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EP2105807B1 - Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren - Google Patents

Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren Download PDF

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Publication number
EP2105807B1
EP2105807B1 EP08153598.1A EP08153598A EP2105807B1 EP 2105807 B1 EP2105807 B1 EP 2105807B1 EP 08153598 A EP08153598 A EP 08153598A EP 2105807 B1 EP2105807 B1 EP 2105807B1
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EP
European Patent Office
Prior art keywords
hairspring
silicon
layer
based material
balance spring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
EP08153598.1A
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English (en)
French (fr)
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EP2105807A1 (de
Inventor
Pierre-André Bühler
Marco Verardo
Thierry Conus
Jean-Philippe Thiébaud
Jean-Bernard Peters
Pierre Cusin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Montres Breguet SA
Original Assignee
Montres Breguet SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Montres Breguet SA filed Critical Montres Breguet SA
Priority to EP08153598.1A priority Critical patent/EP2105807B1/de
Priority to TW098109548A priority patent/TWI463282B/zh
Priority to SG200902111-4A priority patent/SG155873A1/en
Priority to CN200910203911.3A priority patent/CN101550978B/zh
Priority to JP2009081425A priority patent/JP5243324B2/ja
Priority to US12/414,309 priority patent/US8296953B2/en
Publication of EP2105807A1 publication Critical patent/EP2105807A1/de
Priority to HK10103325.8A priority patent/HK1138055B/xx
Priority to US13/601,128 priority patent/US8622611B2/en
Application granted granted Critical
Publication of EP2105807B1 publication Critical patent/EP2105807B1/de
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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0002—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe
    • G04D3/0035—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism
    • G04D3/0041—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism for coil-springs
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49579—Watch or clock making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49579—Watch or clock making
    • Y10T29/49581—Watch or clock making having arbor, pinion, or balance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49607—Spring-head clip making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49609—Spring making

Definitions

  • the invention relates to a hairspring and its method of manufacture and, more particularly, to a spiral curve elevation formed in one piece.
  • the regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.
  • the document EP 1 605 323 proposes to replace the elevation of the outer turn by a particular curvature in the same plane to obtain the same effect while keeping a flat spiral.
  • the document CH 695395 proposes forming a flat spiral whose ferrule is in one piece with the spiral spring.
  • the object of the present invention is to overcome all or part of the aforementioned drawbacks by proposing a monobloc curve-up spiral whose thermo-elastic coefficient can be adjusted and which is obtained by means of a manufacturing process which minimizes the difficulties of realization.
  • the invention relates to a monobloc spiral according to the appended claim 1.
  • the invention relates to a timepiece characterized in that it comprises a monobloc spring according to one of the preceding variants.
  • the invention relates to a method for manufacturing a monobloc balance spring according to claims 10 and 13 appended hereto.
  • the invention relates to a generally annotated method 1 and which is intended to manufacture a monobloc curved elevation hairspring 21, 21 'for a timepiece movement.
  • method 1 comprises successive steps for forming at least one type of spiral which can be formed integrally of silicon-based material.
  • the first step 100 is to provide a substrate 3 of the type silicon on insulator (also known by the acronym SOI).
  • the substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of silicon-based material.
  • the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final balance spring 21.
  • the upper layer 5 is used as spacing means with respect to the lower layer 7. Consequently, the height of the upper layer 5 will be adapted according to the configuration of the upward spiral spring 21, 21 '.
  • a cavity 8 is selectively etched, for example by a deep reactive ion etching process (also known as DRIE), in the upper layer 5 of silicon-based material.
  • DRIE deep reactive ion etching process
  • the cavity 8 makes it possible to form a pattern 6 defining the inner and outer contours of a silicon part belonging to the lifting device 2 of the hairspring 21, 21 '.
  • the pattern 6 forms the intermediate portion of the elevating means 4 of the lifting device 2 of the hairspring 21.
  • the pattern 6 is substantially in the form of a curved rectangular plate, however, advantageously according to the method 1, the etching on the upper layer 5 leaves all freedom as to the geometry of the pattern 6.
  • it may not necessarily be rectangular but, for example, trapezoidal.
  • the pattern 6 forms the intermediate portion of the elevating means 4 'of the elevating device 2' of the hairspring 21 '.
  • the pattern 6 is substantially in the form of a curved rectangular plate, however, advantageously according to the method 1, the etching on the upper layer 5 gives full freedom as to the geometry of the pattern 6.
  • it may not necessarily be rectangular but, for example, form a complete ring.
  • another cavity 10 may be etched in step 101 to form the pattern 9 distinct from the pattern 6 defining the inner and outer contours of a silicon part respectively belonging to a shell 27 of the hairspring 21.
  • the pattern 9 thus forms the middle part of the shell 27 of the spiral with a curve elevation 21.
  • the pattern 9 is substantially circular cylinder-shaped, however, advantageously according to the method 1, the etching on the upper layer 5 leaves no freedom as to the geometry of the pattern 9.
  • it may not necessarily be circular but, for example, elliptical and / or comprise a non-circular inner diameter.
  • At least one material bridge 16 is made in order to keep the curvature spiral 21, 21 'during manufacture at the substrate 3.
  • a material bridge 16 is left between one of the main faces of the pattern 6 and the remainder of the unetched layer 5.
  • step 102 as visible in figure 3 an additional layer 11 made of silicon-based material is added to substrate 3.
  • the additional layer 11 is fixed on the upper layer 5 by means of a fusion welding of silicon (also known by the acronym SFB).
  • step 102 advantageously makes it possible to cover the upper layer 5 by bonding with a very strong adhesion, in particular the upper faces of the patterns 6 and, possibly, 9 on the lower face of the additional layer 11.
  • cavities 18 and 20 are selectively etched, for example, by a method of the DRIE type similar to that of steps 101, in the additional layer 11 of silicon-based material. These cavities 18 and 20 make it possible to form three patterns 17, 19 and 24 defining the inner and outer contours of silicon parts of the curvature spiral 21, 21 '.
  • the pattern 17 is substantially circular cylinder shaped and the pattern 19 substantially spiral.
  • the etching in the additional layer 11 leaves all freedom on the geometry of the patterns 17 and 19.
  • the pattern 19 may, for example, comprise more turns or an inner turn having a curve Grossmann type to improve its concentricity development as explained in the document EP 1 612 627 .
  • the pattern 17 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 9 made in the upper layer 5.
  • the cavities 18 and 10 respectively forming the inner diameters of the patterns 17 and 9 communicate together and are substantially one above the other.
  • the patterns 9 and 17 form the upper and middle parts of the ferrule 27 of the spiral 21.
  • the patterns 17 and 19 being etched at the same time, they therefore form a single piece in the additional layer 11.
  • the patterns 17 and 19 respectively form the lower part of the ferrule 27 and the spiral spring 25 of the curved spiral spring 21.
  • the patterns 17 and 19 respectively form the first ferrule 27 'and the first spiral spring 25' of the curvature spiral 21 '.
  • the pattern 24 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 6 made in the upper layer 5.
  • the patterns 6 and 24 respectively form the upper and middle portions of the elevating means 4 of the elevating device 2 of the hairspring 21.
  • the patterns 6 and 24 respectively form the upper and middle portions of the elevating means 4 'of the elevating device 2' of the hairspring 21 '.
  • the pattern of the material bridge 16 may be extended in the additional layer 11 in step 103.
  • the method 1 may comprise a fifth step 104 of oxidizing at least the pattern 19, that is to say the spiral spring 25, 25 'of the hairspring 21, 21' to make it more mechanically resistant and of adjust its thermo-elastic coefficient.
  • a fifth step 104 of oxidizing at least the pattern 19, that is to say the spiral spring 25, 25 'of the hairspring 21, 21' to make it more mechanically resistant and of adjust its thermo-elastic coefficient.
  • Such an oxidation step is explained in particular in the patent EP 1 422 436 .
  • the method 1 can comprise three embodiments A, B and C as illustrated in FIG. figure 9 .
  • each of the three embodiments A, B and C ends with the same final step 106 of releasing the curved hairspring 21, 21 'from the substrate 3.
  • the release step 106 can be simply performed by providing a force to the hairspring 21, 21 'able to break the material bridge 16.
  • This force can, for example, be generated manually by an operator or by machining.
  • cavities 12 and 14 are selectively etched, for example, by a method of the DRIE type similar to that of step 101 and 103, in the lower layer 7 of material based on silicon. These cavities 12 and 14 make it possible to form three patterns 13, 15 and 22 defining the inner and outer contours of silicon parts of the curvature spiral 21, 21 '.
  • the pattern 13 is substantially circular cylinder shaped and the pattern 15 substantially spiral.
  • the pattern 22 is shaped curved rectangular plate.
  • the etching on the lower layer 7 leaves complete freedom on the geometry of the patterns 13, 15 and 22.
  • the pattern 15 may, for example, comprise more turns.
  • the pattern 13 made in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 9 and 17 made in the upper and additional layers 5 and 5.
  • the cavities 12, 10 and 18 respectively forming the inside diameter patterns 13, 9 and 17 communicate together and are substantially one above the other.
  • patterns 17, 9 and 13 form respectively the upper, middle and lower parts of the ferrule 27 of the spiral 21.
  • the pattern 13 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 17 made in the additional layer 11. This means that the cavities 12 and 18 respectively forming the inner diameter of the patterns 13 and 17 are substantially one above the other without being contiguous.
  • the patterns 17 and 13 respectively form the first ferrule 27 'and the second ferrule 27 "of the double spiral series 21'.
  • the pattern 22 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 6 formed in the upper layer 5.
  • the patterns 22, 6 and 24 respectively form the low, middle and high parts of the elevation means 4 of the elevating device 2 of the hairspring 21.
  • the patterns 22, 6 and 24 form respectively the lower, middle and upper parts of the elevating means 4 'of the elevating device 2' of the hairspring 21 '.
  • the pattern of the material bridge 16 can be extended in the lower layer 7 during step 105.
  • the pattern 15 is made to meet the criteria of a spiral type Phillips.
  • the patterns 22 and 15 being etched at the same time, they therefore form a single piece in the lower layer 7.
  • the units 22 and 15 respectively form the lower part of the elevating means 4 and the end curve 23 of the elevating device 2 of the hairspring 21.
  • the pattern 15 is made similarly to the pattern 19 made during the step 103.
  • the patterns 13, 22 and 15 being etched at the same time, they therefore form a single piece in the lower layer 7.
  • the units 22, 15 and 13 respectively form the lower part of the elevating means 4 'and the second spiral spring 23' of the elevating device 2 ', and the second shell 27 "of the series double spiral 21'.
  • the etching in the lower layer 7 leaves all freedom on the geometry in particular of the pattern 15.
  • the latter may, for example, comprise more turns or an inner turn having a Grossmann type curve allowing improve its concentricity of development as explained in the document EP 1 612 627 .
  • a curved spiral 21 or 21 'formed integrally with silicon-based materials is obtained by means of the first embodiment A. to the Figures 10 and 11 or 12 . It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.
  • the hairspring 21 comprises a hairspring 25 coaxially connected to a shell 27, the outer coil of which comprises an elevating device 2 mainly comprising a rectangular plate engraved in three layers 11, 5, 7 serving as elevation means 4 and a terminal curve 23.
  • the spiral curve elevation 21 thus obtained also has a configuration also called spiral Breguet® type.
  • the shell 27 is also etched in three layers 11, 5, 7 which improves the guiding of the hairspring 21.
  • the inner turn 26 of the hairspring 25 has a curve of the Grossmann type in order to improve its concentricity of development.
  • the etchings made according to steps 103 and 105 of method 1 leave all freedom on the geometry of the terminal curve 23, spiral spring 25, elevation means 4 and ferrule 27.
  • the continuity between the spiral spring 25, the elevation means 4 and the end curve 23 may consist of a substantially different geometry.
  • the ferrule 27 may also comprise dimensions and / or geometries uniformly clean or different on at least one of the lower parts 13, median 9 and / or high 17.
  • the inner diameter may have a complementary shape on all or part of the height of the shell 27.
  • the inner and / or outer diameters are not necessarily circular but, for example, elliptical and / or or polygonal.
  • the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radius of the spiral spring 25, that is to say the outer diameter of the shell 27, which allows the miniaturization of the inner and outer diameters of the shell 27. It will therefore be understood that the hairspring 21 is adapted to receive through its cavities 18, 10 and 12, advantageously, an axis of smaller diameter than is currently manufactured.
  • said axis may be fixed to the inner diameter 18 and / or 10 and / or 12 of the ferrule 27.
  • the clamping may for example be carried out using elastic means etched in the ferrule 27 made of silicon-based material .
  • Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .
  • the hairspring 21 ' comprises a first hairspring 25' coaxially connected to a shell 27 'and the outer coil of which comprises an elevating device 2' mainly comprising a rectangular plate engraved in three layers 11, 5, 7 serving as means 4 ', a second spiral spring 23' and a second ferrule 27 ", as visible in figure 12 , the hairspring 21 'thus obtained thus comprises a configuration of the double spiral type in series.
  • the engravings made according to steps 103 and 105 of the method 1 leave all freedom on the geometry of the spiral springs 25 'and 23', elevation means 4 'and ferrules 27' and 27 ".
  • the continuity between the spiral springs 25 ', 23' and the elevation means 4 ' may consist of a substantially different geometry.It is also conceivable, in the manner of the first variant, that the internal turns of each of the springs -spirals 25 'and 23' may have a Grossmann type curve in order to improve their concentricity of development.
  • the ferrules 27 'and 27 may also comprise dimensions or / and geometries that are specific or different: according to the ferrule 27', 27" with which the axis is intended to be mounted, the diameter inside said ferrule may then have a complementary shape.
  • the inner and / or outer diameters of each shell 27 ', 27 are not necessarily circular but, for example, elliptical and / or polygonal.
  • the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radii of each of the spiral springs 25 'and 23', that is to say the outer diameter of the ferrules 27 ' and 27 ", which allows the miniaturization of the inner and outer diameters of the ferrules 27 'and 27". It is therefore understood that the hairspring 21 'is adapted to receive by its cavities 18 or 12, advantageously, an axis of smaller diameter than is currently manufactured.
  • said axis may be fixed to the inner diameter 18 and / or 12 of one of the ferrules 27 ', 27 ", the other ferrule may then be mounted either on the bridge of the spring balance or on the balance.
  • the axis can for example be made using elastic means etched in the ferrule 27 'or 27 "of silicon-based material.
  • Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .
  • the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG. figure 6 , consisting in implementing a process of the LIGA type (a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung").
  • LIGA a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung”
  • Such a process comprises a succession of steps making it possible to electrodeposit in a particular form a metal on the lower layer 7 of the substrate 3 with the aid of a photostructured resin.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 107 may consist in depositing a cylinder 29.
  • the cylinder 29 is intended to receive, advantageously, by driving an axis.
  • a disadvantage of silicon lies in its very weak elastic and plastic zones which makes it very brittle.
  • the invention therefore proposes to perform the clamping of an axis, for example, balance not against the silicon-based material of the shell 27, 27 'or 27 "but on the inner diameter 28 of the metal cylinder 29 electrodeposited during of step 107.
  • the cylinder 29 obtained by electroplating leaves full freedom as to its geometry.
  • the inner diameter 28 is not necessarily circular but, for example, polygonal, which could make it possible to improve the transmission of rotational force with a correspondingly shaped axis.
  • a seventh step 108 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns similar to patterns 13, 15 and 22 of the first embodiment A according to one of the two variants.
  • a one-piece curved elevation spiral formed of silicon-based materials with the same advantages as the embodiment A with, in addition, a portion 29 of metal. It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.
  • an axis can be driven against the internal diameter 28 of the metal part 29. It is thus possible, preferably, that the cavities 10 and / or 18 according to the variant comprise sections of larger dimensions than that of the inner diameter. 28 of the metal part 29 to prevent the axis is in bold contact with the ferrule 27, 27 'or 27 ".
  • the method 1 comprises, after the step 103 or 104, in a sixth step 109, as visible at the figure 7 , selectively etching a cavity 30, for example, by a DRIE-type method, to a limited depth in the lower layer 7 of silicon-based material.
  • the cavity 30 makes it possible to form a recess able to serve as a container for a metal part.
  • the cavity 30 obtained may take the form of a disc.
  • the etching on the lower layer 7 leaves all freedom on the geometry of the cavity 30.
  • Method 1 comprises the implementation of a galvanic growth type or LIGA type process for filling the cavity 30 in a particular metallic form.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 110 may consist in depositing a cylinder 31 in the cavity 30.
  • the cylinder 31 is intended for receive, advantageously, by driving an axis.
  • an advantageous characteristic according to the invention is to achieve the clamping of the axis, for example, pendulum not against the silicon-based material of the shell 27, 27 'or 27 but on the inside diameter 32 of the metal cylinder 31 electrodeposited during step 110.
  • the cylinder 31 obtained by electroplating leaves full freedom as to its geometry.
  • the inner diameter 32 is not necessarily circular but, for example, polygonal which could improve the transmission of force in rotation with a corresponding shape of the axis.
  • the method 1 may include an eighth step 111 of polishing the metal deposit 31 made in step 110 to make it plane.
  • a ninth step 112 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns similar to the patterns 13, 15 and 22 of the first embodiment A according to one of the two variants.
  • a monobloc spring formed of silicon-based materials with the same advantages as the embodiment A with in addition, a portion 31 of metal. It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.
  • an axis can be driven against the inner diameter 32 of the metal part. It is thus possible, preferentially, that cavities 10 and / or 18 according to the variant comprise sections of larger dimensions than that of the inside diameter 32. the metal part 31 to prevent the axis is in bold contact with the ferrule 27, 27 'or 27 ".
  • the final spiral 21 or 21 ' is thus assembled before being structured, that is to say before being etched and / or modified by electroplating. This advantageously makes it possible to minimize the dispersions generated by the current fabrications and, consequently, improves the accuracy of a regulator member of which it would be dependent.
  • Process 1 may comprise, after step 105, 108 or 112, a step of the same type as that which would consist in oxidizing the pattern 15, that is to say the end curve 23 or the spiral spring 23 'of the spiral 21 or 21 'to make it more mechanically strong and adjust its thermo-elastic coefficient.
  • a polishing step of the type of step 111 can also be performed between step 107 and step 108.
  • the method 1 allows the step 103 of engraving the spiral spring 25, 25 'and the shell 27, 27' in the layer additional 11 is interchanged with that 105, 108 or 112 of engraving the end curve 23 or the spiral spring 23 'and the ferrule 27 "in the lower layer 7.
  • the end curve 23 or the spiral spring 23' and the ferrule 27 can be etched first on the additional layer 11 and then the spiral spring 25, 25 'and the shell 27, 27', in the lower layer 7.
  • a conductive layer is deposited on at least a portion of the hairspring 21 or 21 'to avoid problems of isochronism.
  • a conductive layer may be of the type disclosed in the document EP 1 837 722 .
  • the height of ferrule 27 may be more limited than Figures 10 and 11 of the first variant illustrated, that is to say, for example, it can be limited to the layers 5 and 11.
  • the elevation means 4 can also take a completely different shape than a curved rectangular plate.

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  • General Physics & Mathematics (AREA)
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Claims (19)

  1. Monoblock-Spirale (21, 21'), die eine Spiralfeder (25, 25') umfasst, die an einer Spiralrolle (27, 27'), die in derselben Materialschicht auf Siliciumbasis verwirklicht ist, koaxial montiert ist, dadurch gekennzeichnet, dass sie eine Vorrichtung (2, 2') zum Anheben der äußeren Windung der Spiralfeder über die Materialschicht auf Siliciumbasis umfasst, um die Konzentrizität der Abwicklung der Spirale zu verbessern, und dass die Anhebevorrichtung (2, 2') Anhebemittel (4, 4') umfasst, die mit der äußeren Windung der Spiralfeder (25, 25') verbunden sind und in einer zweiten Materialschicht (5) auf Siliciumbasis verwirklicht sind, um die Monoblock-Spirale zu bilden.
  2. Spirale nach Anspruch 1, dadurch gekennzeichnet, dass die Anhebevorrichtung (2) eine Endkrümmung (23) umfasst, die mit den Anhebemitteln (4) verbunden ist und in einer dritten Materialschicht auf Siliciumbasis gebildet ist.
  3. Spirale nach Anspruch 2, dadurch gekennzeichnet, dass die Endkrümmung (23) vom Phillips-Typ ist.
  4. Spirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Spiralrolle (27) einen Verlängerungsteil (9, 13) umfasst, der von der Spiralfeder vorsteht, um die Führung der Spirale zu verbessern.
  5. Spirale nach Anspruch 1, dadurch gekennzeichnet, dass die Anhebevorrichtung (2') eine zweite Spiralfeder (23') umfasst, die an einer zweiten Spiralrolle (27"), die mit den Anhebemitteln (4') verbunden ist und in einer dritten Materialschicht auf Siliciumbasis gebildet ist, koaxial montiert ist, was die Bildung einer seriellen Doppelspirale ermöglicht.
  6. Spirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass sie wenigstens einen Teil aus Siliciumdioxid umfasst, um sie mechanisch beständiger zu machen und um ihren thermoelastischen Koeffizienten einzustellen.
  7. Spirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass wenigstens eine Spiralrolle (27, 27', 27") einen Metallteil (29, 31) umfasst, der dazu bestimmt ist, durch Eintreiben eine Welle aufzunehmen.
  8. Spirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass wenigstens eine innere Windung (26) der Spiralfeder (25, 25', 23') eine Krümmung des Grossmann-Typs umfasst, um die Konzentrizität der Abwicklung der Spirale zu verbessern.
  9. Zeitmessgerät, dadurch gekennzeichnet, dass es eine Monoblock-Spirale (21, 21') nach einem der vorhergehenden Ansprüche umfasst.
  10. Verfahren (1) zum Herstellen einer Monoblock-Spirale, dadurch gekennzeichnet, dass es die folgenden Schritte umfasst:
    a) Bereitstellen (100) eines Substrats (3), das eine obere Schicht (5) und eine untere Schicht (7) aus Materialien auf Siliciumbasis umfasst;
    b) selektives Ätzen (101) wenigstens eines Hohlraums (8, 10) in der oberen Schicht (5), um Anhebemittel (4) aus einem Material auf Siliciumbasis der Spirale zu definieren;
    c) Befestigen (102) einer zusätzlichen Schicht (11) aus einem Material auf Siliciumbasis auf der geätzten oberen Schicht (5) des Substrats (3);
    d) selektives Ätzen (103) wenigstens eines Hohlraums (18, 20) in der zusätzlichen Schicht (11), um das Muster der Anhebemittel (4) fortzusetzen und um die Muster einer Spiralfeder (25) und einer Spiralrolle (27) aus einem Material auf Siliciumbasis der Spirale zu definieren;
    e) selektives Ätzen (105, 108, 112) wenigstens eines Hohlraums (12, 14) in der unteren Schicht (7), um das Muster der Anhebemittel (4) fortzusetzen und um das Muster einer Endkrümmung (23) zu definieren;
    f) Freigeben (106) der Monoblock-Spirale (21) von dem Substrat.
  11. Verfahren nach Anspruch 10, dadurch gekennzeichnet, dass das Ätzen der Spiralfeder (25) und der Spiralrolle (27) des Schrittes d) mit jenem der Endkrümmung (23) des Schrittes e) vertauscht ist.
  12. Herstellungsverfahren nach Anspruch 11 oder 12, dadurch gekennzeichnet, dass ein Muster (9, 13) eines Verlängerungsteils der Spiralrolle (27) in wenigstens eine der anderen Schichten aus Materialien auf Siliciumbasis geätzt wird.
  13. Verfahren (1) zum Herstellen einer Monoblock-Spirale, dadurch gekennzeichnet, dass es die folgenden Schritte umfasst:
    a) Bereitstellen (100) eines Substrats (3), das eine obere Schicht (5) und eine untere Schicht (7) aus Materialien auf Siliciumbasis umfasst;
    b) selektives Ätzen (101) wenigstens eines Hohlraums (8, 10) in der oberen Schicht (5), um Anhebemittel (4) aus einem Material auf Siliciumbasis der Spirale zu definieren;
    c) Befestigen (102) einer zusätzlichen Schicht (11) aus einem Material auf Siliciumbasis auf der geätzten oberen Schicht (5) des Substrats (3);
    d) selektives Ätzen (103) wenigstens eines Hohlraums (18, 20) in der zusätzlichen Schicht (11), um das Muster der Anhebemittel (4) fortzusetzen und um die Muster einer Spiralfeder (25) und einer Spiralrolle (27) aus einem Material auf Siliciumbasis der Spirale zu definieren;
    e) selektives Ätzen (105, 108, 112) wenigstens eines Hohlraums (12, 14) in der unteren Schicht (7), um das Muster der Anhebemittel (4) fortzusetzen und um die Muster einer zweiten Spiralfeder (23') und einer zweiten Spiralrolle (27") zu definieren, um eine serielle Doppelspirale (21') zu bilden;
    f) Freigeben (106) der Monoblock-Spirale (21) von dem Substrat.
  14. Verfahren nach einem der Ansprüche 10 bis 13, dadurch gekennzeichnet, dass es außerdem nach einem Schritt des Ätzens einer Spiralfeder (25, 25', 23') den folgenden Schritt umfasst:
    g) Oxidieren der Spiralfeder (25, 25', 23') aus einem Material auf Siliciumbasis, um sie mechanisch beständiger zu machen und um ihren thermoelastischen Koeffizienten einzustellen.
  15. Herstellungsverfahren nach einem der Ansprüche 10 bis 14, dadurch gekennzeichnet, dass es außerdem vor dem Schritt e) den folgenden Schritt umfasst:
    h) wahlweises Ablagern (107, 110) wenigstens einer Metallschicht auf der unteren Schicht, um das Muster eines Metallteils (29, 31) der Spirale zu definieren.
  16. Herstellungsverfahren nach Anspruch 15, dadurch gekennzeichnet, dass der Schritt h) die folgende Phase umfasst:
    i) Bewirken eines Aufwachsens (107) des Niederschlags durch aufeinander folgende Metallschichten wenigstens teilweise auf der Oberfläche der unteren Schicht, um den Metallteil (29) zu bilden, der dazu bestimmt ist, durch Eintreiben eine Welle aufzunehmen.
  17. Herstellungsverfahren nach Anspruch 15, dadurch gekennzeichnet, dass der Schritt h) die folgenden Phasen umfasst:
    j) selektives Ätzen (109) wenigstens eines Hohlraums (30) in der unteren Schicht, der dazu bestimmt ist, den Metallteil (31) aufzunehmen;
    k) Bewirken eines Aufwachsens (110) des Niederschlags durch aufeinander folgende Metallschichten wenigstens teilweise in dem wenigstens einen Hohlraum, um den Metallteil (31) zu bilden, der dazu bestimmt ist, durch Eintreiben eine Welle aufzunehmen.
  18. Herstellungsverfahren nach einem der Ansprüche 15 bis 17, dadurch gekennzeichnet, dass der Schritt h) die folgende letzte Phase umfasst:
    l) Polieren (111) des metallischen Niederschlags.
  19. Herstellungsverfahren nach einem der Ansprüche 10 bis 18, dadurch gekennzeichnet, dass auf demselben Substrat (3) mehrere Monoblock-Spiralen (21, 21') verwirklicht werden.
EP08153598.1A 2008-03-28 2008-03-28 Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren Active EP2105807B1 (de)

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EP08153598.1A EP2105807B1 (de) 2008-03-28 2008-03-28 Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren
TW098109548A TWI463282B (zh) 2008-03-28 2009-03-24 單體游絲及其製造方法
SG200902111-4A SG155873A1 (en) 2008-03-28 2009-03-26 One-piece hairspring and method of manufacturing the same
CN200910203911.3A CN101550978B (zh) 2008-03-28 2009-03-27 单片游丝及其制造方法
JP2009081425A JP5243324B2 (ja) 2008-03-28 2009-03-30 一体構造型ヘアスプリング及びその製造方法
US12/414,309 US8296953B2 (en) 2008-03-28 2009-03-30 Method of manufacturing a one-piece hairspring
HK10103325.8A HK1138055B (en) 2008-03-28 2010-03-31 One-piece double balance spring and method of manufacturing the same
US13/601,128 US8622611B2 (en) 2008-03-28 2012-08-31 One-piece hairspring and method of manufacturing the same

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US20120320718A1 (en) 2012-12-20
CN101550978B (zh) 2012-09-05
JP5243324B2 (ja) 2013-07-24
US8296953B2 (en) 2012-10-30
TW201003341A (en) 2010-01-16
EP2105807A1 (de) 2009-09-30
HK1138055A1 (en) 2010-08-13
CN101550978A (zh) 2009-10-07
US8622611B2 (en) 2014-01-07
TWI463282B (zh) 2014-12-01
US20090245030A1 (en) 2009-10-01
SG155873A1 (en) 2009-10-29

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