DE69705466D1 - Zusammensetzung für Antireflexionsbeschichtung - Google Patents

Zusammensetzung für Antireflexionsbeschichtung

Info

Publication number: DE69705466D1
Authority: DE; Germany
Prior art keywords: coating composition; reflective coating; reflective; composition; coating
Prior art date: 1996-08-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69705466T

Other languages

English (en)

Other versions

DE69705466T2 (de

Inventor

Kazuyoshi Mizutani

Hiroshi Yoshimoto

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-08-07

Filing date

1997-08-06

Publication date

2001-08-09

1996-08-07 Priority claimed from JP20863196A external-priority patent/JP3638058B2/ja

1996-08-07 Priority claimed from JP20863096A external-priority patent/JP3617878B2/ja

1997-08-06 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

2001-08-09 Publication of DE69705466D1 publication Critical patent/DE69705466D1/de

2002-04-25 Application granted granted Critical

2002-04-25 Publication of DE69705466T2 publication Critical patent/DE69705466T2/de

2017-08-07 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Paints Or Removers (AREA)
Materials For Photolithography (AREA)

DE69705466T 1996-08-07 1997-08-06 Zusammensetzung für Antireflexionsbeschichtung Expired - Lifetime DE69705466T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP20863196A JP3638058B2 (ja)	1996-08-07	1996-08-07	反射防止膜材料用組成物
JP20863096A JP3617878B2 (ja)	1996-08-07	1996-08-07	反射防止膜材料用組成物

Publications (2)

Publication Number	Publication Date
DE69705466D1 true DE69705466D1 (de)	2001-08-09
DE69705466T2 DE69705466T2 (de)	2002-04-25

Family

ID=26516948

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69705466T Expired - Lifetime DE69705466T2 (de)	1996-08-07	1997-08-06	Zusammensetzung für Antireflexionsbeschichtung

Country Status (5)

Country	Link
US (2)	US6090531A (de)
EP (1)	EP0823661B1 (de)
KR (2)	KR100498877B1 (de)
DE (1)	DE69705466T2 (de)
TW (1)	TW406215B (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6808869B1 (en) *	1996-12-24	2004-10-26	Fuji Photo Film Co., Ltd.	Bottom anti-reflective coating material composition and method for forming resist pattern using the same
EP0887076A3 (de) *	1997-05-07	1999-03-31	Saturnus A.G.	Verhinderung von Gewebeverklebung und ein dafür vorgesehenes endoskopisches System zum Aufblasen einer Körperhöhle
JP3473887B2 (ja) *	1997-07-16	2003-12-08	東京応化工業株式会社	反射防止膜形成用組成物及びそれを用いたレジストパターンの形成方法
JP4053631B2 (ja) *	1997-10-08	2008-02-27	Ａｚエレクトロニックマテリアルズ株式会社	反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
US6890448B2 (en) *	1999-06-11	2005-05-10	Shipley Company, L.L.C.	Antireflective hard mask compositions
KR100355604B1 (ko)	1999-12-23	2002-10-12	주식회사 하이닉스반도체	난반사 방지막용 중합체와 그 제조방법
KR100359862B1 (ko)	1999-12-23	2002-11-09	주식회사 하이닉스반도체	난반사 방지막용 중합체와 그 제조방법
KR100549574B1 (ko)	1999-12-30	2006-02-08	주식회사 하이닉스반도체	유기 반사 방지막용 중합체 및 그의 제조방법
US6323310B1 (en)	2000-04-19	2001-11-27	Brewer Science, Inc.	Anti-reflective coating compositions comprising polymerized aminoplasts
US6653411B2 (en)	2000-04-19	2003-11-25	Brewer Science, Inc.	Anti-reflective coating compositions comprising polymerized aminoplasts
KR100721181B1 (ko) *	2000-06-30	2007-05-23	주식회사 하이닉스반도체	유기반사방지막 조성물 및 그의 제조방법
KR100687850B1 (ko) *	2000-06-30	2007-02-27	주식회사 하이닉스반도체	유기반사방지막 조성물 및 그의 제조방법
US6927266B2 (en) *	2001-02-22	2005-08-09	Nissan Chemical Industries, Ltd.	Bottom anti-reflective coat forming composition for lithography
CN100526983C (zh) *	2002-02-19	2009-08-12	日产化学工业株式会社	形成防反射膜的组合物
JP3852593B2 (ja) *	2002-07-17	2006-11-29	日産化学工業株式会社	反射防止膜形成組成物
KR100586165B1 (ko) *	2003-12-30	2006-06-07	동부일렉트로닉스 주식회사	바닥 반사 방지 코팅 방법
EP1762895B1 (de)	2005-08-29	2016-02-24	Rohm and Haas Electronic Materials, L.L.C.	Antireflex-Zusammensetzungen für Hartmasken
JP2008066587A (ja) *	2006-09-08	2008-03-21	Toshiba Corp	パターン形成方法
KR100688594B1 (ko) *	2006-10-26	2007-03-02	삼성전자주식회사	축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
JP5337398B2 (ja) *	2007-04-06	2013-11-06	ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー．	コーティング組成物
KR101259001B1 (ko)	2009-12-01	2013-04-29	영창케미칼 주식회사	유기 반사방지막 형성용 조성물 및 이를 포함하는 유기 반사방지막
US9402863B2 (en)	2010-03-05	2016-08-02	Endosat Nv	Methods and systems for conditioning in surgery
JP5988050B2 (ja)	2011-05-20	2016-09-07	日産化学工業株式会社	アクリルアミド構造を含むポリマーを含むリソグラフィー用有機ハードマスク層形成用組成物
KR102163855B1 (ko) *	2019-06-10	2020-10-12	이근수	내산성 및 평탄화 특성이 우수한 유기막 형성용 중합체, 그 제조 방법 및 응용
CN115403976B (zh) *	2022-08-19	2023-04-18	嘉庚创新实验室	一种抗反射涂层组合物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4910122A (en) *	1982-09-30	1990-03-20	Brewer Science, Inc.	Anti-reflective coating
JPS60220931A (ja) *	1984-03-06	1985-11-05	Tokyo Ohka Kogyo Co Ltd	感光性樹脂用下地材料
DE4132685A1 (de) *	1991-10-01	1993-04-08	Basf Ag	Azofarbstoffe enthaltende polymerisate
US5294680A (en) *	1992-07-24	1994-03-15	International Business Machines Corporation	Polymeric dyes for antireflective coatings
JP3082473B2 (ja) *	1992-10-05	2000-08-28	ジェイエスアール株式会社	反射防止膜およびレジストパターンの形成方法
US5525457A (en) *	1994-12-09	1996-06-11	Japan Synthetic Rubber Co., Ltd.	Reflection preventing film and process for forming resist pattern using the same
US5886102A (en) *	1996-06-11	1999-03-23	Shipley Company, L.L.C.	Antireflective coating compositions
US5733714A (en) *	1996-09-30	1998-03-31	Clariant Finance (Bvi) Limited	Antireflective coating for photoresist compositions

