[go: up one dir, main page]

ES392672A1 - IMPROVEMENTS IN THE MANUFACTURE OF SEMI-CONDUCTOR PARTICLE DETECTORS OF NIP STRUCTURES. - Google Patents

IMPROVEMENTS IN THE MANUFACTURE OF SEMI-CONDUCTOR PARTICLE DETECTORS OF NIP STRUCTURES.

Info

Publication number
ES392672A1
ES392672A1 ES392672A ES392672A ES392672A1 ES 392672 A1 ES392672 A1 ES 392672A1 ES 392672 A ES392672 A ES 392672A ES 392672 A ES392672 A ES 392672A ES 392672 A1 ES392672 A1 ES 392672A1
Authority
ES
Spain
Prior art keywords
manufacture
semi
particle detectors
nip
conductor particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES392672A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of ES392672A1 publication Critical patent/ES392672A1/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/29Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
    • H10F30/292Bulk-effect radiation detectors, e.g. Ge-Li compensated PIN gamma-ray detectors
    • H10F30/2925Li-compensated PIN gamma-ray detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

Perfeccionamientos en la fabricación de detectores de partículas de semi-conductor de estructuras NIP, caracterizados porque se frota la zona N de un detector NIP difundido y migrado al litio clásico, porque se deposita por evaporación en vacío sobre la muestra IP restante una capa metálica únicamente sobre la zona intrínseca I, y porque se implanta iones litio, en dicha zona intrínseca a través de dicha capa metálica.Improvements in the manufacture of semiconductor particle detectors with NIP structures, characterized in that the N zone of a diffused and migrated NIP detector is rubbed onto classical lithium, because a metallic layer is deposited by vacuum evaporation on the remaining IP sample only on the intrinsic zone I, and because lithium ions are implanted in said intrinsic zone through said metallic layer.

ES392672A 1970-06-26 1971-06-26 IMPROVEMENTS IN THE MANUFACTURE OF SEMI-CONDUCTOR PARTICLE DETECTORS OF NIP STRUCTURES. Expired ES392672A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7023817A FR2094616A5 (en) 1970-06-26 1970-06-26

Publications (1)

Publication Number Publication Date
ES392672A1 true ES392672A1 (en) 1975-04-16

Family

ID=9057886

Family Applications (1)

Application Number Title Priority Date Filing Date
ES392672A Expired ES392672A1 (en) 1970-06-26 1971-06-26 IMPROVEMENTS IN THE MANUFACTURE OF SEMI-CONDUCTOR PARTICLE DETECTORS OF NIP STRUCTURES.

Country Status (7)

Country Link
BE (1) BE768570A (en)
CH (1) CH546412A (en)
DE (1) DE2131755C3 (en)
ES (1) ES392672A1 (en)
FR (1) FR2094616A5 (en)
GB (1) GB1320834A (en)
IT (1) IT939723B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2909564C2 (en) * 1979-03-12 1981-01-08 Geraetewerk Lahr Gmbh, 7630 Lahr Device for vibration reduction in a record player

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3413528A (en) * 1966-03-03 1968-11-26 Atomic Energy Commission Usa Lithium drifted semiconductor radiation detector
US3413529A (en) * 1966-03-08 1968-11-26 Atomic Energy Commission Usa A semiconductor detector having a lithium compensated shelf region between opposite conductivity type regions
FR1532346A (en) * 1967-04-12 1968-07-12 Centre Nat Rech Scient Improvements to nuclear radiation detectors, of the n-i-p diode type

Also Published As

Publication number Publication date
DE2131755C3 (en) 1975-06-12
DE2131755A1 (en) 1972-01-20
DE2131755B2 (en) 1974-10-17
FR2094616A5 (en) 1972-02-04
IT939723B (en) 1973-02-10
CH546412A (en) 1974-02-28
BE768570A (en) 1971-11-03
GB1320834A (en) 1973-06-20

Similar Documents

Publication Publication Date Title
ES385638A1 (en) Methods of manufacturing a semiconductor device
FR1174403A (en) Set made up of several seats that can be used in particular in meeting rooms
SE7608839L (en) SEMICONDUCTOR DEVICE
ES392672A1 (en) IMPROVEMENTS IN THE MANUFACTURE OF SEMI-CONDUCTOR PARTICLE DETECTORS OF NIP STRUCTURES.
GB1310942A (en) Semiconductor devices with diffused platinum
CA944869A (en) Diffusion of doping materials into wafers of semi-conductor material
GB916379A (en) Improvements in and relating to semiconductor junction units
GB1511410A (en) Cadmium telluride transducer or radiation detector
JPS544084A (en) Manufacture for semiconductor integrated circuit
JPS5277686A (en) Manufacture of semiconductor diaphragm
GB691795A (en) Improvements relating to the manufacture of photo-electric sensitive or secondary electron emissive surfaces
JPS53132274A (en) Semiconductor device and its production
JPS52149986A (en) Semiconductor device and its production
KUZNETSOV et al. Radial diffusion of electrons of energy greater than 100 kev in the outer radiation belt(Time variations of electron intensity in outer radiation belt observed by satellites, studying electron radial diffusion and drift velocity)
ES182082A1 (en) IMPROVEMENTS IN PHOTOELECTRIC CELLS, WITH THE CORRESPONDING MANUFACTURING PROCEDURE
BERGER et al. Production and annealing of defects in Li-diffused silicon after 30-MeV electron irradiation at 300 K(Production and annealing of defects in lithium diffused silicon after electron irradiation)
GB929240A (en) Improvements in or relating to photo-sensitive semi-conductor devices
GB1236652A (en) Photothyristors
FR2144537A1 (en) Radiation detector - with semiconductor body and conducting type coated recesses or cavities
JPS55134970A (en) Photofiring thyristor
GOODYEAR et al. Electron detachment from negative oxygen ions at beam energies in the range 3 to 100 ev(Electron detachment cross sections for negative atomic and molecular O ions with incident energies between 3 and 100 ev)
ES385637A1 (en) A method of manufacturing a semiconductor device. (Machine-translation by Google Translate, not legally binding)
GB924858A (en) Improvements in and relating to semi-conductor materials
JPS56165352A (en) Semiconductor memory storage
GB1266431A (en)