EP3070188A2 - Method for coating a press-in pin and press-in pin - Google Patents
Method for coating a press-in pin and press-in pin Download PDFInfo
- Publication number
- EP3070188A2 EP3070188A2 EP16000515.3A EP16000515A EP3070188A2 EP 3070188 A2 EP3070188 A2 EP 3070188A2 EP 16000515 A EP16000515 A EP 16000515A EP 3070188 A2 EP3070188 A2 EP 3070188A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- press
- layer
- silver
- electrolyte
- fit pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000000576 coating method Methods 0.000 title claims abstract description 13
- 239000011248 coating agent Substances 0.000 title claims abstract description 11
- 229910001316 Ag alloy Inorganic materials 0.000 claims abstract description 24
- 229910052709 silver Inorganic materials 0.000 claims abstract description 22
- 239000003792 electrolyte Substances 0.000 claims abstract description 20
- 239000010949 copper Substances 0.000 claims abstract description 12
- 229910052802 copper Inorganic materials 0.000 claims abstract description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 7
- 239000012535 impurity Substances 0.000 claims abstract description 5
- 239000011135 tin Substances 0.000 claims description 23
- 229910052718 tin Inorganic materials 0.000 claims description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 10
- 239000004332 silver Substances 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 claims description 3
- IOUCSUBTZWXKTA-UHFFFAOYSA-N dipotassium;dioxido(oxo)tin Chemical compound [K+].[K+].[O-][Sn]([O-])=O IOUCSUBTZWXKTA-UHFFFAOYSA-N 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 claims description 3
- 229940098221 silver cyanide Drugs 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 2
- 239000004471 Glycine Substances 0.000 claims description 2
- HLCFGWHYROZGBI-JJKGCWMISA-M Potassium gluconate Chemical compound [K+].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O HLCFGWHYROZGBI-JJKGCWMISA-M 0.000 claims description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052946 acanthite Inorganic materials 0.000 claims description 2
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 239000004202 carbamide Substances 0.000 claims description 2
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 claims description 2
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 2
- HKSGQTYSSZOJOA-UHFFFAOYSA-N potassium argentocyanide Chemical compound [K+].[Ag+].N#[C-].N#[C-] HKSGQTYSSZOJOA-UHFFFAOYSA-N 0.000 claims description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 2
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 claims description 2
- 239000004224 potassium gluconate Substances 0.000 claims description 2
- 235000013926 potassium gluconate Nutrition 0.000 claims description 2
- 229960003189 potassium gluconate Drugs 0.000 claims description 2
- DPLVEEXVKBWGHE-UHFFFAOYSA-N potassium sulfide Chemical compound [S-2].[K+].[K+] DPLVEEXVKBWGHE-UHFFFAOYSA-N 0.000 claims description 2
- 229940100890 silver compound Drugs 0.000 claims description 2
- 150000003379 silver compounds Chemical class 0.000 claims description 2
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 claims description 2
- 229910000367 silver sulfate Inorganic materials 0.000 claims description 2
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 claims description 2
- 229940056910 silver sulfide Drugs 0.000 claims description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 2
- 239000000176 sodium gluconate Substances 0.000 claims description 2
- 235000012207 sodium gluconate Nutrition 0.000 claims description 2
- 229940005574 sodium gluconate Drugs 0.000 claims description 2
- 229940079864 sodium stannate Drugs 0.000 claims description 2
- 150000003606 tin compounds Chemical class 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- FAKFSJNVVCGEEI-UHFFFAOYSA-J tin(4+);disulfate Chemical compound [Sn+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O FAKFSJNVVCGEEI-UHFFFAOYSA-J 0.000 claims description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910017482 Cu 6 Sn 5 Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/64—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/51—Fixed connections for rigid printed circuits or like structures
- H01R12/55—Fixed connections for rigid printed circuits or like structures characterised by the terminals
- H01R12/58—Fixed connections for rigid printed circuits or like structures characterised by the terminals terminals for insertion into holes
- H01R12/585—Terminals having a press fit or a compliant portion and a shank passing through a hole in the printed circuit board
Definitions
- the invention relates to a method for coating a press-fit pin and a press-in pin.
- the EP 2 596 157 B1 discloses a method of making a press-fit pin.
- a layer is deposited on a base body galvanically from methanesulfonsaurer solution, which is formed from a tin alloy.
- the US 2009/0239398 A1 discloses a press-in pin which is coated with a layer made of a tin alloy.
- the tin alloy contains 0.5 to 15 wt.% Silver.
- the US Pat. No. 6,361,823 B1 discloses an electroless method for coating a base made of copper or a copper alloy.
- the base body is first coated with a layer made of tin and then coated with an outer layer made of an alloy.
- the DE 10 2005 055 742 A1 discloses a method of making a contactable layer on a metal element.
- the contact-adapted layer is formed essentially of tin. It may have intermetallic silver / tin phases with a silver content in the range of 25 to 40 wt.%.
- whiskers growing out of the layer sometimes occurs. Such whiskers can lead to the formation of short circuits.
- the object of the invention is to eliminate the disadvantages of the prior art.
- a method for producing a press-fit pin and a press-in pin are to be specified in which the tendency to form whiskers is reduced.
- a method for coating a Einpresspins wherein a base made of copper or a copper alloy is galvanically coated from an alkaline-cyanide electrolyte at least partially with a layer of a silver alloy, the more than 50 wt.% Ag, a Contains residual Sn and unavoidable impurities.
- the layer is not deposited galvanically from an acidic electrolyte, but from an alkaline-cyanide electrolyte on the base body.
- the silver alloy forming the layer contains more than 50% by weight of Ag, preferably at least 55% by weight of Ag. It has surprisingly been found that with the method according to the invention, a largely pore-free connection of the layer to the base body can be achieved. In particular, it is possible with the proposed method to produce homogeneous single-phase layers.
- a press-in pin produced by the method according to the invention is characterized by a particularly low tendency to form whiskers.
- silver cyanide silver cyanide
- potassium silver cyanide silver sulfide
- silver sulfate silver sulfate
- tin compounds the following compounds can be used to prepare the electrolyte: potassium stannate, sodium stannate, tin oxide, tin sulfate.
- At least one of the following compounds is advantageously added to the electrolyte: sodium cyanide, potassium cyanide, sodium gluconate, potassium gluconate, ethylenediamine, ammonia, triethanolamine, glycine, thiourea, urea, nitrilotriacetic acid.
- the abovementioned compounds serve as complexing agents or as conducting salts.
- At least one of the following further compounds may be added to the electrolyte: sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, potassium sulphide.
- the abovementioned further compounds act as complexing agents with respect to tin. Apart from that, the conductivity of the electrolyte can be adjusted with the other compounds.
- the galvanic coating is advantageously carried out at a current density in the range of 5 to 20 A / dm 2 .
- the pH of the electrolyte is suitably adjusted to 7 to 14, preferably to more than 8.
- a temperature of the electrolyte may be adjusted to a value in the range of 40 to 90 ° C, preferably 50 to 70 ° C in the coating. More preferably, the temperature is 55 to 60 ° C.
- an anode made of any one of the following materials can be used: graphite, platinum-plated titanium or niobium, silver, tin, silver or tin alloy.
- An anode made of titanium or niobium may also be coated with a layer of a mixed oxide based on Ir, Ta, Nb instead of the platinum. It is also possible to use an anode made of silver and a further anode made of tin, which are operated in two separate circuits. Further, anodes can be used in an anolyte with a diaphragm.
- the layer in a thickness of 0.1 to 0.8 microns, preferably 0.2 to 0.6 microns applied.
- an intermediate layer of Ni or Cu can be galvanically applied to the base body.
- the adhesion of the layer can be improved.
- the applied to the body layer for a period of 1 to 10 seconds to a temperature in the range of 200 to 500 ° C, preferably 300 to 400 ° C, heated.
- the heating causes a crystal growth in the layer.
- it can be reduced in the alloy, the concentration of Sn.
- intermetallic phases can form Ag 3 Sn or Ag 4 Sn. Such intermetallic phases are particularly effective against the formation of whiskers.
- the heat treatment may cause the formation of further intermetallic phases between the base body and the layer.
- Such further intermetallic phases consist for example of Cu 6 Sn 5 or of Cu 3 Sn.
- the heat treatment may cause the formation of a further intermetallic phase between the Ni intermediate layer and the layer made of the silver alloy.
- Such a further intermetallic phase is formed, for example, from Ni 3 Sn 4 .
- a press-in is proposed, with a base body made of copper or a copper alloy and the base body at least partially covering layer, wherein the layer is formed of a silver alloy containing at least 50 wt.% Ag, a balance of Sn and contains unavoidable impurities.
- the proposed press-in pin can be produced by the process according to the invention. It advantageously contains no lead. With the proposed layer, formation of whiskers can be effectively counteracted.
- the silver alloy contains more than 63 wt.% And less than 90 wt.% Ag.
- the silver alloy contains 73% by weight to 89% by weight of Ag.
- the silver alloy contains 75 wt.% To 85 wt.% Ag.
- the silver alloy is in particular formed from Ag 3 Sn and / or from Ag 4 Sn. It is in particular formed from an intermetallic phase of Ag 3 Sn or Ag 4 Sn. Such an intermetallic phase causes the formation of whiskers safely and reliably.
- the silver alloy is greater than 95%, preferably greater than 99%, of a single such intermetallic phase.
- the silver alloy may also be formed from an Ag or Sn matrix containing at least one intermetallic phase of Ag 3 Sn and / or Ag 4 Sn.
- a thickness of the layer is suitably 0.1 to 0.8 ⁇ m, preferably 0.2 to 0.6 ⁇ m.
- the thickness of the layer is particularly preferably 0.3 to 0.4 ⁇ m.
- an intermediate layer formed of Ni or Cu is provided between the base body and the layer.
- the intermediate layer may have a further thickness of 1.0 to 3.0 ⁇ m, preferably 1.1 to 2.5 ⁇ m.
- An average crystal size of the crystals forming the layer is advantageously 50 to 800 nm, preferably 100 to 600 nm, particularly preferably 150 to 400 nm.
- an electrolyte is used, the composition of which is shown in the table below.
- the pH of the electrolyte is adjusted to a value in the range of 8 to 13 by the addition of sodium hydroxide, potassium hydroxide or the like.
- the electrolytic deposition of the layer takes place at a temperature in the range of 50 to 70 ° C. and a current density of 5 to 20 A / dm 2 .
- the concentrations of the silver and tin-providing compounds are adjusted so that a single-phase intermetallic compound of Ag 3 Sn or Ag 4 Sn is formed.
- the layer deposited on the base made of copper or a copper alloy may subsequently be heated to a temperature in the range of 300 to 400 ° C for a period of 1 to 10 seconds.
- the press-in pin produced according to the invention is free of lead.
- the layer of silver alloy deposited thereon is hard, tough, and has a particularly low tendency to form whiskers.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Die Erfindung betrifft ein Verfahren zur Beschichtung eines Einpresspins, wobei ein aus Kupfer oder einer Kupferlegierung hergestellter Grundkörper galvanisch aus einem alkalischen-cyanidischer Elektrolyten mit einer Schicht aus einer Silberlegierung beschichtet wird, die mehr als 50 Gew.% Ag, einen Rest aus Sn und unvermeidbaren Verunreinigungen enthält.The invention relates to a method for coating a press-fit, wherein a base body made of copper or a copper alloy is galvanically coated from an alkaline cyanide electrolyte with a layer of a silver alloy containing more than 50 wt.% Ag, a balance of Sn and unavoidable Contains impurities.
Description
Die Erfindung betrifft ein Verfahren zur Beschichtung eines Einpresspins sowie einen Einpresspin.The invention relates to a method for coating a press-fit pin and a press-in pin.
Die
Die
Die
Die
Die vorgenannten Beschichtungen aus einer Silber enthaltenden Zinnlegierung ersetzen frühere Beschichtungen, welche aus bleihaltigen Zinnlegierungen hergestellt waren. Der Ersatz ist wegen der EU-Richtlinie 2002/95/EG erforderlich, nach der die Verwendung von Blei als umweltschädliche Substanz verboten wird.The aforementioned coatings of a silver-containing tin alloy replace earlier coatings made from lead-containing tin alloys. The replacement is required because of EU Directive 2002/95 / EC, which prohibits the use of lead as an environmentally hazardous substance.
Bei einer aus einer Silber-haltigen Zinnlegierung hergestellten Schicht kommt es in der Praxis allerdings mitunter zur Bildung von aus der Schicht herauswachsenden Whiskern. Derartige Whisker können zur Bildung von Kurzschlüssen führen.In the case of a layer made of a silver-containing tin alloy, however, in practice the formation of whiskers growing out of the layer sometimes occurs. Such whiskers can lead to the formation of short circuits.
Aufgabe der Erfindung ist es, die Nachteile nach dem Stand der Technik zu beseitigen. Es soll insbesondere ein Verfahren zur Herstellung eines Einpresspins sowie einen Einpresspin angegeben werden, bei dem die Neigung zur Bildung von Whiskern reduziert ist.The object of the invention is to eliminate the disadvantages of the prior art. In particular, a method for producing a press-fit pin and a press-in pin are to be specified in which the tendency to form whiskers is reduced.
Diese Aufgabe wird durch die Merkmale der Patentansprüche 1 und 14 gelöst. Zweckmäßige Ausgestaltungen der Erfindung ergeben sich aus den Merkmalen der Patentansprüche 2 bis 13 und 15 bis 23.This object is solved by the features of claims 1 and 14. Advantageous embodiments of the invention will become apparent from the features of claims 2 to 13 and 15 to 23.
Nach Maßgabe der Erfindung wird ein Verfahren zur Beschichtung eines Einpresspins vorgeschlagen, wobei ein aus Kupfer oder einer Kupferlegierung hergestellter Grundkörper galvanisch aus einem alkalisch-cyanidischen Elektrolyten zumindest abschnittsweise mit einer Schicht aus einer Silberlegierung beschichtet wird, die mehr als 50 Gew.% Ag, einen Rest aus Sn und unvermeidbaren Verunreinigungen enthält.According to the invention, a method for coating a Einpresspins is proposed, wherein a base made of copper or a copper alloy is galvanically coated from an alkaline-cyanide electrolyte at least partially with a layer of a silver alloy, the more than 50 wt.% Ag, a Contains residual Sn and unavoidable impurities.
In Abkehr vom Stand der Technik wird die Schicht galvanisch nicht aus einem sauren Elektrolyten, sondern aus einem alkalisch-cyanidischen Elektrolyten auf dem Grundkörper abgeschieden. Die die Schicht bildende Silberlegierung enthält mehr als 50 Gew.% Ag, vorzugsweise zumindest 55 Gew.% Ag. - Es hat sich überraschenderweise gezeigt, dass mit dem erfindungsgemäßen Verfahren eine weitgehend porenfreie Anbindung der Schicht an den Grundkörper erreicht werden kann. Insbesondere gelingt es mit dem vorgeschlagenen Verfahren, homogene einphasige Schichten herzustellen. Ein nach dem erfindungsgemäßen Verfahren hergestellter Einpresspin zeichnet sich durch eine besonders geringe Neigung zur Bildung von Whiskern aus.In departure from the prior art, the layer is not deposited galvanically from an acidic electrolyte, but from an alkaline-cyanide electrolyte on the base body. The silver alloy forming the layer contains more than 50% by weight of Ag, preferably at least 55% by weight of Ag. It has surprisingly been found that with the method according to the invention, a largely pore-free connection of the layer to the base body can be achieved. In particular, it is possible with the proposed method to produce homogeneous single-phase layers. A press-in pin produced by the method according to the invention is characterized by a particularly low tendency to form whiskers.
Zur Herstellung des Elektrolyten kann eine der folgenden Silberverbindungen verwendet werden: Silbercyanid, Kaliumsilbercyanid, Silbersulfid, Silbersulfat. Als Zinnverbindungen können zur Herstellung des Elektrolyten folgende Verbindungen verwendet werden: Kaliumstannat, Natriumstannat, Zinnoxid, Zinnsulfat.For the preparation of the electrolyte, one of the following silver compounds can be used: silver cyanide, potassium silver cyanide, silver sulfide, silver sulfate. As tin compounds, the following compounds can be used to prepare the electrolyte: potassium stannate, sodium stannate, tin oxide, tin sulfate.
Des Weiteren ist dem Elektrolyten vorteilhafterweise zumindest eine der folgenden Verbindungen zugesetzt: Natriumcyanid, Kaliumcyanid, Natriumgluconat, Kaliumgluconat, Ethylendiamin, Ammoniak, Triethanolamin, Glycin, Thioharnstoff, Harnstoff, Nitrilotriessigsäure. Die vorgenannten Verbindungen dienen als Komplexbildner oder als Leitsalz.Furthermore, at least one of the following compounds is advantageously added to the electrolyte: sodium cyanide, potassium cyanide, sodium gluconate, potassium gluconate, ethylenediamine, ammonia, triethanolamine, glycine, thiourea, urea, nitrilotriacetic acid. The abovementioned compounds serve as complexing agents or as conducting salts.
