FI20106359A7 - Method for manufacturing an ultrasonic sensor and a sensor structure - Google Patents
Method for manufacturing an ultrasonic sensor and a sensor structure Download PDFInfo
- Publication number
- FI20106359A7 FI20106359A7 FI20106359A FI20106359A FI20106359A7 FI 20106359 A7 FI20106359 A7 FI 20106359A7 FI 20106359 A FI20106359 A FI 20106359A FI 20106359 A FI20106359 A FI 20106359A FI 20106359 A7 FI20106359 A7 FI 20106359A7
- Authority
- FI
- Finland
- Prior art keywords
- wafer
- sensor
- manufacturing
- ultrasonic
- polysilicon layer
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 3
- 229920005591 polysilicon Polymers 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
- B81B3/0021—Transducers for transforming electrical into mechanical energy or vice versa
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H15/00—Measuring mechanical or acoustic impedance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H9/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means
- G01H9/008—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means by using ultrasonic waves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L11/00—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00
- G01L11/04—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00 by acoustic means
- G01L11/06—Ultrasonic means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Transducers For Ultrasonic Waves (AREA)
- Micromachines (AREA)
Abstract
Keksintö koskee menetelmää ultraäänianturin (1) valmistamiseksi, joka menetelmä käsittää vaiheet, joissa muodostetaan ainakin yhden ultraäänimuuntimen (200) ja ultraääniontelon (4) sisältävä ensimmäinen kiekko (111, laitekiekko) tavanomaisella piitekniikalla. Keksinnön mukaisesti se sisältää seuraavat vaiheet: liitetään ensimmäiseen kiekkoon (111) toinen kiekko (112), joka sisältää substraatin (108) ja polypiikerroksen (201), liitetään toinen kiekko (112) ensimmäiseen kiekkoon (111) niin, että polypiikerros (201) muodostaa liitonpinnan, ja toisen kiekon (112) substraatti (109) etsataan pois ontelon (4) alueelta, jotta saadaan muodostetuksi anturikalvo (201) polypiikerroksesta (111).The invention relates to a method for manufacturing an ultrasonic sensor (1), which method comprises the steps of forming a first wafer (111, device wafer) containing at least one ultrasonic transducer (200) and an ultrasonic cavity (4) using conventional silicon technology. According to the invention, it comprises the following steps: connecting a second wafer (112) containing a substrate (108) and a polysilicon layer (201) to the first wafer (111), connecting the second wafer (112) to the first wafer (111) so that the polysilicon layer (201) forms a bonding surface, and etching the substrate (109) of the second wafer (112) away from the cavity (4) area to form a sensor film (201) from the polysilicon layer (111).
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20106359A FI20106359L (en) | 2010-12-21 | 2010-12-21 | Method for manufacturing an ultrasonic sensor and sensor structure |
PCT/FI2011/051083 WO2012085335A1 (en) | 2010-12-21 | 2011-12-07 | Method for manufacturing an ultrasonic sensor and a sensor structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20106359A FI20106359L (en) | 2010-12-21 | 2010-12-21 | Method for manufacturing an ultrasonic sensor and sensor structure |
Publications (3)
Publication Number | Publication Date |
---|---|
FI20106359A0 FI20106359A0 (en) | 2010-12-21 |
FI20106359A7 true FI20106359A7 (en) | 2012-06-22 |
FI20106359L FI20106359L (en) | 2012-06-22 |
Family
ID=43415049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20106359A FI20106359L (en) | 2010-12-21 | 2010-12-21 | Method for manufacturing an ultrasonic sensor and sensor structure |
Country Status (2)
Country | Link |
---|---|
FI (1) | FI20106359L (en) |
WO (1) | WO2012085335A1 (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6338499B2 (en) * | 2014-09-24 | 2018-06-06 | 三菱電機株式会社 | Foreign matter adhesion detection device and foreign matter adhesion detection method |
FI128447B (en) | 2016-04-26 | 2020-05-15 | Teknologian Tutkimuskeskus Vtt Oy | Apparatus associated with analysis of thin film layer and manufacturing method thereof |
GB2561613B (en) * | 2017-04-21 | 2019-05-08 | The Technology Partnership Plc | Acoustic Sensor |
WO2020072920A1 (en) | 2018-10-05 | 2020-04-09 | Knowles Electronics, Llc | Microphone device with ingress protection |
WO2020072904A1 (en) | 2018-10-05 | 2020-04-09 | Knowles Electronics, Llc | Acoustic transducers with a low pressure zone and diaphragms having enhanced compliance |
CN112789239A (en) | 2018-10-05 | 2021-05-11 | 美商楼氏电子有限公司 | Method for forming MEMS diaphragm comprising folds |
CN112763052B (en) * | 2020-12-16 | 2022-04-08 | 华中科技大学 | Broadband acoustic wave sensor for anti-electronic monitoring |
US12240748B2 (en) | 2021-03-21 | 2025-03-04 | Knowles Electronics, Llc | MEMS die and MEMS-based sensor |
US11528546B2 (en) | 2021-04-05 | 2022-12-13 | Knowles Electronics, Llc | Sealed vacuum MEMS die |
US11540048B2 (en) | 2021-04-16 | 2022-12-27 | Knowles Electronics, Llc | Reduced noise MEMS device with force feedback |
FI131134B1 (en) | 2021-04-20 | 2024-10-23 | Teknologian Tutkimuskeskus Vtt Oy | Ultrasonic sensor device and method for transmitting ultrasound |
US11649161B2 (en) | 2021-07-26 | 2023-05-16 | Knowles Electronics, Llc | Diaphragm assembly with non-uniform pillar distribution |
US11772961B2 (en) | 2021-08-26 | 2023-10-03 | Knowles Electronics, Llc | MEMS device with perimeter barometric relief pierce |
US11780726B2 (en) | 2021-11-03 | 2023-10-10 | Knowles Electronics, Llc | Dual-diaphragm assembly having center constraint |
CN114630236B (en) * | 2022-02-28 | 2024-09-10 | 歌尔微电子股份有限公司 | Vibration sensor and electronic device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7489593B2 (en) * | 2004-11-30 | 2009-02-10 | Vermon | Electrostatic membranes for sensors, ultrasonic transducers incorporating such membranes, and manufacturing methods therefor |
US7037746B1 (en) * | 2004-12-27 | 2006-05-02 | General Electric Company | Capacitive micromachined ultrasound transducer fabricated with epitaxial silicon membrane |
FI20075879A0 (en) * | 2007-12-05 | 2007-12-05 | Valtion Teknillinen | Device for measuring pressure, sound pressure variation, magnetic field, acceleration, vibration and gas composition |
-
2010
- 2010-12-21 FI FI20106359A patent/FI20106359L/en not_active Application Discontinuation
-
2011
- 2011-12-07 WO PCT/FI2011/051083 patent/WO2012085335A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2012085335A1 (en) | 2012-06-28 |
FI20106359A0 (en) | 2010-12-21 |
FI20106359L (en) | 2012-06-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Transfer of assignment of patent |
Owner name: TEKNOLOGIAN TUTKIMUSKESKUS VTT Free format text: TEKNOLOGIAN TUTKIMUSKESKUS VTT |
|
FD | Application lapsed |