DE69526286D1 - Verfahren zur Herstellung eines keramischen Substrates - Google Patents
Verfahren zur Herstellung eines keramischen SubstratesInfo
- Publication number
- DE69526286D1 DE69526286D1 DE69526286T DE69526286T DE69526286D1 DE 69526286 D1 DE69526286 D1 DE 69526286D1 DE 69526286 T DE69526286 T DE 69526286T DE 69526286 T DE69526286 T DE 69526286T DE 69526286 D1 DE69526286 D1 DE 69526286D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- ceramic substrate
- ceramic
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/486—Via connections through the substrate with or without pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49861—Lead-frames fixed on or encapsulated in insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/10287—Metal wires as connectors or conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0235—Laminating followed by cutting or slicing perpendicular to plane of the laminate; Embedding wires in an object and cutting or slicing the object perpendicular to direction of the wires
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49163—Manufacturing circuit on or in base with sintering of base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
- Y10T29/49208—Contact or terminal manufacturing by assembling plural parts
- Y10T29/49222—Contact or terminal manufacturing by assembling plural parts forming array of contacts or terminals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Structure Of Printed Boards (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15082594 | 1994-07-01 | ||
JP03350895A JP3483012B2 (ja) | 1994-07-01 | 1995-02-22 | セラミック基板製造用焼結体、セラミック基板およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69526286D1 true DE69526286D1 (de) | 2002-05-16 |
DE69526286T2 DE69526286T2 (de) | 2002-10-10 |
Family
ID=26372213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69526286T Expired - Fee Related DE69526286T2 (de) | 1994-07-01 | 1995-06-22 | Verfahren zur Herstellung eines keramischen Substrates |
Country Status (5)
Country | Link |
---|---|
US (1) | US5997999A (de) |
EP (2) | EP0690505B1 (de) |
JP (1) | JP3483012B2 (de) |
KR (1) | KR0185462B1 (de) |
DE (1) | DE69526286T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6323549B1 (en) | 1996-08-29 | 2001-11-27 | L. Pierre deRochemont | Ceramic composite wiring structures for semiconductor devices and method of manufacture |
JP3436663B2 (ja) * | 1996-09-30 | 2003-08-11 | 新光電気工業株式会社 | 配線基板の製造装置及びワイヤ掛け装置 |
KR100616188B1 (ko) * | 2000-07-26 | 2006-08-25 | 주식회사 휴비스 | 폴리에스테르 공중합체 및 그 제조방법 |
US7480988B2 (en) * | 2001-03-30 | 2009-01-27 | Second Sight Medical Products, Inc. | Method and apparatus for providing hermetic electrical feedthrough |
US6821625B2 (en) * | 2001-09-27 | 2004-11-23 | International Business Machines Corporation | Thermal spreader using thermal conduits |
US7106167B2 (en) * | 2002-06-28 | 2006-09-12 | Heetronix | Stable high temperature sensor system with tungsten on AlN |
KR100482960B1 (ko) * | 2002-07-27 | 2005-04-18 | 난야 플라스틱스 코오퍼레이션 | 탄성을 지닌 극세 섬유 텍스쳐드 얀의 제조 방법 |
JP2009064966A (ja) | 2007-09-06 | 2009-03-26 | Shinko Electric Ind Co Ltd | 多層配線基板及びその製造方法ならびに半導体装置 |
JP5466102B2 (ja) * | 2010-07-08 | 2014-04-09 | セイコーインスツル株式会社 | 貫通電極付きガラス基板の製造方法及び電子部品の製造方法 |
JP5511557B2 (ja) * | 2010-07-08 | 2014-06-04 | セイコーインスツル株式会社 | ガラス基板の製造方法及び電子部品の製造方法 |
JP2012019108A (ja) * | 2010-07-08 | 2012-01-26 | Seiko Instruments Inc | ガラス基板の製造方法及び電子部品の製造方法 |
JP6081051B2 (ja) * | 2011-01-20 | 2017-02-15 | 太陽誘電株式会社 | コイル部品 |
JP4906972B1 (ja) | 2011-04-27 | 2012-03-28 | 太陽誘電株式会社 | 磁性材料およびそれを用いたコイル部品 |
JP2012238841A (ja) | 2011-04-27 | 2012-12-06 | Taiyo Yuden Co Ltd | 磁性材料及びコイル部品 |
JP5048155B1 (ja) | 2011-08-05 | 2012-10-17 | 太陽誘電株式会社 | 積層インダクタ |
JP5082002B1 (ja) | 2011-08-26 | 2012-11-28 | 太陽誘電株式会社 | 磁性材料およびコイル部品 |
JP6012960B2 (ja) | 2011-12-15 | 2016-10-25 | 太陽誘電株式会社 | コイル型電子部品 |
JP7378210B2 (ja) * | 2019-01-17 | 2023-11-13 | 新光電気工業株式会社 | セラミック部材の製造方法 |
JP7366551B2 (ja) * | 2019-02-05 | 2023-10-23 | 新光電気工業株式会社 | 複合グリーンシート、セラミック部材、複合グリーンシートの製造方法及びセラミック部材の製造方法 |
KR102267023B1 (ko) * | 2019-09-05 | 2021-06-18 | 김용화 | 웨이퍼 제조 방법 |
TW202134490A (zh) * | 2020-03-13 | 2021-09-16 | 鴻創應用科技有限公司 | 氮化鋁晶圓片之製造方法及其氮化鋁晶圓片 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1227965C2 (de) * | 1961-08-25 | 1974-05-22 | Telefunken Patent | Mikrominiaturisierte Schaltungsanordnung |
FR1370673A (fr) * | 1963-06-24 | 1964-08-28 | Csf | Bobine à enroulement supraconducteur et son procédé de fabrication |
US3483499A (en) * | 1968-08-08 | 1969-12-09 | Bourns Inc | Inductive device |
JPS609146A (ja) * | 1983-06-28 | 1985-01-18 | Fujitsu Ltd | リ−ドレスチツプキヤリア基板の形成方法 |
JPS62139345A (ja) * | 1985-12-13 | 1987-06-23 | Matsushita Electric Ind Co Ltd | 半導体チツプ塔載用基板の製造方法 |
JP2692112B2 (ja) * | 1988-03-10 | 1997-12-17 | ソニー株式会社 | 映像信号の判別回路 |
JP2765885B2 (ja) * | 1988-11-14 | 1998-06-18 | 新光電気工業株式会社 | 窒化アルミニウム回路基板及びその製造方法 |
JPH02267989A (ja) * | 1989-04-07 | 1990-11-01 | Ngk Insulators Ltd | セラミック回路基板およびその製造方法 |
JPH0393290A (ja) * | 1989-09-05 | 1991-04-18 | Fujitsu Ltd | ビアの形成方法 |
US5443786A (en) * | 1989-09-19 | 1995-08-22 | Fujitsu Limited | Composition for the formation of ceramic vias |
JP2692332B2 (ja) * | 1990-03-27 | 1997-12-17 | 富士通株式会社 | 窒化アルミニウム基板の製造方法 |
JPH04179194A (ja) * | 1990-11-09 | 1992-06-25 | Hitachi Ltd | セラミックグリーンシート及びその製法 |
US5240671A (en) * | 1992-06-01 | 1993-08-31 | Microelectronics And Computer Technology Corporation | Method of forming recessed patterns in insulating substrates |
US5456778A (en) * | 1992-08-21 | 1995-10-10 | Sumitomo Metal Ceramics Inc. | Method of fabricating ceramic circuit substrate |
JPH07245482A (ja) * | 1994-03-03 | 1995-09-19 | Shinko Electric Ind Co Ltd | セラミック回路基板及びその製造方法 |
JP3442895B2 (ja) * | 1994-07-04 | 2003-09-02 | 新光電気工業株式会社 | 基板製造用焼成体、基板およびその製造方法 |
-
1995
- 1995-02-22 JP JP03350895A patent/JP3483012B2/ja not_active Expired - Fee Related
- 1995-06-22 EP EP95304383A patent/EP0690505B1/de not_active Expired - Lifetime
- 1995-06-22 DE DE69526286T patent/DE69526286T2/de not_active Expired - Fee Related
- 1995-06-22 EP EP99123981A patent/EP1005088A1/de not_active Withdrawn
- 1995-06-26 KR KR1019950017531A patent/KR0185462B1/ko not_active IP Right Cessation
-
1997
- 1997-10-23 US US08/957,306 patent/US5997999A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69526286T2 (de) | 2002-10-10 |
KR960005967A (ko) | 1996-02-23 |
US5997999A (en) | 1999-12-07 |
EP0690505A3 (de) | 1996-08-07 |
JP3483012B2 (ja) | 2004-01-06 |
EP0690505A2 (de) | 1996-01-03 |
KR0185462B1 (ko) | 1999-03-20 |
JPH0878581A (ja) | 1996-03-22 |
EP1005088A1 (de) | 2000-05-31 |
EP0690505B1 (de) | 2002-04-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69518548D1 (de) | Verfahren zur Herstellung eines keramischen Substrates | |
DE69827856D1 (de) | Verfahren zur Herstellung eines bedruckten Substrats | |
DE69526286D1 (de) | Verfahren zur Herstellung eines keramischen Substrates | |
DE69328390D1 (de) | Verfahren zur Herstellung eines mehrlagigen Substrats | |
DE69835469D1 (de) | Verfahren zur Herstellung eines geklebten Substrates | |
DE69418542D1 (de) | Verfahren zur Herstellung funktioneller Beschichtungen | |
DE3855249D1 (de) | Verfahren zur Herstellung eines Siliciumcarbidsubstrats | |
DE69407734D1 (de) | Verfahren zur Herstellung diamantartiger Beschichtungen | |
DE3886605D1 (de) | Verfahren zur Herstellung eines keramischen Mehrschichtsubstrats. | |
DE69125118D1 (de) | Verfahren zur Herstellung eines Diamant-Überzuges | |
DE69629094D1 (de) | Verfahren zur Herstellung eines SOI-Substrates | |
DE69526557D1 (de) | Verfahren zur Herstellung einer Mikrostruktur | |
DE69614609D1 (de) | Verfahren zur Herstellung eines Einkristalles | |
DE3851191D1 (de) | Verfahren zur Beschichtung eines Substrates. | |
DE59603133D1 (de) | Verfahren zur Herstellung von sublithographischen Ätzmasken | |
DE58906873D1 (de) | Verfahren zur Herstellung eines flexiblen Trägersubstrates. | |
DE69738355D1 (de) | Verfahren zur Herstellung von Beschichtungen | |
DE69305939D1 (de) | Verfahren zur Herstellung eines keramischen Schaltungssubstrates | |
DE69120326D1 (de) | Verfahren zur Herstellung eines Siliziumeinkristalles | |
DE69609244D1 (de) | Verfahren zur Herstellung diamantartiger Beschichtungen | |
DE59304593D1 (de) | Verfahren zur Herstellung eines Bauelementes mit porösem Silizium | |
DE69130184D1 (de) | Verfahren zur Herstellung mehrschichtiger Beschichtungen | |
DE69219652D1 (de) | Verfahren zur Herstellung eines Glassubstrat für Scheibe | |
DE59800920D1 (de) | Verfahren zur Herstellung einer Halbleiterscheibe | |
DE69917951D1 (de) | Verfahren zur Herstellung eines Mehrschichtstoffes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |