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ES8607761A1 - Procedimiento para depositar un material solido a partir de una fase gaseosa sobre un substrato. - Google Patents

Procedimiento para depositar un material solido a partir de una fase gaseosa sobre un substrato.

Info

Publication number
ES8607761A1
ES8607761A1 ES540894A ES540894A ES8607761A1 ES 8607761 A1 ES8607761 A1 ES 8607761A1 ES 540894 A ES540894 A ES 540894A ES 540894 A ES540894 A ES 540894A ES 8607761 A1 ES8607761 A1 ES 8607761A1
Authority
ES
Spain
Prior art keywords
chemical vapor
vapor deposition
deposition apparatus
reaction chamber
surrounded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES540894A
Other languages
English (en)
Other versions
ES540894A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anicon Inc
Original Assignee
Anicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anicon Inc filed Critical Anicon Inc
Publication of ES8607761A1 publication Critical patent/ES8607761A1/es
Publication of ES540894A0 publication Critical patent/ES540894A0/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/80—Material per se process of making same
    • Y10S505/815—Process of making per se
    • Y10S505/818—Coating
    • Y10S505/819—Vapor deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/826—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Surgical Instruments (AREA)
  • Die Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Infusion, Injection, And Reservoir Apparatuses (AREA)

Abstract

PROCEDIMIENTO PARA LA DEPOSICION QUIMICA DE VAPOR DE RECUBRIMIENTOS NO CONTAMINADOS, ALTAMENTE UNIFORMES, DE ELEMENTOS DE COMPUESTOS SELECCIONADOS, SOBRE SUSTRATOS. CONSISTE EN PONER EN CONTACTO EL SUSTRATO CON GASES REACTIVOS QUE FLUYEN EN DIRECCION PARALELA A LA SUPERFICIE EN LA ZONA DE REACCION DE TEMPERATURA CONTROLADA, SIENDO LA DIFERENCIA DE TEMPERATURA A TRAVES DE LA ZONA DE REACCION INFERIOR A DOS GRADOS. LA TEMPERATURA CONTROLADA EN LA CAMARA DE REACCION SE OBTIENE POR CALENTAMIENTO CON RADIACION DE FUENTES DE CALEFACCION RADIANTE, QUE RODEAN SUSTANCIALMENTE LA CAMARA DE REACCION, ESTANDO LAS PAREDES DE DICHA CAMARA DE REACCION FORMADAS POR UN MATERIAL SUSTANCIALMENTE TRANSPARENTE A LA RADIACION. DE APLICACION EN RECUBRIMIENTOS PROTECTORES SOBRE HERRAMIENTAS CORTANTES.
ES540894A 1982-08-27 1985-03-01 Procedimiento para depositar un material solido a partir de una fase gaseosa sobre un substrato. Expired ES8607761A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/412,237 US4545327A (en) 1982-08-27 1982-08-27 Chemical vapor deposition apparatus

Publications (2)

Publication Number Publication Date
ES8607761A1 true ES8607761A1 (es) 1986-06-01
ES540894A0 ES540894A0 (es) 1986-06-01

Family

ID=23632185

Family Applications (2)

Application Number Title Priority Date Filing Date
ES525174A Expired ES8600086A1 (es) 1982-08-27 1983-08-26 Un aparato y procedimiento para la deposicion quimica de vapor
ES540894A Expired ES8607761A1 (es) 1982-08-27 1985-03-01 Procedimiento para depositar un material solido a partir de una fase gaseosa sobre un substrato.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
ES525174A Expired ES8600086A1 (es) 1982-08-27 1983-08-26 Un aparato y procedimiento para la deposicion quimica de vapor

Country Status (17)

Country Link
US (1) US4545327A (es)
EP (1) EP0104764B1 (es)
JP (1) JPS5959878A (es)
KR (1) KR880000472B1 (es)
AT (1) ATE47894T1 (es)
AU (1) AU538152B2 (es)
BR (1) BR8304635A (es)
CA (1) CA1196777A (es)
DE (1) DE3380823D1 (es)
DK (1) DK383683A (es)
ES (2) ES8600086A1 (es)
IL (1) IL69170A (es)
IN (1) IN159736B (es)
NO (1) NO832366L (es)
PT (1) PT77245B (es)
YU (1) YU175883A (es)
ZA (1) ZA835184B (es)

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Also Published As

Publication number Publication date
YU175883A (en) 1986-04-30
US4545327A (en) 1985-10-08
KR840005751A (ko) 1984-11-15
DE3380823D1 (en) 1989-12-14
AU1848083A (en) 1984-03-01
BR8304635A (pt) 1984-04-10
JPS6256232B2 (es) 1987-11-25
CA1196777A (en) 1985-11-19
KR880000472B1 (ko) 1988-04-07
IL69170A (en) 1987-03-31
ZA835184B (en) 1984-03-28
ES525174A0 (es) 1985-10-01
EP0104764A2 (en) 1984-04-04
IL69170A0 (en) 1983-11-30
ES540894A0 (es) 1986-06-01
JPS5959878A (ja) 1984-04-05
IN159736B (es) 1987-06-06
NO832366L (no) 1984-02-28
PT77245A (en) 1983-09-01
EP0104764A3 (en) 1984-05-16
EP0104764B1 (en) 1989-11-08
DK383683A (da) 1984-02-28
AU538152B2 (en) 1984-08-02
DK383683D0 (da) 1983-08-22
ES8600086A1 (es) 1985-10-01
ATE47894T1 (de) 1989-11-15
PT77245B (en) 1986-02-12

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