Des Weiteren kann dem Elektrolyten zumindest eine der folgenden weiteren Verbindungen zugesetzt sein: Natriumhydroxid, Kaliumhydroxid, Natriumcarbonat, Kaliumcarbonat, Kaliumsulfid. Die vorgenannten weiteren Verbindungen wirken bezüglich Zinn als Komplexbildner. Abgesehen davon kann mit den weiteren Verbindungen die Leitfähigkeit des Elektrolyten eingestellt werden.Furthermore, at least one of the following further compounds may be added to the electrolyte: sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, potassium sulphide. The abovementioned further compounds act as complexing agents with respect to tin. Apart from that, the conductivity of the electrolyte can be adjusted with the other compounds.
Die galvanische Beschichtung wird vorteilhafterweise bei einer Stromdichte im Bereich von 5 bis 20 A/dm2 durchgeführt. Der pH-Wert des Elektrolyten wird zweckmäßigerweise auf 7 bis 14, vorzugsweise auf mehr als 8, eingestellt. Eine Temperatur des Elektrolyten kann bei der Beschichtung auf einen Wert im Bereich von 40 bis 90°C, vorzugsweise 50 bis 70°C, eingestellt werden. Besonders bevorzugt beträgt die Temperatur 55 bis 60°C.The galvanic coating is advantageously carried out at a current density in the range of 5 to 20 A / dm 2 . The pH of the electrolyte is suitably adjusted to 7 to 14, preferably to more than 8. A temperature of the electrolyte may be adjusted to a value in the range of 40 to 90 ° C, preferably 50 to 70 ° C in the coating. More preferably, the temperature is 55 to 60 ° C.
Als Anode kann eine aus einem der folgenden Materialien hergestellte Anode verwendet werden: Graphit, platiniertes Titan oder Niob, Silber, Zinn, Silber- oder Zinnlegierung. Eine aus Titan oder Niob hergestellte Anode kann anstelle der Platinierung auch mit einer Schicht aus einem Mischoxid auf Basis von Ir, Ta, Nb beschichtet sein. Es kann auch eine aus Silber hergestellte Anode sowie eine aus Zinn hergestellte weitere Anode verwendet werden, welche in zwei getrennten Stromkreisen betrieben werden. Ferner können Anoden in einem Anolyten mit einem Diaphragma verwendet werden.As the anode, an anode made of any one of the following materials can be used: graphite, platinum-plated titanium or niobium, silver, tin, silver or tin alloy. An anode made of titanium or niobium may also be coated with a layer of a mixed oxide based on Ir, Ta, Nb instead of the platinum. It is also possible to use an anode made of silver and a further anode made of tin, which are operated in two separate circuits. Further, anodes can be used in an anolyte with a diaphragm.
Nach einer vorteilhaften Ausgestaltung der Erfindung wird die Schicht in einer Dicke von 0,1 bis 0,8 µm, vorzugsweise 0,2 bis 0,6 µm, aufgebracht. Vor dem Aufbringen der aus der Silberlegierung gebildeten Schicht kann auf den Grundkörper galvanisch eine Zwischenschicht aus Ni oder Cu aufgebracht werden. Damit kann die Haftung der Schicht verbessert werden.According to an advantageous embodiment of the invention, the layer in a thickness of 0.1 to 0.8 microns, preferably 0.2 to 0.6 microns applied. Before applying the layer formed from the silver alloy, an intermediate layer of Ni or Cu can be galvanically applied to the base body. Thus, the adhesion of the layer can be improved.
