DE69912484D1 - Verfahren zur Herstellung eines Silizium-Einkristalles - Google Patents
Verfahren zur Herstellung eines Silizium-EinkristallesInfo
- Publication number
- DE69912484D1 DE69912484D1 DE69912484T DE69912484T DE69912484D1 DE 69912484 D1 DE69912484 D1 DE 69912484D1 DE 69912484 T DE69912484 T DE 69912484T DE 69912484 T DE69912484 T DE 69912484T DE 69912484 D1 DE69912484 D1 DE 69912484D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- single crystal
- silicon single
- silicon
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/36—Single-crystal growth by pulling from a melt, e.g. Czochralski method characterised by the seed, e.g. its crystallographic orientation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1776598 | 1998-01-14 | ||
JP01776598A JP3440802B2 (ja) | 1998-01-14 | 1998-01-14 | シリコン単結晶の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69912484D1 true DE69912484D1 (de) | 2003-12-11 |
DE69912484T2 DE69912484T2 (de) | 2004-09-02 |
Family
ID=11952813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69912484T Expired - Lifetime DE69912484T2 (de) | 1998-01-14 | 1999-01-07 | Verfahren zur Herstellung eines Silizium-Einkristalles |
Country Status (6)
Country | Link |
---|---|
US (1) | US20020000187A1 (de) |
EP (1) | EP0930381B1 (de) |
JP (1) | JP3440802B2 (de) |
KR (1) | KR100582237B1 (de) |
DE (1) | DE69912484T2 (de) |
TW (1) | TW442843B (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW538445B (en) * | 1998-04-07 | 2003-06-21 | Shinetsu Handotai Kk | Silicon seed crystal and method for producing silicon single crystal |
JP3440819B2 (ja) * | 1998-04-07 | 2003-08-25 | 信越半導体株式会社 | シリコン単結晶の製造方法 |
EP1498517B1 (de) * | 2002-04-24 | 2016-08-31 | Shin-Etsu Handotai Co., Ltd. | Verfahren zur herstellung von silicium-einkristall, silicium-einkristall und silicium-wafer |
NO326797B1 (no) * | 2005-06-10 | 2009-02-16 | Elkem As | Fremgangsmate og apparat for raffinering av smeltet materiale |
KR100848549B1 (ko) | 2006-12-18 | 2008-07-25 | 주식회사 실트론 | 실리콘 단결정 성장 방법 |
CN110528069B (zh) * | 2018-05-25 | 2021-07-06 | 隆基绿能科技股份有限公司 | 一种直拉硅单晶的自动调温方法 |
CN110396716B (zh) * | 2019-09-04 | 2021-05-18 | 内蒙古中环光伏材料有限公司 | 一种引晶引断后自动稳温工艺 |
FR3111360B1 (fr) * | 2020-06-15 | 2024-04-12 | Commissariat Energie Atomique | Procédé de fabrication d’une pièce par solidification d’un matériau semi-conducteur |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5501172A (en) * | 1994-03-11 | 1996-03-26 | Shin-Etsu Handotai Co., Ltd. | Method of growing silicon single crystals |
US5578284A (en) * | 1995-06-07 | 1996-11-26 | Memc Electronic Materials, Inc. | Silicon single crystal having eliminated dislocation in its neck |
JP3016126B2 (ja) * | 1996-02-29 | 2000-03-06 | 住友金属工業株式会社 | 単結晶の引き上げ方法 |
JP2937112B2 (ja) * | 1996-03-13 | 1999-08-23 | 住友金属工業株式会社 | 単結晶引き上げ用種結晶及び該種結晶を用いた単結晶引き上げ方法 |
-
1998
- 1998-01-14 JP JP01776598A patent/JP3440802B2/ja not_active Expired - Fee Related
- 1998-12-31 TW TW087122032A patent/TW442843B/zh not_active IP Right Cessation
-
1999
- 1999-01-07 DE DE69912484T patent/DE69912484T2/de not_active Expired - Lifetime
- 1999-01-07 EP EP99300124A patent/EP0930381B1/de not_active Expired - Lifetime
- 1999-01-08 US US09/229,086 patent/US20020000187A1/en not_active Abandoned
- 1999-01-12 KR KR1019990000600A patent/KR100582237B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
DE69912484T2 (de) | 2004-09-02 |
KR100582237B1 (ko) | 2006-05-24 |
JP3440802B2 (ja) | 2003-08-25 |
US20020000187A1 (en) | 2002-01-03 |
JPH11199381A (ja) | 1999-07-27 |
EP0930381B1 (de) | 2003-11-05 |
KR19990067864A (ko) | 1999-08-25 |
TW442843B (en) | 2001-06-23 |
EP0930381A1 (de) | 1999-07-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |