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ES2036956A1 - Procedimiento y dispositivo de recubrimiento de substratos. - Google Patents

Procedimiento y dispositivo de recubrimiento de substratos.

Info

Publication number
ES2036956A1
ES2036956A1 ES929200529A ES9200529A ES2036956A1 ES 2036956 A1 ES2036956 A1 ES 2036956A1 ES 929200529 A ES929200529 A ES 929200529A ES 9200529 A ES9200529 A ES 9200529A ES 2036956 A1 ES2036956 A1 ES 2036956A1
Authority
ES
Spain
Prior art keywords
substrates
sputtering chamber
coating
sputtering
vacuum apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES929200529A
Other languages
English (en)
Other versions
ES2036956B1 (es
Inventor
Klaus Harting
Christian Schaefer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG filed Critical Leybold AG
Publication of ES2036956A1 publication Critical patent/ES2036956A1/es
Application granted granted Critical
Publication of ES2036956B1 publication Critical patent/ES2036956B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PROCEDIMIENTO Y DISPOSITIVO PARA EL RECUBRIMIENTO DE SUBSTRATOS (1, 1'', ...) PREFERIBLEMENTE MEDIANTE PULVERIZADO CATODICO EN UNA INSTALACION DE VACIO QUE SE COMPONE DE POR LO MENOS UNA CAMARA (6) DE PULVERIZADO, EN LA QUE SE PUEDEN APLICAR DIFERENTES SISTEMAS DE CAPAS A LOS SUBSTRATOS (1, 1'', ...) PREFERIBLEMENTE CURVADOS A SER RECUBIERTOS, LOS SUBSTRATOS (1, 1'', ...) SE PUEDEN MOVER EN UN SENTIDO (B) DE LA MARCHA A TRAVES DE LA CAMARA (6) DE PULVERIZADO Y RECORREN LA CAMARA (6) DE PULVERIZADO EN EL SENTIDO (B) DE LA MARCHA ASI COMO EN EL SENTIDO OPUESTO VARIAS VECES A LA MANERA LLAMADA DE MULTIPASO, DONDE LOS SUBSTRATOS (1, 1'', ...) A SER RECUBIERTOS SE REUNEN A LA ENTRADA DE LA CAMARA (6) DE PULVERIZADO EN GRUPOS DE VARIOS, PREFERIBLEMENTE DE DOS SUBSTRATOS (1, 1'', ...) POR GRUPO, O BIEN DE CARRIERS (12, 12'', ...) QUE LLEVAN A LOS SUBSTRATOS, Y RECORREN LA CAMARA (6) DE PULVERIZADO SIMULTANEAMENTEA LA MANERA LLAMADA DE MULTIPASO DUAL.
ES9200529A 1991-04-09 1992-03-10 Procedimiento y dispositivo de recubrimiento de substratos. Expired - Fee Related ES2036956B1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4111384A DE4111384C2 (de) 1991-04-09 1991-04-09 Vorrichtung zur Beschichtung von Substraten

Publications (2)

Publication Number Publication Date
ES2036956A1 true ES2036956A1 (es) 1993-06-01
ES2036956B1 ES2036956B1 (es) 1994-04-01

Family

ID=6429096

Family Applications (1)

Application Number Title Priority Date Filing Date
ES9200529A Expired - Fee Related ES2036956B1 (es) 1991-04-09 1992-03-10 Procedimiento y dispositivo de recubrimiento de substratos.

Country Status (5)

Country Link
US (1) US5340454A (es)
JP (1) JPH05106034A (es)
DE (1) DE4111384C2 (es)
ES (1) ES2036956B1 (es)
LU (1) LU88067A1 (es)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4325011A1 (de) * 1993-07-28 1995-03-02 Herlitz Michael Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben
DE4407909C3 (de) * 1994-03-09 2003-05-15 Unaxis Deutschland Holding Verfahren und Vorrichtung zum kontinuierlichen oder quasi-kontinuierlichen Beschichten von Brillengläsern
DE19500964A1 (de) * 1995-01-14 1996-07-18 Leybold Ag Vorrichtung zum Beschichten
JP3403550B2 (ja) * 1995-06-29 2003-05-06 松下電器産業株式会社 スパッタリング装置とスパッタリング方法
ES2279517T3 (es) * 1995-10-27 2007-08-16 APPLIED MATERIALS GMBH & CO. KG Dispositivo para recubrir un sustrato.
WO1997028290A1 (en) * 1996-01-31 1997-08-07 Optical Coating Laboratory, Inc. Multi-chamber continuous sputter coating system
TW320687B (es) * 1996-04-01 1997-11-21 Toray Industries
DE19651378A1 (de) * 1996-12-11 1998-06-18 Leybold Systems Gmbh Vorrichtung zum Aufstäuben von dünnen Schichten auf flache Substrate
EP0995812A1 (en) * 1998-10-13 2000-04-26 Vacumetal B.V. Apparatus for flow-line treatment of articles in an artificial medium
US6309516B1 (en) * 1999-05-07 2001-10-30 Seagate Technology Llc Method and apparatus for metal allot sputtering
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6881269B2 (en) * 2000-08-17 2005-04-19 Novartis Ag Lens plasma coating system
CN1261233C (zh) * 2000-10-04 2006-06-28 陶氏康宁爱尔兰有限公司 形成涂层的方法和设备
DE10205168A1 (de) * 2002-02-07 2003-08-21 Ardenne Anlagentech Gmbh Verfahren zur Zwischenbehandlung von Substraten in einer In-Line-Vakuumbeschichtungsanlage
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
TW200308187A (en) * 2002-04-10 2003-12-16 Dow Corning Ireland Ltd An atmospheric pressure plasma assembly
GB0208261D0 (en) * 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly
US7879201B2 (en) * 2003-08-11 2011-02-01 Veeco Instruments Inc. Method and apparatus for surface processing of a substrate
US9206500B2 (en) * 2003-08-11 2015-12-08 Boris Druz Method and apparatus for surface processing of a substrate using an energetic particle beam
GB0323295D0 (en) * 2003-10-04 2003-11-05 Dow Corning Deposition of thin films
US9051211B2 (en) * 2004-04-27 2015-06-09 Ppg Industries Ohio, Inc. Effects of methods of manufacturing sputtering targets on characteristics of coatings
JP2008519411A (ja) * 2004-11-05 2008-06-05 ダウ・コーニング・アイルランド・リミテッド プラズマシステム
EP1698715A1 (de) * 2005-03-03 2006-09-06 Applied Films GmbH & Co. KG Anlage zum Beschichten eines Substrats und Einschubelement
GB0509648D0 (en) * 2005-05-12 2005-06-15 Dow Corning Ireland Ltd Plasma system to deposit adhesion primer layers
US20130206583A1 (en) * 2007-09-18 2013-08-15 Veeco Instruments, Inc. Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam
US20090169751A1 (en) * 2007-12-27 2009-07-02 Exatec Llc Multi-Pass Vacuum Coating Systems
DE102008024372B4 (de) * 2008-05-20 2013-08-22 Von Ardenne Anlagentechnik Gmbh Verfahren zum Transport von Substraten in Vakuumbeschichtungseinrichtungen
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
KR20140110851A (ko) * 2011-11-08 2014-09-17 인테벡, 인코포레이티드 기판 프로세싱 시스템 및 방법
WO2013101851A1 (en) * 2011-12-27 2013-07-04 Intevac, Inc. System architecture for combined static and pass-by processing
US9318332B2 (en) 2012-12-19 2016-04-19 Intevac, Inc. Grid for plasma ion implant
DE102021134254A1 (de) * 2021-12-22 2023-06-22 Rainer Cremer Inline-Anlage zum Beschichtenvon einzelnen oder von Gruppen von Substraten und Verfahren zum Beschichten einzelner Substrate oder Substratgruppen in einer Inline-Beschichtungsanlage

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3584847A (en) * 1968-05-31 1971-06-15 Western Electric Co Advancing workpieces through a sputtering chamber
GB1365492A (en) * 1971-02-05 1974-09-04 Triplex Safety Glass Co Metal oxide films
US3793167A (en) * 1972-06-01 1974-02-19 Globe Amerada Glass Co Apparatus for manufacturing metal-coated glass
US3945903A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
DE2844491C2 (de) * 1978-10-12 1983-04-14 Leybold-Heraeus GmbH, 5000 Köln Vakuum-Beschichtungsanlage mit einer Einrichtung zum kontinuierlichen Substrattransport
US4274936A (en) * 1979-04-30 1981-06-23 Advanced Coating Technology, Inc. Vacuum deposition system and method
NL8203318A (nl) * 1982-08-24 1984-03-16 Integrated Automation Inrichting voor processing van substraten.
DE3400843A1 (de) * 1983-10-29 1985-07-18 VEGLA Vereinigte Glaswerke GmbH, 5100 Aachen Verfahren zum herstellen von autoglasscheiben mit streifenfoermigen blendschutzfiltern durch bedampfen oder sputtern, und vorrichtung zur durchfuehrung des verfahrens
AU572375B2 (en) * 1985-01-31 1988-05-05 Boc Group, Inc., The Transporting of workpiece to and from vacuum coating apparatus
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
VACUUM, vol. 38, n‘ 8-10, 1988; H. WEISWEILER et al.: "Decoupling of processes in coating systems by pumped buffers", pßg. 677-681 *

Also Published As

Publication number Publication date
DE4111384A1 (de) 1992-10-15
US5340454A (en) 1994-08-23
LU88067A1 (de) 1992-08-25
ES2036956B1 (es) 1994-04-01
DE4111384C2 (de) 1999-11-04
JPH05106034A (ja) 1993-04-27

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Legal Events

Date Code Title Description
PC2A Transfer of patent
FD1A Patent lapsed

Effective date: 20041102