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EE200900009A - Method and apparatus for ion flow control - Google Patents

Method and apparatus for ion flow control

Info

Publication number
EE200900009A
EE200900009A EEP200900009A EEP200900009A EE200900009A EE 200900009 A EE200900009 A EE 200900009A EE P200900009 A EEP200900009 A EE P200900009A EE P200900009 A EEP200900009 A EE P200900009A EE 200900009 A EE200900009 A EE 200900009A
Authority
EE
Estonia
Prior art keywords
flow control
ion flow
ion
control
flow
Prior art date
Application number
EEP200900009A
Other languages
Estonian (et)
Inventor
Krimanov Aleksander
Sominski Igor
Original Assignee
Krimanov Aleksander
Sominski Igor
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Krimanov Aleksander, Sominski Igor filed Critical Krimanov Aleksander
Priority to EEP200900009A priority Critical patent/EE200900009A/en
Publication of EE200900009A publication Critical patent/EE200900009A/en

Links

EEP200900009A 2008-02-13 2009-02-13 Method and apparatus for ion flow control EE200900009A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EEP200900009A EE200900009A (en) 2008-02-13 2009-02-13 Method and apparatus for ion flow control

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EEU200800023 2008-02-13
EEP200900009A EE200900009A (en) 2008-02-13 2009-02-13 Method and apparatus for ion flow control

Publications (1)

Publication Number Publication Date
EE200900009A true EE200900009A (en) 2009-10-15

Family

ID=41127884

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200900009A EE200900009A (en) 2008-02-13 2009-02-13 Method and apparatus for ion flow control

Country Status (2)

Country Link
EA (1) EA015720B1 (en)
EE (1) EE200900009A (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06101318B2 (en) * 1985-10-16 1994-12-12 株式会社日立製作所 Ion microbeam device
US5317148A (en) * 1991-05-22 1994-05-31 Loral Corporation IR/ladar scanner
JP3318595B2 (en) * 1991-12-24 2002-08-26 独立行政法人産業技術総合研究所 Laser ion plating equipment
JP3658149B2 (en) * 1997-09-04 2005-06-08 キヤノン株式会社 Electron beam exposure equipment

Also Published As

Publication number Publication date
EA015720B1 (en) 2011-10-31
EA200900192A1 (en) 2009-08-28

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