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EP1313573A4 - Semiconductor wafer container cleaning apparatus - Google Patents

Semiconductor wafer container cleaning apparatus

Info

Publication number
EP1313573A4
EP1313573A4 EP01984548A EP01984548A EP1313573A4 EP 1313573 A4 EP1313573 A4 EP 1313573A4 EP 01984548 A EP01984548 A EP 01984548A EP 01984548 A EP01984548 A EP 01984548A EP 1313573 A4 EP1313573 A4 EP 1313573A4
Authority
EP
European Patent Office
Prior art keywords
semiconductor wafer
cleaning apparatus
wafer container
container cleaning
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01984548A
Other languages
German (de)
French (fr)
Other versions
EP1313573A2 (en
Inventor
Daniel P Bexten
Jerry R Norby
James Bryer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semitool Inc
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/611,642 external-priority patent/US6412502B1/en
Priority claimed from US09/658,395 external-priority patent/US6797076B1/en
Application filed by Semitool Inc filed Critical Semitool Inc
Publication of EP1313573A2 publication Critical patent/EP1313573A2/en
Publication of EP1313573A4 publication Critical patent/EP1313573A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/0861—Cleaning crates, boxes or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B08B9/30—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking and having conveyors
    • B08B9/32—Rotating conveyors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
EP01984548A 2000-07-07 2001-06-20 Semiconductor wafer container cleaning apparatus Withdrawn EP1313573A4 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/611,642 US6412502B1 (en) 1999-07-28 2000-07-07 Wafer container cleaning system
US611642 2000-07-07
US09/658,395 US6797076B1 (en) 1998-07-10 2000-09-08 Spray nozzle system for a semiconductor wafer container cleaning aparatus
US658395 2000-09-08
PCT/US2001/041085 WO2002017355A2 (en) 2000-07-07 2001-06-20 Semiconductor wafer container cleaning apparatus

Publications (2)

Publication Number Publication Date
EP1313573A2 EP1313573A2 (en) 2003-05-28
EP1313573A4 true EP1313573A4 (en) 2005-11-30

Family

ID=27086559

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01984548A Withdrawn EP1313573A4 (en) 2000-07-07 2001-06-20 Semiconductor wafer container cleaning apparatus

Country Status (5)

Country Link
EP (1) EP1313573A4 (en)
JP (1) JP2004507102A (en)
AU (1) AU2002216646A1 (en)
TW (1) TW522054B (en)
WO (1) WO2002017355A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1614150B1 (en) 2003-04-11 2007-08-29 Dynamic Microsystems Semiconductor Equipment GmbH Device and method for cleaning and drying objects used to produce semiconductors, especially transport and cleaning containers for wafers
EP1503401A1 (en) * 2003-08-01 2005-02-02 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) Method and apparatus for cleaning a substrate by using a supercritical fluid
FR2886456B1 (en) * 2005-05-26 2007-08-17 Soitec Silicon On Insulator DEVICE FOR DRYING POST-CLEANING OF A CONTAINER OF SEMICONDUCTOR PLATES
DE102005030275A1 (en) 2005-06-21 2006-12-28 Dynamic Microsystems Semiconductor Equipment Gmbh Method for cleaning or drying pot-like hollow bodies involves flushing head with outer shape, which is largely complementary to the inner shape of the interior is introduced into the interior
DE102009040978A1 (en) * 2009-09-11 2011-03-17 Krones Ag Magazine device for blow molding with cleaning device
KR101022014B1 (en) 2010-05-18 2011-03-16 (주) 디바이스이엔지 Wafer Storage Container Cleaner
KR100987323B1 (en) 2010-05-18 2010-10-12 (주) 디바이스이엔지 Cleaner for wafer container
TWI544973B (en) * 2015-03-20 2016-08-11 家登精密工業股份有限公司 A method for operating a semiconductor container washing machine
KR101601600B1 (en) 2015-05-22 2016-03-09 조창현 Wafer carrier container cleaning for purging apparatus
CN106540917B (en) 2015-09-16 2020-03-31 泰科电子(上海)有限公司 Ultrasonic cleaning system
KR102067752B1 (en) * 2018-02-09 2020-01-17 (주)에스티아이 FOUP cleaning device and FOUP cleaning method
CN113843235B (en) * 2021-08-06 2022-11-04 徐州鑫晶半导体科技有限公司 Wafer box cleaning device and control method thereof
CN114308835B (en) * 2022-01-05 2022-12-16 张卫英 Instrument cleaning device for obstetrics and gynecology department
CN117206242B (en) * 2023-10-03 2024-08-13 上海芯畀科技有限公司 Semi-automatic centrifugal wafer transfer box cleaning machine

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010047812A1 (en) * 1998-07-10 2001-12-06 Charles James Bryer Cleaning apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221824Y2 (en) * 1973-01-09 1977-05-19
JP2528741Y2 (en) * 1991-08-13 1997-03-12 株式会社内山商会 Vegetable peeling and cleaning nozzle device
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5672212A (en) * 1994-07-01 1997-09-30 Texas Instruments Incorporated Rotational megasonic cleaner/etcher for wafers
JP4095722B2 (en) * 1998-03-27 2008-06-04 株式会社藤森技術研究所 Semiconductor wafer pod cleaning system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010047812A1 (en) * 1998-07-10 2001-12-06 Charles James Bryer Cleaning apparatus

Also Published As

Publication number Publication date
JP2004507102A (en) 2004-03-04
WO2002017355A2 (en) 2002-02-28
AU2002216646A1 (en) 2002-03-04
EP1313573A2 (en) 2003-05-28
TW522054B (en) 2003-03-01
WO2002017355A9 (en) 2003-02-06
WO2002017355A3 (en) 2002-05-02

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20030207

AK Designated contracting states

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Extension state: AL LT LV MK RO SI

RIC1 Information provided on ipc code assigned before grant

Ipc: 7H 01L 21/00 B

Ipc: 7B 08B 3/12 B

Ipc: 7B 08B 9/08 B

Ipc: 7B 08B 5/02 B

Ipc: 7B 08B 3/02 A

A4 Supplementary search report drawn up and despatched

Effective date: 20051012

17Q First examination report despatched

Effective date: 20080728

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20081212