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EP1837722B1 - Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür - Google Patents

Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür Download PDF

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Publication number
EP1837722B1
EP1837722B1 EP07104385.5A EP07104385A EP1837722B1 EP 1837722 B1 EP1837722 B1 EP 1837722B1 EP 07104385 A EP07104385 A EP 07104385A EP 1837722 B1 EP1837722 B1 EP 1837722B1
Authority
EP
European Patent Office
Prior art keywords
balance
conductive material
insulating material
micro
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP07104385.5A
Other languages
English (en)
French (fr)
Other versions
EP1837722A3 (de
EP1837722A2 (de
Inventor
Thierry Conus
Marc Lippuner
Philippe Marmy
Benjamin Krähenbühl
Michael Reber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ETA SA Manufacture Horlogere Suisse
Original Assignee
ETA SA Manufacture Horlogere Suisse
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP06111727A external-priority patent/EP1837721A1/de
Priority claimed from CH00595/06A external-priority patent/CH707669B1/fr
Application filed by ETA SA Manufacture Horlogere Suisse filed Critical ETA SA Manufacture Horlogere Suisse
Priority to EP07104385.5A priority Critical patent/EP1837722B1/de
Publication of EP1837722A2 publication Critical patent/EP1837722A2/de
Publication of EP1837722A3 publication Critical patent/EP1837722A3/de
Application granted granted Critical
Publication of EP1837722B1 publication Critical patent/EP1837722B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00Escapements
    • G04B15/14Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/063Balance construction
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/066Manufacture of the spiral spring

Definitions

  • the present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.
  • Insulating materials such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.
  • the document EP 1 422 436 discloses the manufacture of a spiral spring from the cutting of a monocrystalline silicon plate.
  • the coil spring has a silicon oxide coating to minimize thermal drift.
  • the document EP 1 482 282 discloses an electronic movement with a display means detecting means for automatically correcting undue movements of the display means.
  • the present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.
  • the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin deposit of an electrically conductive material such as a layer of a metallic material or a conductive non-metallic material.
  • the conductive deposit preferably has a thickness of less than 50 nm. This very thin deposit invisible to the naked eye, but detectable by the current means of analysis eliminates the risk of attraction and bonding by a neighboring room, this attraction may be due to may be due to friction or tension that can create electrostatic charges in the room.
  • This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.
  • the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen.
  • non-metallic conductive materials one will preferably choose one of the group comprising graphite, carbon, doped silicon, and conductive polymers. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process. The same techniques can be used to deposit conductive non-metallic materials.
  • said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile.
  • a hairspring which is the most sensitive part of a watch movement.
  • the invention also relates to a timepiece incorporating such a micro-mechanical part.
  • the invention will be more particularly illustrated by a sprung balance adjusting device shown in FIG. figure 1 , in which the spiral 1 is made, for example, of silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material.
  • wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.
  • the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.
  • the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.
  • the material used is preferably a stainless and non-magnetic metal such as gold, platinum, rhodium, palladium, when it is a metallic conductive material.
  • This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.
  • a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a current of 60 mA for 15 seconds.
  • a non-metallic conductive material When a non-metallic conductive material is deposited, it will preferably be chosen from the group comprising graphite, carbon, doped silicon, and conducting polymers and deposition techniques and thicknesses as mentioned above will be used.
  • a silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.
  • a composite material to produce for example a hairspring having a silicon core and a thick coating of silicon dioxide on which the deposition of conductive material of small thickness will be performed.
  • a “composite material” may also include a metal core embedded in an insulating material.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)

Claims (8)

  1. Spirale, die aus wenigstens einem Isoliermaterial verwirklicht ist und dazu bestimmt ist, in ein Uhrwerk integriert zu werden, wobei das Isoliermaterial einen Siliciumkern enthält, auf dem eine Beschichtung aus Siliciumdioxid gebildet ist, die eine Dicke von mehr als 50 nm hat, dadurch gekennzeichnet, dass die Spirale auf ihrer gesamten Oberfläche oder auf einem Teil hiervon mit einer Ablagerung eines elektrisch leitenden Materials beschichtet ist.
  2. Spirale nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass das elektrisch leitende Material ein metallisches Material ist.
  3. Spirale nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass das metallische Material aus Gold, Platin, Rhodium und Palladium gewählt ist.
  4. Spirale nach Anspruch 1, dadurch gekennzeichnet, dass das elektrisch leitende Material ein nichtmetallisches Material ist.
  5. Spirale nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass das nichtmetallische Material aus Graphit, Kohlenstoff, dotiertem Silicium und leitenden Polymeren gewählt ist.
  6. Spirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Ablagerung des elektrisch leitenden Materials eine Dicke von weniger als 50 nm hat.
  7. Spirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Ablagerung des elektrisch leitenden Materials eine Dicke im Bereich von 10 bis 20 nm hat.
  8. Zeitmessgerät, das eine Spirale nach einem der vorhergehenden Ansprüche enthält.
EP07104385.5A 2006-03-24 2007-03-19 Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür Active EP1837722B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP07104385.5A EP1837722B1 (de) 2006-03-24 2007-03-19 Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06111727A EP1837721A1 (de) 2006-03-24 2006-03-24 Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür
CH00595/06A CH707669B1 (fr) 2006-04-10 2006-04-10 Pièce de micro-mécanique en matériau électriquement isolant ou en silicium ou un de ses composés et son procédé de fabrication.
EP07104385.5A EP1837722B1 (de) 2006-03-24 2007-03-19 Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür

Publications (3)

Publication Number Publication Date
EP1837722A2 EP1837722A2 (de) 2007-09-26
EP1837722A3 EP1837722A3 (de) 2008-06-04
EP1837722B1 true EP1837722B1 (de) 2016-02-24

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP07104385.5A Active EP1837722B1 (de) 2006-03-24 2007-03-19 Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür

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EP (1) EP1837722B1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008029429A1 (de) * 2007-10-18 2009-04-23 Konrad Damasko Verfahren zum Herstellen von mechanischen Funktionselementen für Uhrwerke sowie nach diesem Verfahren hergestelltes Funktionselement
CH699494B1 (fr) 2007-11-28 2010-09-30 Manuf Et Fabrique De Montres E Oscillateur mécanique présentant un coefficient thermoélastique optimisé et procédé de fabrication d'un tel oscillateur.
EP2104007A1 (de) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Monoblockspirale aus Material auf Siliziumbasis und ihr Herstellungsverfahren
EP2104008A1 (de) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Monoblock-Regulierungsorgan und sein Herstellungsverfahren
EP2104005A1 (de) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Composite-Unruh und Herstellungsverfahren dafür
EP2104006B1 (de) 2008-03-20 2010-07-14 Nivarox-FAR S.A. Monoblock-Doppelspirale und ihr Herstellungsverfahren
EP2105807B1 (de) 2008-03-28 2015-12-02 Montres Breguet SA Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren
CH699882A2 (fr) 2008-11-06 2010-05-14 Montres Breguet Sa Spiral à élévation de courbe en matériau micro-usinable.
US10324419B2 (en) 2009-02-06 2019-06-18 Domasko GmbH Mechanical oscillating system for a clock and functional element for a clock
EP3101484A1 (de) * 2009-02-06 2016-12-07 DAMASKO GmbH Mechanisches schwingsystem für uhren und verfahren zum herstellen eines mechanischen schwingsystems für uhren
CH703172B1 (fr) 2010-05-18 2014-11-14 Montres Breguet Sa Spiral à élévation de courbe en silicium.
EP2920653A1 (de) 2012-11-16 2015-09-23 Nivarox-FAR S.A. Resonator mit geringerer empfindlichkeit gegenüber klimatischen schwankungen
EP2781968A1 (de) * 2013-03-19 2014-09-24 Nivarox-FAR S.A. Resonator, der weniger empfindlich gegenüber klimatischen Schwankungen ist
HK1209578A2 (en) 2015-02-17 2016-04-01 Master Dynamic Limited Silicon hairspring
JP6629854B2 (ja) 2015-06-15 2020-01-15 シチズン時計株式会社 時計の調速装置
EP3534222A1 (de) * 2018-03-01 2019-09-04 Rolex Sa Herstellungsverfahren eines thermokompensierten oszillators
EP3742237B1 (de) 2019-05-23 2024-10-16 Nivarox-FAR S.A. Komponente, insbesondere für uhrwerk mit einer oberflächentopologie, und ihr herstellungsverfahren
EP3859449A1 (de) * 2020-01-30 2021-08-04 ETA SA Manufacture Horlogère Suisse Leitende schnur für spirale

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020060954A1 (en) * 1999-04-21 2002-05-23 Konrad Schafroth Watch movement with a microgenerator and method for testing watch movements
EP1482282A1 (de) * 2002-03-04 2004-12-01 Citizen Watch Co., Ltd. Elektrische uhr

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2731715B1 (fr) * 1995-03-17 1997-05-16 Suisse Electronique Microtech Piece de micro-mecanique et procede de realisation
WO1999036941A2 (en) * 1998-01-15 1999-07-22 Cornell Research Foundation, Inc. Trench isolation for micromechanical devices
DE10055421A1 (de) * 2000-11-09 2002-05-29 Bosch Gmbh Robert Verfahren zur Erzeugung einer mikromechanischen Struktur und mikromechanische Struktur
KR100468853B1 (ko) * 2002-08-30 2005-01-29 삼성전자주식회사 절연 물질에 구현된 mems 콤브 액추에이터와 그제조방법
AU2003205503A1 (en) * 2002-09-25 2004-04-19 Fore Eagle Co Ltd Mechanical parts
DE60206939T2 (de) * 2002-11-25 2006-07-27 Csem Centre Suisse D'electronique Et De Microtechnique S.A. Spiraluhrwerkfeder und Verfahren zu deren Herstellung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020060954A1 (en) * 1999-04-21 2002-05-23 Konrad Schafroth Watch movement with a microgenerator and method for testing watch movements
EP1482282A1 (de) * 2002-03-04 2004-12-01 Citizen Watch Co., Ltd. Elektrische uhr

Also Published As

Publication number Publication date
EP1837722A3 (de) 2008-06-04
EP1837722A2 (de) 2007-09-26

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