FI873945A0 - Foerfarande foer framstaellning av vaermebestaendiga strukturerade skikt. - Google Patents
Foerfarande foer framstaellning av vaermebestaendiga strukturerade skikt.Info
- Publication number
- FI873945A0 FI873945A0 FI873945A FI873945A FI873945A0 FI 873945 A0 FI873945 A0 FI 873945A0 FI 873945 A FI873945 A FI 873945A FI 873945 A FI873945 A FI 873945A FI 873945 A0 FI873945 A0 FI 873945A0
- Authority
- FI
- Finland
- Prior art keywords
- layer
- film
- layers
- produced
- vaermebestaigiga
- Prior art date
Links
- 238000000034 method Methods 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 abstract 1
- 238000005476 soldering Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Laminated Bodies (AREA)
- Ceramic Products (AREA)
- Chemical Vapour Deposition (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Electrotherapy Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Glass Compositions (AREA)
- Insulated Conductors (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3630997 | 1986-09-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FI873945A0 true FI873945A0 (fi) | 1987-09-11 |
| FI873945L FI873945L (fi) | 1988-03-12 |
Family
ID=6309397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI873945A FI873945L (fi) | 1986-09-11 | 1987-09-11 | Foerfarande foer framstaellning av vaermebestaendiga strukturerade skikt. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4975347A (fi) |
| EP (1) | EP0259723B1 (fi) |
| JP (1) | JPS6389846A (fi) |
| KR (1) | KR880004351A (fi) |
| AT (1) | ATE88026T1 (fi) |
| DE (1) | DE3785277D1 (fi) |
| DK (1) | DK471887A (fi) |
| FI (1) | FI873945L (fi) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR9103260A (pt) * | 1990-08-02 | 1992-02-18 | Ppg Industries Inc | Composicao de resina fotossensivel que pode ser eletrodepositada e pode receber fotoimagem |
| US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
| EP0525478B1 (de) * | 1991-07-26 | 1997-06-11 | F. Hoffmann-La Roche Ag | Flüssigkristallanzeigezelle |
| JPH0756336A (ja) * | 1993-06-07 | 1995-03-03 | Ajinomoto Co Inc | 樹脂組成物 |
| US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
| US6509138B2 (en) * | 2000-01-12 | 2003-01-21 | Semiconductor Research Corporation | Solventless, resistless direct dielectric patterning |
| US20100299773A1 (en) * | 2009-05-20 | 2010-11-25 | Monsanto Technology Llc | Methods and compositions for selecting an improved plant |
| DE102013106736B3 (de) * | 2013-06-27 | 2014-12-04 | Von Ardenne Anlagentechnik Gmbh | Transportwalze und Transporteinrichtung für eine horizontale Durchlauf-Substratbehandlungsanlage |
| US11485904B2 (en) * | 2017-02-20 | 2022-11-01 | Samsung Electronics Co., Ltd. | Layered structures, production methods thereof, and liquid crystal display including the same |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE525225A (fi) * | 1951-08-20 | |||
| US2997391A (en) * | 1957-04-22 | 1961-08-22 | Time Inc | Photosensitive polyamide resins containing stilbene units in the molecule |
| US3644289A (en) * | 1969-05-29 | 1972-02-22 | Upjohn Co | Light sensitive polyurethanes prepared from hydroxyl containing polymer and an isocyanato-stilbene compound |
| US3694415A (en) * | 1970-07-15 | 1972-09-26 | Kiyoshi Honda | Coating resinous composition |
| US4304923A (en) * | 1979-02-27 | 1981-12-08 | Minnesota Mining And Manufacturing Company | Photopolymerizable oligomer |
| US4390615A (en) * | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
| US4587204A (en) * | 1983-08-29 | 1986-05-06 | General Electric Company | Photopatternable dielectric compositions, method for making and use |
| JPS61132947A (ja) * | 1984-11-30 | 1986-06-20 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
-
1987
- 1987-08-28 EP EP87112551A patent/EP0259723B1/de not_active Expired - Lifetime
- 1987-08-28 AT AT87112551T patent/ATE88026T1/de not_active IP Right Cessation
- 1987-08-28 DE DE8787112551T patent/DE3785277D1/de not_active Expired - Fee Related
- 1987-09-07 JP JP62223836A patent/JPS6389846A/ja active Pending
- 1987-09-10 DK DK471887A patent/DK471887A/da not_active Application Discontinuation
- 1987-09-11 KR KR870010084A patent/KR880004351A/ko not_active Ceased
- 1987-09-11 FI FI873945A patent/FI873945L/fi not_active Application Discontinuation
-
1990
- 1990-02-16 US US07/481,783 patent/US4975347A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| FI873945L (fi) | 1988-03-12 |
| US4975347A (en) | 1990-12-04 |
| EP0259723A3 (en) | 1988-12-07 |
| EP0259723A2 (de) | 1988-03-16 |
| DK471887A (da) | 1988-03-12 |
| EP0259723B1 (de) | 1993-04-07 |
| DK471887D0 (da) | 1987-09-10 |
| DE3785277D1 (de) | 1993-05-13 |
| KR880004351A (ko) | 1988-06-03 |
| ATE88026T1 (de) | 1993-04-15 |
| JPS6389846A (ja) | 1988-04-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FD | Application lapsed | ||
| FD | Application lapsed |
Owner name: SIEMENS AKTIENGESELLSCHAFT |