DK1518005T3 - Materialefordampningskammer med differentialvakuumpumpe - Google Patents

Materialefordampningskammer med differentialvakuumpumpe

Info

Publication number: DK1518005T3
Authority: DK; Denmark
Prior art keywords: evaporation chamber; vacuum pump; material evaporation; principal axis; material sources
Prior art date: 2002-06-18

Application number

DK03760059T

Other languages

English (en)

Inventor

Catherine Chaix

Alain Batiment C Jarry

Pierre-Andre Nutte

Jean-Pierre Locquet

Jean Fompeyrine

Heinz Siegwart

Original Assignee

Riber

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-06-18

Filing date

2003-06-18

Publication date

2008-03-17

2003-06-18 Application filed by Riber filed Critical Riber

2008-03-17 Application granted granted Critical

2008-03-17 Publication of DK1518005T3 publication Critical patent/DK1518005T3/da

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/002—Controlling or regulating
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Crystallography & Structural Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Physical Vapour Deposition (AREA)
Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Control Of Resistance Heating (AREA)
Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

DK03760059T 2002-06-18 2003-06-18 Materialefordampningskammer med differentialvakuumpumpe DK1518005T3 (da)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
FR0207501A FR2840925B1 (fr)	2002-06-18	2002-06-18	Chambre d'evaporation de materiaux sous vide a pompage differentiel
PCT/FR2003/001868 WO2003106731A1 (fr)	2002-06-18	2003-06-18	Chambre d'evaporation de materiaux sous vide a pompage differentiel

Publications (1)

Publication Number	Publication Date
DK1518005T3 true DK1518005T3 (da)	2008-03-17

Family

ID=29595355

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DK03760059T DK1518005T3 (da)	2002-06-18	2003-06-18	Materialefordampningskammer med differentialvakuumpumpe

Country Status (13)

Country	Link
US (1)	US8894769B2 (da)
EP (1)	EP1518005B1 (da)
JP (1)	JP4918221B2 (da)
KR (1)	KR101099669B1 (da)
CN (1)	CN100523275C (da)
AT (1)	ATE378442T1 (da)
AU (1)	AU2003255682A1 (da)
CA (1)	CA2489602C (da)
DE (1)	DE60317510T2 (da)
DK (1)	DK1518005T3 (da)
ES (1)	ES2295640T3 (da)
FR (1)	FR2840925B1 (da)
WO (1)	WO2003106731A1 (da)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4292128B2 (ja) *	2004-09-07	2009-07-08	キヤノンアネルバ株式会社	磁気抵抗効果素子の製造方法
CN100587106C (zh) *	2007-09-14	2010-02-03	中国科学院安徽光学精密机械研究所	溅射、沉积分离腔式真空薄膜沉积装置及其工作方法
ES2385460T3 (es) *	2009-06-18	2012-07-25	Riber	Aparato para depositar una película delgada de material sobre un sustrato y procedimiento de regenaración para un aparato de este tipo
PL2264225T3 (pl) *	2009-06-18	2013-01-31	Riber	Urządzenie do epitaksji z wiązek molekularnych, do wytwarzania płytek materiału półprzewodnikowego
KR101879274B1 (ko)	2012-01-09	2018-08-20	삼성디스플레이 주식회사	저온 증착 장치
CN103794459B (zh) *	2012-10-29	2016-04-06	中微半导体设备(上海)有限公司	用于等离子处理腔室的气体喷淋头及其涂层形成方法
EP3366804B1 (en)	2017-02-22	2022-05-11	Satisloh AG	Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses
CN107400861B (zh) *	2017-09-21	2020-05-08	深圳市华格纳米科技有限公司	一种自动化连续式电阻蒸发镀膜装置
CN113413895B (zh) *	2021-07-09	2022-03-29	苏州道一至诚纳米材料技术有限公司	薄膜催化剂的生产设备及生产方法

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JPS5645344A (en)	1979-09-19	1981-04-25	Mitsubishi Heavy Ind Ltd	Welded structure of machine tool
JPS57155376A (en) *	1981-03-23	1982-09-25	Hitachi Ltd	Evaporating apparatus
JPS57162371A (en) *	1981-03-30	1982-10-06	Seiko Epson Corp	Mos semiconductor memory device
JPS57162371U (da) *	1981-04-01	1982-10-13
US4654231A (en) *	1985-05-21	1987-03-31	The United States Of America As Represented By The Secretary Of The Navy	Vanadium dioxide film deposition
JPS6265732A (ja) *	1985-09-17	1987-03-25	Nissin Electric Co Ltd	シユラウド用堆積層除去機構
JPS62235464A (ja) *	1985-12-13	1987-10-15	Nippon Telegr & Teleph Corp <Ntt>	有機物高配向膜の作製装置
FR2598721B1 (fr) *	1986-05-15	1988-09-30	Commissariat Energie Atomique	Cellule pour epitaxie par jets moleculaires et procede associe
EP0276914A2 (en) *	1987-01-28	1988-08-03	AT&T Corp.	Anti-flaking measures in molecular-beam-epitaxy apparatus, and method of manufacture
KR910007382B1 (ko) *	1987-08-07	1991-09-25	가부시기가이샤 히다찌세이사꾸쇼	초전도 재료 및 초전도 박막의 제조방법
JP2986799B2 (ja) *	1988-10-14	1999-12-06	株式会社日立製作所	薄膜形成方法及び薄膜形成装置
US5004721A (en) *	1988-11-03	1991-04-02	Board Of Regents, The University Of Texas System	As-deposited oxide superconductor films on silicon and aluminum oxide
JPH069297A (ja) *	1991-12-09	1994-01-18	Sumitomo Electric Ind Ltd	成膜装置
JPH05331626A (ja) *	1992-04-07	1993-12-14	Oji Kako Kk	有機フォトクロミック膜の製造方法
JPH07133192A (ja) *	1993-11-04	1995-05-23	Sumitomo Electric Ind Ltd	成膜装置および成膜方法
JPH0867968A (ja) *	1994-08-26	1996-03-12	Sumitomo Electric Ind Ltd	酸化物薄膜の作製方法
JP2912842B2 (ja) *	1995-01-17	1999-06-28	株式会社エイコー・エンジニアリング	薄膜形成装置
US5788776A (en) *	1996-12-02	1998-08-04	Chorus Corporation	Molecular beam epitaxy isolation tube system
JPH10195641A (ja) *	1997-01-09	1998-07-28	Ulvac Japan Ltd	有機薄膜形成装置
JPH11200017A (ja) *	1998-01-20	1999-07-27	Nikon Corp	光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
US20010036214A1 (en) *	2000-01-28	2001-11-01	Ivan Bozovic	Method and apparatus for in-situ deposition of epitaxial thin film of high-temperature superconductors and other complex oxides under high-pressure
WO2001055317A2 (en)	2000-01-31	2001-08-02	Human Genome Sciences, Inc.	Nucleic acids, proteins, and antibodies
FR2808098B1 (fr) *	2000-04-20	2002-07-19	Cit Alcatel	Procede et dispositif de conditionnement de l'atmosphere dans une chambre de procedes

