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DE69918958D1 - Rasterelektronenmikroskop mit einem ortssensitiven detektor - Google Patents

Rasterelektronenmikroskop mit einem ortssensitiven detektor

Info

Publication number
DE69918958D1
DE69918958D1 DE69918958T DE69918958T DE69918958D1 DE 69918958 D1 DE69918958 D1 DE 69918958D1 DE 69918958 T DE69918958 T DE 69918958T DE 69918958 T DE69918958 T DE 69918958T DE 69918958 D1 DE69918958 D1 DE 69918958D1
Authority
DE
Germany
Prior art keywords
electron microscope
sensitive detector
local sensitive
grid electron
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69918958T
Other languages
English (en)
Other versions
DE69918958T2 (de
Inventor
F Hayles
Veen N Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of DE69918958D1 publication Critical patent/DE69918958D1/de
Application granted granted Critical
Publication of DE69918958T2 publication Critical patent/DE69918958T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69918958T 1998-12-29 1999-12-17 Rasterelektronenmikroskop mit einem ortssensitiven detektor Expired - Lifetime DE69918958T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98204478 1998-12-29
EP98204478 1998-12-29
PCT/EP1999/010193 WO2000039836A1 (en) 1998-12-29 1999-12-17 Sem for transmission operation with a location-sensitive detector

Publications (2)

Publication Number Publication Date
DE69918958D1 true DE69918958D1 (de) 2004-09-02
DE69918958T2 DE69918958T2 (de) 2005-01-05

Family

ID=8234572

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69918958T Expired - Lifetime DE69918958T2 (de) 1998-12-29 1999-12-17 Rasterelektronenmikroskop mit einem ortssensitiven detektor

Country Status (5)

Country Link
US (1) US6376839B1 (de)
EP (1) EP1058943B1 (de)
JP (1) JP4590590B2 (de)
DE (1) DE69918958T2 (de)
WO (1) WO2000039836A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6787772B2 (en) * 2000-01-25 2004-09-07 Hitachi, Ltd. Scanning electron microscope
KR100462055B1 (ko) * 2001-04-03 2004-12-17 재단법인서울대학교산학협력재단 물질의 결정구조를 이용한 패턴 형성 방법 및 장치
NL1022426C2 (nl) * 2003-01-17 2004-07-26 Fei Co Werkwijze voor het vervaardigen en transmissief bestralen van een preparaat alsmede deeltjes optisch systeem.
EP1787310A2 (de) * 2004-08-24 2007-05-23 Sela Semiconductor Engineering Laboratories Ltd. Gerichtete, mehrfach abgelenkte ionenstrahlbearbeitung eines arbeitsstücks und bestimmung und steueurng seines ausmasses
US7834315B2 (en) * 2007-04-23 2010-11-16 Omniprobe, Inc. Method for STEM sample inspection in a charged particle beam instrument
DE102007026847A1 (de) * 2007-06-06 2008-12-11 Carl Zeiss Nts Gmbh Teilchenstrahlgerät und Verfahren zur Anwendung bei einem Teilchenstrahlgerät
EP2194565A1 (de) 2008-12-03 2010-06-09 FEI Company Dunkelfelddetektor zur Verwendung in einer teilchenoptischen Vorrichtung
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
WO2014069364A1 (ja) * 2012-10-30 2014-05-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびそれを用いた観察方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58193453U (ja) * 1982-06-14 1983-12-22 株式会社明石製作所 電子線装置における反射電子検出装置
JP2577020B2 (ja) * 1987-12-04 1997-01-29 凸版印刷株式会社 ビームプロファイラ
JP2602287B2 (ja) * 1988-07-01 1997-04-23 株式会社日立製作所 Ｘ線マスクの欠陥検査方法及びその装置
JPH02294016A (ja) * 1989-05-08 1990-12-05 Nippon Telegr & Teleph Corp <Ntt> 荷電ビーム描画装置用ビームブランキング構造体
JPH07169429A (ja) * 1993-11-05 1995-07-04 Hitachi Ltd 走査透過電子顕微鏡
JP3353488B2 (ja) * 1994-10-03 2002-12-03 株式会社島津製作所 イオン散乱分光装置

Also Published As

Publication number Publication date
WO2000039836A1 (en) 2000-07-06
EP1058943A1 (de) 2000-12-13
EP1058943B1 (de) 2004-07-28
JP4590590B2 (ja) 2010-12-01
JP2002533903A (ja) 2002-10-08
US6376839B1 (en) 2002-04-23
DE69918958T2 (de) 2005-01-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition