, Inc. Resistively heated small planar filament
US7983394B2 (en) 2009-12-17 2011-07-19 Moxtek, Inc. Multiple wavelength X-ray source
FI20105626A0 (fi) 2010-06-03 2010-06-03 Hs Foils Oy Erittäin ohut berylliumikkuna ja menetelmä sen valmistamiseksi
US8526574B2 (en) 2010-09-24 2013-09-03 Moxtek, Inc. Capacitor AC power coupling across high DC voltage differential
US8804910B1 (en) 2011-01-24 2014-08-12 Moxtek, Inc. Reduced power consumption X-ray source
US8750458B1 (en) 2011-02-17 2014-06-10 Moxtek, Inc. Cold electron number amplifier
US8929515B2 (en) 2011-02-23 2015-01-06 Moxtek, Inc. Multiple-size support for X-ray window
US8989354B2 (en) 2011-05-16 2015-03-24 Brigham Young University Carbon composite support structure
US9174412B2 (en) 2011-05-16 2015-11-03 Brigham Young University High strength carbon fiber composite wafers for microfabrication
US9076628B2 (en) 2011-05-16 2015-07-07 Brigham Young University Variable radius taper x-ray window support structure
US8761344B2 (en) 2011-12-29 2014-06-24 Moxtek, Inc. Small x-ray tube with electron beam control optics
US9299469B2 (en) 2012-03-11 2016-03-29 Mark Larson Radiation window with support structure
US9173623B2 (en) 2013-04-19 2015-11-03 Samuel Soonho Lee X-ray tube and receiver inside mouth
GB2556258B (en) 2015-06-19 2021-07-14 Larson Mark High-performance, low-stress support structure with membrane

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4983501A (fi) * 1972-12-18 1974-08-12
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
US4254174A (en) * 1979-03-29 1981-03-03 Massachusetts Institute Of Technology Supported membrane composite structure and its method of manufacture
US4253029A (en) * 1979-05-23 1981-02-24 Bell Telephone Laboratories, Incorporated Mask structure for x-ray lithography
US4426247A (en) * 1982-04-12 1984-01-17 Nippon Telegraph & Telephone Public Corporation Method for forming micropattern
US4522842A (en) * 1982-09-09 1985-06-11 At&T Bell Laboratories Boron nitride X-ray masks with controlled stress
JPS5950443A (ja) * 1982-09-16 1984-03-23 Hitachi Ltd Ｘ線マスク
US4677042A (en) * 1984-11-05 1987-06-30 Canon Kabushiki Kaisha Mask structure for lithography, method for preparation thereof and lithographic method
US4741988A (en) * 1985-05-08 1988-05-03 U.S. Philips Corp. Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
JPS62202518A (ja) * 1986-02-03 1987-09-07 Fujitsu Ltd Ｘ線露光用マスク
US4770974A (en) * 1986-09-18 1988-09-13 International Business Machines Corporation Microlithographic resist containing poly(1,1-dialkylsilazane)
DE3702035A1 (de) * 1987-01-24 1988-08-04 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen und verfahren zur herstellung von zweilagenresisten sowie von halbleiterbauelementen
FI885554A (fi) * 1988-11-30 1990-05-31 Outokumpu Oy Indikationsfoenster foer analysator och dess framstaellningsfoerfarande.
JPH02208601A (ja) * 1989-02-08 1990-08-20 Seiko Instr Inc 光学用窓材及びその製造方法
US4999280A (en) * 1989-03-17 1991-03-12 International Business Machines Corporation Spray silylation of photoresist images
GB8917191D0 (en) * 1989-07-27 1989-09-13 Gec Avery Technology Strain gauge encapsulation process
EP0471650B1 (de) * 1990-08-17 1995-05-03 Ciba-Geigy Ag Copolyimide, Verfahren zu deren Herstellung und deren Verwendung
US5258091A (en) * 1990-09-18 1993-11-02 Sumitomo Electric Industries, Ltd. Method of producing X-ray window
US5300403A (en) * 1992-06-18 1994-04-05 International Business Machines Corporation Line width control in a radiation sensitive polyimide

Also Published As

Publication number Publication date
FI922060A (fi) 1993-11-08
US5578360A (en) 1996-11-26
GB9309399D0 (en) 1993-06-23
FI93680B (fi) 1995-01-31
GB2266787B (en) 1995-10-04
GB2266787A (en) 1993-11-10
FI922060A0 (fi) 1992-05-07
DE4315240A1 (de) 1993-11-11
FR2691011A1 (fr) 1993-11-12
FR2691011B1 (fr) 1996-01-05

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Legal Events

Date Code Title Description
HC Name/ company changed in application

Owner name: OUTOKUMPU INSTRUMENTS OY

BB Publication of examined application