2002
- 2002-06-18 FR FR0207501A patent/FR2840925B1/fr not_active Expired - Fee Related
2003
- 2003-06-18 WO PCT/FR2003/001868 patent/WO2003106731A1/fr active IP Right Grant
- 2003-06-18 US US10/518,119 patent/US8894769B2/en active Active
- 2003-06-18 DK DK03760059T patent/DK1518005T3/da active
- 2003-06-18 CA CA2489602A patent/CA2489602C/fr not_active Expired - Fee Related
- 2003-06-18 AT AT03760059T patent/ATE378442T1/de active
- 2003-06-18 CN CNB038143267A patent/CN100523275C/zh not_active Expired - Lifetime
- 2003-06-18 EP EP03760059A patent/EP1518005B1/fr not_active Expired - Lifetime
- 2003-06-18 JP JP2004513535A patent/JP4918221B2/ja not_active Expired - Lifetime
- 2003-06-18 AU AU2003255682A patent/AU2003255682A1/en not_active Abandoned
- 2003-06-18 KR KR1020047020666A patent/KR101099669B1/ko active IP Right Grant
- 2003-06-18 DE DE60317510T patent/DE60317510T2/de not_active Expired - Lifetime
- 2003-06-18 ES ES03760059T patent/ES2295640T3/es not_active Expired - Lifetime

Also Published As

Publication number	Publication date
ATE378442T1 (de)	2007-11-15
WO2003106731A1 (fr)	2003-12-24
US20060216161A1 (en)	2006-09-28
DE60317510D1 (de)	2007-12-27
FR2840925A1 (fr)	2003-12-19
EP1518005B1 (fr)	2007-11-14
EP1518005A1 (fr)	2005-03-30
CN1662673A (zh)	2005-08-31
FR2840925B1 (fr)	2005-04-01
JP2005530042A (ja)	2005-10-06
KR101099669B1 (ko)	2011-12-29
KR20050033558A (ko)	2005-04-12
ES2295640T3 (es)	2008-04-16
JP4918221B2 (ja)	2012-04-18
CN100523275C (zh)	2009-08-05
CA2489602A1 (fr)	2003-12-24
DE60317510T2 (de)	2008-09-11
CA2489602C (fr)	2010-10-19
AU2003255682A1 (en)	2003-12-31
US8894769B2 (en)	2014-11-25

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DE60033398D1 (de)	2007-03-29	Pumpe für kolostomie
DE60101656D1 (de)	2004-02-05	Spenderpumpen
DK1518005T3 (da)	2008-03-17	Materialefordampningskammer med differentialvakuumpumpe
EP0974753A3 (en)	2000-10-04	Axial piston pump
ATE507394T1 (de)	2011-05-15	Vakuumpumpe
WO2005028702A3 (en)	2005-05-06	Precursor delivery system
AU8165201A (en)	2002-03-13	Breast cover insert
DE50309460D1 (de)	2008-05-08	Vakuumpumpsystem
DE60020826D1 (de)	2005-07-21	Gerät zur reduzierung von fluidrücklauf durch ein medizinisches ventil
ATE373173T1 (de)	2007-09-15	Doppel- oder mehrfachpumpe
EP1405775A4 (en)	2004-10-20	Hybrid inflator
ATE415986T1 (de)	2008-12-15	Bilanzkammer für eine vorrichtung zum fördern von flüssigkeiten für eine medizinische behandlungsvorrichtung
ATE416035T1 (de)	2008-12-15	Dosiervorrichtung
DE69911257D1 (de)	2003-10-16	Vakuumpumpe
WO2006044387A3 (en)	2006-10-19	Fluid pump
CA2523958A1 (en)	2004-11-25	Liquid ring pump
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SE0301055D0 (sv)	2003-04-10	Hållare för kort av kreditkortstyp
DE502004005487D1 (de)	2007-12-27	Hydrolager mit akustischer Entkopplung
UY27919A1 (es)	2004-02-27	Circuito de dispensacion para fluidos y maquina dispensadora
UA1304U (uk)	2002-06-17	Гвинтовий насос
EP1538335A3 (de)	2006-01-11	Schlauchpumpe mit Vorrichtung zur Vakuumerzeugung
UA40690C2 (uk)	2001-08-15	Роторний насос