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DE876278C - Process for the production of barrier layers for semiconductor photocells and dry rectifiers - Google Patents

Process for the production of barrier layers for semiconductor photocells and dry rectifiers

Info

Publication number
DE876278C
DE876278C DEA10413D DEA0010413D DE876278C DE 876278 C DE876278 C DE 876278C DE A10413 D DEA10413 D DE A10413D DE A0010413 D DEA0010413 D DE A0010413D DE 876278 C DE876278 C DE 876278C
Authority
DE
Germany
Prior art keywords
selenium
semiconductor
barrier layers
production
photocells
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEA10413D
Other languages
German (de)
Inventor
Carl Dr Phil Bosch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AEG AG
Original Assignee
AEG AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AEG AG filed Critical AEG AG
Priority to DEL95748D priority Critical patent/DE756025C/en
Priority to DEA10413D priority patent/DE876278C/en
Priority to NL95275A priority patent/NL54474C/xx
Priority to FR886370D priority patent/FR886370A/en
Priority to FR886371D priority patent/FR886371A/en
Application granted granted Critical
Publication of DE876278C publication Critical patent/DE876278C/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01Manufacture or treatment
    • H10D48/04Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/043Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
    • H10D48/045Treatment of the surface of the selenium or tellurium layer after having been made conductive
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02425Conductive materials, e.g. metallic silicides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02623Liquid deposition
    • H01L21/02628Liquid deposition using solutions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01Manufacture or treatment
    • H10D48/04Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/043Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
    • H10D48/0431Application of the selenium or tellurium to the foundation plate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01Manufacture or treatment
    • H10D48/04Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/043Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
    • H10D48/046Provision of discrete insulating layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Photovoltaic Devices (AREA)

Description

Verfahren zur Herstellung von Sperrsdächten für Halbleiterphotozellen und Trockengleichrichter Die Erfindung betrifft ein Verfahren zur Herstellung überaus #dünner und gleichmäßiger Sperrschichten für Sperrschichtphotozellen und Trockengleichrichter. Bei Photozellen wie auch Trockengleichrichtern zu Meßzwecken kommt es ausschlagebend darauf an, daß die Sperrschicht in sich gleichmäßig und überdies auch bei größten Stückzahlen in immer gleichbleibender Stärke erzeugt wird. Die bekannten Herstellungsverfahren derartiger Zellen oder Trockengleichrichter, bei denen sich die Sperrsc:hicht spontan bildet, sind mancherlei Zufälligkeiten unterworfen, so daß brauchbare Exemplare für solche speziellen Zwecke sorgfältig aus größeren Serien ausgesucht werden müssen. Andererseits zeigen die Elemente mit einer künstlichen isolierenden Zwischenschicht aus Polystyrol od. dgl. den Nachteil, daß sie auch in der Flußri,chtung einen übermäßig hohen inneren Widerstand haben. Es hat sich nun gezeigt, daß sich besonders günstige Vorbedingungen für die Bildung einer reproduzierbaren und gleichmäßigen Sperrsc#hicht mit eineinüberzug aus Selen in seiner roten nicht leitenden Modifikation auf dem Halbleiter erzielen lassen, welcher aus einer Lösung auf dem Halbleiter niedergeschlagen wird. Besonders gün# stige Ergebnisse lassen sich bei solchen Photo7eIlen und Trockengleichrichtern erzielen, bei denen der Halbleiter ebenfalls aus Selen., in der leitenden kristallinen Modifikation, besteht, doch ergibt die Erzeugung einer #dünnen Selenschicht nach der Erfindung auchauf anderen Halbleiterschichten die günstigsten Ergebnisse.'In jedem Fall erhält man Selenschichten extrem geringer Schichtdicke mit genaudosierbaren Substanzinengen.Process for the production of barrier roofs for semiconductor photocells and dry rectifier The invention relates to a method of manufacture exceedingly # thinner and more uniform barriers for barrier photocells and dry rectifiers. In the case of photocells as well as dry rectifiers for measuring purposes, it is crucial on the fact that the barrier layer is uniform and, moreover, even with the largest Number of pieces is always produced in the same strength. The known manufacturing processes such cells or dry rectifiers in which the blocking layer changes spontaneously forms are subject to various coincidences, so that usable specimens must be carefully selected from larger series for such special purposes. On the other hand, show the elements with an artificial insulating intermediate layer from polystyrene or the like. The disadvantage that they are excessive in the flow direction have high internal resistance. It has now been shown that they are particularly favorable Preconditions for the formation of a reproducible and uniform barrier layer with a single coating of selenium in its red non-conductive modification on the Let semiconductor achieve, which deposited from a solution on the semiconductor will. Particularly favorable results can be achieved with such photocells and dry rectifiers achieve, in which the semiconductor is also made of selenium., in the conductive crystalline Modification exists, but the creation of a # thin selenium layer results the Invention is also the cheapest on other semiconductor layers Results. In any case, extremely thin layers of selenium are obtained with precisely metered amounts of substances.

Die Herstellung einer solchen dünnen Selenschicht kann beispielsweise auf folgende Weise erfolgen: Auf die freie Oberfläche des auf einer Trägerplatte, beispiels-weise aus Nickel oder vernIckeltein Eisen, aufgetragenen Halbleiters, z. B. aus Selen in der leitenden kristallinen Modifikation, wird auf inechanischein Wege- eine Selen in Lösung enthaltende Flüssigkeit, insbesondere Selen-bromid oder Schwefelkohlenstoff, auf-getragen und das so überzogene Element auf eine Temperatur von etwa ioo bis i2o' erhitzt. Hier-durch wird das Lösu-ngsmittel zur Verdampfun.g und das gelöste Selen zifin Niederschlag gebracht. Nach vollständiger Trocknung befindet sich auf - der Halbleiterschicht eine überaus dünne Schicht roten, nicht leitenden Selens, auf welche nunmehr zur Fertigstellung der Zelle oder des Gleichrichters die Gegenelektrode in bekannterWeise aufgebracht werden kann.Such a thin selenium layer can be produced, for example, in the following way: On the free surface of the semiconductor, e.g. B. of selenium in the conductive crystalline modification, is mechanically applied to a liquid containing selenium in solution, in particular selenium bromide or carbon disulfide, and the element coated in this way is heated to a temperature of about 100 to 12o '. This causes the solvent to evaporate and the dissolved selenium precipitate. After complete drying is on - the semiconductor layer is a very thin layer of red, non-conductive selenium, to which now the counter electrode may be applied in known manner to complete the cell or the rectifier.

Claims (1)

PATEXTANSPRUCH.-I Verfahren zur Herstellung von Sperrschichtell für Halbleiterphotozellen und Trockengleichrichter, dadurch gekennzeichnet, daß aus einer häuf die Halbleiterschicht mechanisch aufgebrachten, Selen enthaltenden Lösung, beispielsweise in, Selenbromid oder Schwefelkohlenstoff, das Selen niedergeschlagen und hierauf das Lösungsmittel verdampft wird.PATEXT CLAIM.- I A method for producing barrier layers for semiconductor photocells and dry rectifiers, characterized in that the selenium is precipitated from a solution containing selenium, for example in selenium bromide or carbon disulfide, which is often mechanically applied to the semiconductor layer, and the solvent is then evaporated.
DEA10413D 1938-10-04 1938-10-04 Process for the production of barrier layers for semiconductor photocells and dry rectifiers Expired DE876278C (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DEL95748D DE756025C (en) 1938-10-04 1938-10-04 Process for producing a barrier layer on the semiconductor layer of dry rectifiers
DEA10413D DE876278C (en) 1938-10-04 1938-10-04 Process for the production of barrier layers for semiconductor photocells and dry rectifiers
NL95275A NL54474C (en) 1938-10-04 1939-09-20
FR886370D FR886370A (en) 1938-10-04 1942-10-05 Manufacturing process for thin selenium layers, in particular for photoelectric cells and dry rectifiers
FR886371D FR886371A (en) 1938-10-04 1942-10-05 Process for obtaining a barrier layer for dry straighteners

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEL95748D DE756025C (en) 1938-10-04 1938-10-04 Process for producing a barrier layer on the semiconductor layer of dry rectifiers
DEA10413D DE876278C (en) 1938-10-04 1938-10-04 Process for the production of barrier layers for semiconductor photocells and dry rectifiers

Publications (1)

Publication Number Publication Date
DE876278C true DE876278C (en) 1953-05-11

Family

ID=25963088

Family Applications (2)

Application Number Title Priority Date Filing Date
DEA10413D Expired DE876278C (en) 1938-10-04 1938-10-04 Process for the production of barrier layers for semiconductor photocells and dry rectifiers
DEL95748D Expired DE756025C (en) 1938-10-04 1938-10-04 Process for producing a barrier layer on the semiconductor layer of dry rectifiers

Family Applications After (1)

Application Number Title Priority Date Filing Date
DEL95748D Expired DE756025C (en) 1938-10-04 1938-10-04 Process for producing a barrier layer on the semiconductor layer of dry rectifiers

Country Status (3)

Country Link
DE (2) DE876278C (en)
FR (2) FR886370A (en)
NL (1) NL54474C (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1032669B (en) * 1953-03-17 1958-06-19 Haloid Co Photosensitive material for generating a latent charge image

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE519162C (en) * 1928-11-01 1931-02-25 Sueddeutsche Telefon App Kabel Electric valve with a fixed valve layer arranged between electrodes
US1994632A (en) * 1933-05-11 1935-03-19 Bell Telephone Labor Inc Asymmetric conductor
FR769645A (en) * 1933-05-26 1934-08-29 Thomson Houston Comp Francaise Improvements to contact rectifiers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1032669B (en) * 1953-03-17 1958-06-19 Haloid Co Photosensitive material for generating a latent charge image

Also Published As

Publication number Publication date
FR886371A (en) 1943-10-13
DE756025C (en) 1952-06-16
NL54474C (en) 1943-05-15
FR886370A (en) 1943-10-13

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