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EA033207B1 - Vacuum chamber manipulator - Google Patents

Vacuum chamber manipulator

Info

Publication number
EA033207B1
EA033207B1 EA201700376A EA201700376A EA033207B1 EA 033207 B1 EA033207 B1 EA 033207B1 EA 201700376 A EA201700376 A EA 201700376A EA 201700376 A EA201700376 A EA 201700376A EA 033207 B1 EA033207 B1 EA 033207B1
Authority
EA
Eurasian Patent Office
Prior art keywords
air
chamber
vacuum chamber
tubular member
vacuum
Prior art date
Application number
EA201700376A
Other languages
Russian (ru)
Other versions
EA201700376A1 (en
Inventor
Николай Евгеньевич Левчук
Иван Валерьевич Малец
Сергей Владимирович Гизовский
Вячеслав Владимирович Проценко
Владимир Анатольевич Савенко
Дмитрий Юрьевич Бахтин
Original Assignee
Общество С Ограниченной Ответственностью "Изовак"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Общество С Ограниченной Ответственностью "Изовак" filed Critical Общество С Ограниченной Ответственностью "Изовак"
Priority to EA201700376A priority Critical patent/EA033207B1/en
Publication of EA201700376A1 publication Critical patent/EA201700376A1/en
Publication of EA033207B1 publication Critical patent/EA033207B1/en

Links

Landscapes

  • Manipulator (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The device relates to equipment for thin-film coating application under vacuum and is intended for transferring an air-lock chamber during unloading and loading of samples and for samples feeding into the vacuum process chamber. In the vacuum chamber manipulator in accordance with the invention, comprising a hollow tubular member (2) with a substrate holder (16) on its end movable back and forth within the vacuum chamber (9), a bar (24) with a heater (26) on its lower end, the bar being installed within the tubular member (2), and at least first (4) and second carriages (11), the simplicity of service, reliability, cleanliness and reduced gas emission during the operation are achieved as follows: the manipulator is fitted out with an air-lock chamber (1) allowing for back and forth movement between the position of air-tight contact with the vacuum chamber (9) having a controllable gate, and the position without such contact, and the said hollow tubular member (2) is located along the axis of the said air-lock chamber (1) and is movable back and forth within it.
EA201700376A 2017-07-18 2017-07-18 Vacuum chamber manipulator EA033207B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EA201700376A EA033207B1 (en) 2017-07-18 2017-07-18 Vacuum chamber manipulator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EA201700376A EA033207B1 (en) 2017-07-18 2017-07-18 Vacuum chamber manipulator

Publications (2)

Publication Number Publication Date
EA201700376A1 EA201700376A1 (en) 2019-01-31
EA033207B1 true EA033207B1 (en) 2019-09-30

Family

ID=65137764

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201700376A EA033207B1 (en) 2017-07-18 2017-07-18 Vacuum chamber manipulator

Country Status (1)

Country Link
EA (1) EA033207B1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU61717U1 (en) * 2006-10-31 2007-03-10 Закрытое акционерное общество "Научное и технологическое оборудование" GROWTH VACUUM CAMERA MANIPULATOR FOR GROWING SEMICONDUCTOR HETEROSTRUCTURES
RU63122U1 (en) * 2006-12-15 2007-05-10 Закрытое акционерное общество "Научное и технологическое оборудование" PLANT FOR PROCESSING SEMICONDUCTOR PLATES
WO2008054240A1 (en) * 2006-10-31 2008-05-08 'nauchnoe I Tekhnologicheskoe Oborudovanie' Limited Growth manipulator of a vacuum chamber used for growing semiconductor heterostructures
WO2017071831A1 (en) * 2015-10-25 2017-05-04 Applied Materials, Inc. Apparatus for treatment of a substrate for a vacuum deposition process in a vacuum processing module, system for treatment and handling of a substrate, method for treatment of a substrate for a vacuum deposition process in a vacuum processing module, and apparatus for loading a substrate carrier into a vacuum processing system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU61717U1 (en) * 2006-10-31 2007-03-10 Закрытое акционерное общество "Научное и технологическое оборудование" GROWTH VACUUM CAMERA MANIPULATOR FOR GROWING SEMICONDUCTOR HETEROSTRUCTURES
WO2008054240A1 (en) * 2006-10-31 2008-05-08 'nauchnoe I Tekhnologicheskoe Oborudovanie' Limited Growth manipulator of a vacuum chamber used for growing semiconductor heterostructures
RU63122U1 (en) * 2006-12-15 2007-05-10 Закрытое акционерное общество "Научное и технологическое оборудование" PLANT FOR PROCESSING SEMICONDUCTOR PLATES
WO2017071831A1 (en) * 2015-10-25 2017-05-04 Applied Materials, Inc. Apparatus for treatment of a substrate for a vacuum deposition process in a vacuum processing module, system for treatment and handling of a substrate, method for treatment of a substrate for a vacuum deposition process in a vacuum processing module, and apparatus for loading a substrate carrier into a vacuum processing system

Also Published As

Publication number Publication date
EA201700376A1 (en) 2019-01-31

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Legal Events

Date Code Title Description
MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM AZ KZ KG TJ TM