DK3662325T3 - Fleksibelt stempel med afstemmelig højdimensionel stabilitet - Google Patents
Fleksibelt stempel med afstemmelig højdimensionel stabilitet Download PDFInfo
- Publication number
- DK3662325T3 DK3662325T3 DK19791179.5T DK19791179T DK3662325T3 DK 3662325 T3 DK3662325 T3 DK 3662325T3 DK 19791179 T DK19791179 T DK 19791179T DK 3662325 T3 DK3662325 T3 DK 3662325T3
- Authority
- DK
- Denmark
- Prior art keywords
- dimensional stability
- high dimensional
- adjustable high
- flexible stamp
- stamp
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18200147 | 2018-10-12 | ||
| PCT/EP2019/077606 WO2020074709A1 (en) | 2018-10-12 | 2019-10-11 | Flexible stamp with tunable high dimensional stability |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK3662325T3 true DK3662325T3 (da) | 2021-02-01 |
Family
ID=63840718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK19791179.5T DK3662325T3 (da) | 2018-10-12 | 2019-10-11 | Fleksibelt stempel med afstemmelig højdimensionel stabilitet |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11977328B2 (da) |
| EP (1) | EP3662325B1 (da) |
| JP (1) | JP7417600B2 (da) |
| KR (1) | KR102854887B1 (da) |
| CN (1) | CN113168089B (da) |
| DK (1) | DK3662325T3 (da) |
| WO (1) | WO2020074709A1 (da) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7558674B2 (ja) * | 2020-04-06 | 2024-10-01 | キヤノン株式会社 | インプリント装置、インプリント方法及び物品の製造方法 |
| US12202285B2 (en) * | 2020-07-31 | 2025-01-21 | Morphotonics Holding B.V. | High dimensional flexible stamp with tiled strengthened area |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4128369A (en) | 1975-12-10 | 1978-12-05 | Hazelett Strip-Casting Corporation | Continuous apparatus for forming products from thermoplastic polymeric material having three-dimensional patterns and surface textures |
| US5772905A (en) | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| US6334960B1 (en) | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
| EP1362682A1 (en) | 2002-05-13 | 2003-11-19 | ZBD Displays Ltd, | Method and apparatus for liquid crystal alignment |
| US8349241B2 (en) | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
| JP2004303654A (ja) * | 2003-03-31 | 2004-10-28 | Fuji Photo Film Co Ltd | 有機電界発光素子及びその製造方法 |
| US20080055581A1 (en) | 2004-04-27 | 2008-03-06 | Rogers John A | Devices and methods for pattern generation by ink lithography |
| EP1742893B1 (en) * | 2004-04-27 | 2012-10-10 | The Board Of Trustees Of The University Of Illinois | Composite patterning devices for soft lithography |
| US7140861B2 (en) | 2004-04-27 | 2006-11-28 | Molecular Imprints, Inc. | Compliant hard template for UV imprinting |
| FR2893610B1 (fr) | 2005-11-23 | 2008-07-18 | Saint Gobain | Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations |
| WO2007121006A2 (en) * | 2006-04-11 | 2007-10-25 | Dow Corning Corporation | Low thermal distortion silicone composite molds |
| KR101407982B1 (ko) | 2006-11-15 | 2014-06-17 | 엘아이지에이디피 주식회사 | 미세 패턴 임프린트용 글라스 스탬프와 그 제조 방법 |
| WO2008087573A2 (en) | 2007-01-16 | 2008-07-24 | Koninklijke Philips Electronics N.V. | Method and system for contacting of a flexible sheet and a substrate |
| US8027086B2 (en) | 2007-04-10 | 2011-09-27 | The Regents Of The University Of Michigan | Roll to roll nanoimprint lithography |
| US7927976B2 (en) * | 2008-07-23 | 2011-04-19 | Semprius, Inc. | Reinforced composite stamp for dry transfer printing of semiconductor elements |
| US8432548B2 (en) | 2008-11-04 | 2013-04-30 | Molecular Imprints, Inc. | Alignment for edge field nano-imprinting |
| US20120126458A1 (en) | 2009-05-26 | 2012-05-24 | King William P | Casting microstructures into stiff and durable materials from a flexible and reusable mold |
| TWI565675B (zh) * | 2011-01-11 | 2017-01-11 | Agy控股公司 | 具低熱膨脹係數之玻璃組合物及由其製成之玻璃纖維 |
| TW201228807A (en) * | 2011-01-13 | 2012-07-16 | Moser Baer India Ltd | Method of imprinting a texture on a rigid substrate using flexible stamp |
| US9616614B2 (en) | 2012-02-22 | 2017-04-11 | Canon Nanotechnologies, Inc. | Large area imprint lithography |
| CN103235483B (zh) | 2013-05-07 | 2016-01-20 | 青岛博纳光电装备有限公司 | 大面积纳米图形化的装置和方法 |
| JP6387107B2 (ja) * | 2014-03-31 | 2018-09-05 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | インプリント方法、そのためのコンピュータプログラム及び装置 |
| EP3172111B1 (de) | 2014-07-23 | 2018-09-12 | Endepro GmbH | Kinderwagen |
| JPWO2016051928A1 (ja) * | 2014-10-04 | 2017-09-28 | 富山県 | インプリント用テンプレート及びその製造方法 |
| WO2016128494A1 (en) | 2015-02-13 | 2016-08-18 | Morphotonics Holding Bv | Method for texturing discrete substrates |
| ES2733809T3 (es) | 2015-02-13 | 2019-12-03 | Morphotonics Holding Bv | Método para texturizar substratos discretos y sello flexible |
| JP6578883B2 (ja) * | 2015-10-26 | 2019-09-25 | 大日本印刷株式会社 | フィルムモールド及びインプリント方法 |
| CN108475621A (zh) | 2016-07-05 | 2018-08-31 | 松下知识产权经营株式会社 | 模具、压印装置及压印方法 |
-
2019
- 2019-10-11 EP EP19791179.5A patent/EP3662325B1/en active Active
- 2019-10-11 CN CN201980066409.4A patent/CN113168089B/zh active Active
- 2019-10-11 KR KR1020217010499A patent/KR102854887B1/ko active Active
- 2019-10-11 WO PCT/EP2019/077606 patent/WO2020074709A1/en not_active Ceased
- 2019-10-11 JP JP2021520121A patent/JP7417600B2/ja active Active
- 2019-10-11 DK DK19791179.5T patent/DK3662325T3/da active
- 2019-10-11 US US17/283,505 patent/US11977328B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20210104020A (ko) | 2021-08-24 |
| US20210397083A1 (en) | 2021-12-23 |
| WO2020074709A1 (en) | 2020-04-16 |
| EP3662325B1 (en) | 2020-11-04 |
| EP3662325A1 (en) | 2020-06-10 |
| JP7417600B2 (ja) | 2024-01-18 |
| KR102854887B1 (ko) | 2025-09-04 |
| JP2022504767A (ja) | 2022-01-13 |
| CN113168089A (zh) | 2021-07-23 |
| CN113168089B (zh) | 2025-03-04 |
| US11977328B2 (en) | 2024-05-07 |
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