Nach einer weiteren Ausgestaltung wird die auf den Grundkörper aufgebrachte Schicht für eine Dauer von 1 bis 10 Sekunden auf eine Temperatur im Bereich von 200 bis 500°C, vorzugsweise 300 bis 400°C, erwärmt. Die Erwärmung bewirkt in der Schicht ein Kristallwachstum. Ferner kann damit in der Legierung die Konzentration an Sn reduziert werden. Infolgedessen können sich intermetallische Phasen aus Ag3Sn oder aus Ag4Sn bilden. Solche intermetallischen Phasen wirken besonders effektiv der Bildung von Whiskern entgegen.According to a further embodiment, the applied to the body layer for a period of 1 to 10 seconds to a temperature in the range of 200 to 500 ° C, preferably 300 to 400 ° C, heated. The heating causes a crystal growth in the layer. Furthermore, it can be reduced in the alloy, the concentration of Sn. As a result, intermetallic phases can form Ag 3 Sn or Ag 4 Sn. Such intermetallic phases are particularly effective against the formation of whiskers.
Ferner kann die Wärmebehandlung die Bildung weiterer intermetallischer Phasen zwischen dem Grundkörper und der Schicht bewirken. Derartige weitere intermetallische Phasen bestehen beispielsweise aus Cu6Sn5 oder aus Cu3Sn. Falls auf dem Grundkörper eine aus Ni hergestellte Zwischenschicht vorgesehen ist, kann die Wärmebehandlung die Ausbildung einer weiteren intermetallischen Phase zwischen der Ni-Zwischenschicht und der aus der Silberlegierung hergestellten Schicht bewirken. Eine solche weitere intermetallische Phase ist beispielsweise aus Ni3Sn4 gebildet.Further, the heat treatment may cause the formation of further intermetallic phases between the base body and the layer. Such further intermetallic phases consist for example of Cu 6 Sn 5 or of Cu 3 Sn. If an intermediate layer made of Ni is provided on the base body, the heat treatment may cause the formation of a further intermetallic phase between the Ni intermediate layer and the layer made of the silver alloy. Such a further intermetallic phase is formed, for example, from Ni 3 Sn 4 .
Nach weiterer Maßgabe der Erfindung wird ein Einpresspin vorgeschlagen, mit einem aus Kupfer oder einer Kupferlegierung hergestellten Grundkörper und einer den Grundkörper zumindest abschnittsweise bedeckenden Schicht, wobei die Schicht aus einer Silberlegierung gebildet ist, die zumindest 50 Gew.% Ag, einen Rest aus Sn und unvermeidbaren Verunreinigungen enthält. - Der vorgeschlagene Einpresspin kann nach dem erfindungsgemäßen Verfahren hergestellt werden. Er enthält vorteilhafterweise kein Blei. Mit der vorgeschlagenen Schicht kann einer Bildung von Whiskern effektiv entgegengewirkt werden.According to another aspect of the invention, a press-in is proposed, with a base body made of copper or a copper alloy and the base body at least partially covering layer, wherein the layer is formed of a silver alloy containing at least 50 wt.% Ag, a balance of Sn and contains unavoidable impurities. The proposed press-in pin can be produced by the process according to the invention. It advantageously contains no lead. With the proposed layer, formation of whiskers can be effectively counteracted.
Nach einer vorteilhaften Ausgestaltung der Erfindung enthält die Silberlegierung mehr als 63 Gew.% und weniger als 90 Gew.% Ag. Vorteilhafterweise enthält die Silberlegierung 73 Gew.% bis 89 Gew.% Ag. Besonders bevorzugt enthält die Silberlegierung 75 Gew.% bis 85 Gew.% Ag.According to an advantageous embodiment of the invention, the silver alloy contains more than 63 wt.% And less than 90 wt.% Ag. Advantageously, the silver alloy contains 73% by weight to 89% by weight of Ag. Particularly preferably, the silver alloy contains 75 wt.% To 85 wt.% Ag.
Die Silberlegierung ist insbesondere aus Ag3Sn und/oder aus Ag4Sn gebildet. Sie ist insbesondere aus einer intermetallischen Phase aus Ag3Sn oder aus Ag4Sn gebildet. Eine solche intermetallische Phase bewirkt sicher und zuverlässig die Ausbildung von Whiskern. Vorzugsweise besteht die Silberlegierung zu mehr als 95%, bevorzugt zu mehr als 99%, aus einer einzigen solchen intermetallischen Phase.The silver alloy is in particular formed from Ag 3 Sn and / or from Ag 4 Sn. It is in particular formed from an intermetallic phase of Ag 3 Sn or Ag 4 Sn. Such an intermetallic phase causes the formation of whiskers safely and reliably. Preferably, the silver alloy is greater than 95%, preferably greater than 99%, of a single such intermetallic phase.
Die Silberlegierung kann auch aus einer Ag- oder einer Sn-Matrix gebildet sein, welche zumindest eine intermetallische Phase aus Ag3Sn und/oder aus Ag4Sn enthält.The silver alloy may also be formed from an Ag or Sn matrix containing at least one intermetallic phase of Ag 3 Sn and / or Ag 4 Sn.
Eine Dicke der Schicht beträgt zweckmäßigerweise 0,1 bis 0,8 µm, vorzugsweise 0,2 bis 0,6 µm. Besonders bevorzugt beträgt die Dicke der Schicht 0,3 bis 0,4 µm.A thickness of the layer is suitably 0.1 to 0.8 μm, preferably 0.2 to 0.6 μm. The thickness of the layer is particularly preferably 0.3 to 0.4 μm.
Nach einer weiteren vorteilhaften Ausgestaltung der Erfindung ist zwischen dem Grundkörper und der Schicht eine aus Ni oder Cu gebildete Zwischenschicht vorgesehen. Die Zwischenschicht kann eine weitere Dicke von 1,0 bis 3,0 µm, vorzugsweise 1,1 bis 2,5 µm, aufweisen.According to a further advantageous embodiment of the invention, an intermediate layer formed of Ni or Cu is provided between the base body and the layer. The intermediate layer may have a further thickness of 1.0 to 3.0 μm, preferably 1.1 to 2.5 μm.
Eine mittlere Kristallgröße der die Schicht bildenden Kristalle beträgt vorteilhafterweise 50 bis 800 nm, bevorzugt 100 bis 600 nm, besonders bevorzugt 150 bis 400 nm.An average crystal size of the crystals forming the layer is advantageously 50 to 800 nm, preferably 100 to 600 nm, particularly preferably 150 to 400 nm.
Nachfolgend wird ein Ausführungsbeispiel der Erfindung näher erläutert.Hereinafter, an embodiment of the invention will be explained in more detail.
Zur Beschichtung eines elektrischen Steckverbinders, insbesondere eines Einpresspins, nach dem erfindungsgemäßen Verfahren wird ein Elektrolyt verwendet, dessen Zusammensetzung sich aus der nachfolgenden Tabelle ergibt.
Der pH-Wert des Elektrolyten wird insbesondere durch den Zusatz von Natriumhydroxid, Kaliumhydroxid oder dgl. auf einen Wert im Bereich von 8 bis 13 eingestellt. Die elektrolytische Abscheidung der Schicht erfolgt bei einer Temperatur im Bereich von 50 bis 70°C und einer Stromdichte von 5 bis 20 A/dm2.In particular, the pH of the electrolyte is adjusted to a value in the range of 8 to 13 by the addition of sodium hydroxide, potassium hydroxide or the like. The electrolytic deposition of the layer takes place at a temperature in the range of 50 to 70 ° C. and a current density of 5 to 20 A / dm 2 .
Vorteilhafterweise werden die Konzentrationen der Silber- und Zinn-liefernden Verbindungen so eingestellt, dass sich eine einphasige intermetallische Verbindung aus Ag3Sn oder Ag4Sn bildet.Advantageously, the concentrations of the silver and tin-providing compounds are adjusted so that a single-phase intermetallic compound of Ag 3 Sn or Ag 4 Sn is formed.
Die auf dem aus Kupfer oder einer Kupferlegierung hergestellten Grundkörper abgeschiedene Schicht kann nachfolgend auf eine Temperatur im Bereich von 300 bis 400°C für eine Dauer von 1 bis 10 Sekunden erwärmt werden.The layer deposited on the base made of copper or a copper alloy may subsequently be heated to a temperature in the range of 300 to 400 ° C for a period of 1 to 10 seconds.
Der erfindungsgemäß hergestellte Einpresspin ist frei von Blei. Die darauf abgeschiedene Schicht aus einer Silberlegierung ist hart, widerstandsfähig und zeichnet sich durch eine besonders geringe Neigung zur Bildung von Whiskern aus.The press-in pin produced according to the invention is free of lead. The layer of silver alloy deposited thereon is hard, tough, and has a particularly low tendency to form whiskers.
Claims (24)
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DE102015003285.2A DE102015003285A1 (en) | 2015-03-14 | 2015-03-14 | Process for coating a press-fit pin and press-in pin |
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EP3070188A2 true EP3070188A2 (en) | 2016-09-21 |
EP3070188A3 EP3070188A3 (en) | 2016-12-07 |
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EP16000515.3A Withdrawn EP3070188A3 (en) | 2015-03-14 | 2016-03-03 | Method for coating a press-in pin and press-in pin |
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US (1) | US20160268709A1 (en) |
EP (1) | EP3070188A3 (en) |
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JP5939345B1 (en) * | 2015-11-06 | 2016-06-22 | 株式会社オートネットワーク技術研究所 | Terminal fittings and connectors |
CN111149260B (en) * | 2017-09-28 | 2021-10-08 | 怡得乐工业有限公司 | Contact with press-fit fastener |
JP2020111796A (en) * | 2019-01-11 | 2020-07-27 | Jx金属株式会社 | Surface-treated metal material, method for producing surface-treated metal material, and electronic component |
US11456548B2 (en) | 2019-09-18 | 2022-09-27 | International Business Machines Corporation | Reliability enhancement of press fit connectors |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US6361823B1 (en) | 1999-12-03 | 2002-03-26 | Atotech Deutschland Gmbh | Process for whisker-free aqueous electroless tin plating |
DE102005055742A1 (en) | 2005-11-23 | 2007-05-24 | Robert Bosch Gmbh | Electrochemical process to coat electrical connector metal component with tin or silver |
US20090239398A1 (en) | 2008-03-20 | 2009-09-24 | Interplex Nas, Inc. | Press fit (compliant) terminal and other connectors with tin-silver compound |
EP2596157B1 (en) | 2011-05-13 | 2014-11-19 | Enayati GmbH&Co. Kg Oberflächen- Und Anlagentechnik | Press-fit contact and method of production thereof |
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DE718252C (en) * | 1939-06-01 | 1942-03-07 | Degussa | Process for the production of hydrogen sulfide-resistant galvanic silver coatings |
JP2915623B2 (en) * | 1991-06-25 | 1999-07-05 | 古河電気工業株式会社 | Electrical contact material and its manufacturing method |
DE4224012C1 (en) * | 1992-07-21 | 1993-12-02 | Heraeus Gmbh W C | Solderable electric contact element - has silver@-tin@ alloy layer below gold@-tin@ solder alloy layer |
JP4834023B2 (en) * | 2007-03-27 | 2011-12-07 | 古河電気工業株式会社 | Silver coating material for movable contact parts and manufacturing method thereof |
WO2009041481A1 (en) * | 2007-09-26 | 2009-04-02 | The Furukawa Electric Co., Ltd. | Silver-clad composite material for movable contacts and process for production thereof |
JP5705738B2 (en) * | 2010-02-12 | 2015-04-22 | 古河電気工業株式会社 | Silver-coated composite material for movable contact parts, manufacturing method thereof, and movable contact parts |
DE102011088211A1 (en) * | 2011-12-12 | 2013-06-13 | Robert Bosch Gmbh | Contact element and method for its production |
-
2015
- 2015-03-14 DE DE102015003285.2A patent/DE102015003285A1/en not_active Withdrawn
-
2016
- 2016-03-03 EP EP16000515.3A patent/EP3070188A3/en not_active Withdrawn
- 2016-03-14 US US15/068,875 patent/US20160268709A1/en not_active Abandoned
- 2016-03-14 CN CN201610227976.1A patent/CN105970263A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6361823B1 (en) | 1999-12-03 | 2002-03-26 | Atotech Deutschland Gmbh | Process for whisker-free aqueous electroless tin plating |
DE102005055742A1 (en) | 2005-11-23 | 2007-05-24 | Robert Bosch Gmbh | Electrochemical process to coat electrical connector metal component with tin or silver |
US20090239398A1 (en) | 2008-03-20 | 2009-09-24 | Interplex Nas, Inc. | Press fit (compliant) terminal and other connectors with tin-silver compound |
EP2596157B1 (en) | 2011-05-13 | 2014-11-19 | Enayati GmbH&Co. Kg Oberflächen- Und Anlagentechnik | Press-fit contact and method of production thereof |
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CN105970263A (en) | 2016-09-28 |
DE102015003285A1 (en) | 2016-09-15 |
US20160268709A1 (en) | 2016-09-15 |
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