1997
- 1997-07-31 TW TW086110924A patent/TW406215B/zh not_active IP Right Cessation
- 1997-08-06 EP EP97113602A patent/EP0823661B1/de not_active Expired - Lifetime
- 1997-08-06 DE DE69705466T patent/DE69705466T2/de not_active Expired - Lifetime
- 1997-08-07 US US08/908,522 patent/US6090531A/en not_active Expired - Fee Related
- 1997-08-07 KR KR1019970037818A patent/KR100498877B1/ko not_active Expired - Fee Related
2000
- 2000-02-07 US US09/499,703 patent/US6248500B1/en not_active Expired - Fee Related
2004
- 2004-11-24 KR KR1020040096765A patent/KR100535222B1/ko not_active IP Right Cessation

Also Published As

Publication number	Publication date
US6248500B1 (en)	2001-06-19
KR19980018491A (ko)	1998-06-05
KR100498877B1 (ko)	2005-10-10
EP0823661A1 (de)	1998-02-11
US6090531A (en)	2000-07-18
TW406215B (en)	2000-09-21
DE69705466T2 (de)	2002-04-25
KR100535222B1 (ko)	2005-12-09
EP0823661B1 (de)	2001-07-04

Publication	Publication Date	Title
DE69705466D1 (de)	2001-08-09	Zusammensetzung für Antireflexionsbeschichtung
DE69727620D1 (de)	2004-03-25	Zusammensetzungen für antireflektierende Beschichtungen
DK0802243T3 (da)	2001-09-03	Overtræksammensætning
DE69604296D1 (de)	1999-10-21	Kabelbeschichtungszusammensetzung
ATE205238T1 (de)	2001-09-15	Wasserverdünnbare beschichtungszusammensetzung für korrosionsschutz
DE69705979D1 (de)	2001-09-13	Wässrige Besichtungszusammentsetzung
DE69509914D1 (de)	1999-07-01	Speiseeisbeschichtungszuzammensetzungen
DE69501075D1 (de)	1998-01-02	Überzugszusammensetzung
FI955588A0 (fi)	1995-11-20	Päällystyskoostumus
DE69702566D1 (de)	2000-08-24	Zusammensetzung für eine antireflektierende Beschichtung
DE69528442D1 (de)	2002-11-07	Hartbare Beschichtungszusammensetzungen
DE69622367D1 (de)	2002-08-22	Beschichtungsmittel-Zusammensetzung
DE69516942D1 (de)	2000-06-21	Entspiegelte Beschichtungszusammensetzung
DE69912902D1 (de)	2003-12-24	Anwuchsverhindernde Überzugszusammensetzung
FI974318L (fi)	1997-11-25	Korroosionkestävä päällystekoostumus
BR9608425A (pt)	1999-03-30	Composição de revestimento
DK0763574T3 (da)	1998-10-07	Antikorrosiv coatingsammensætning
DE69610572D1 (de)	2000-11-16	Zusammensetzung für reflexionsvermindernde Resistbeschichtung
DE69702001D1 (de)	2000-06-15	Beschichtungszusammensetzungen
DE69521870D1 (de)	2001-08-30	Antibewuchs-Beschichtungszusammensetzung
DE69727217D1 (de)	2004-02-19	Verbesserte überzugszusammensetzung
DE69715718D1 (de)	2002-10-31	Beschichtungszusammensetzung
DE69605295D1 (de)	1999-12-30	Beschichtungszusammensetzungen
DE69603450D1 (de)	1999-09-02	Papierbeschichtungsmittel
DE19581452T1 (de)	1997-03-27	Beschichtungszusammensetzung

Legal Events

Date	Code	Title	Description
2002-08-01	8364	No opposition during term of opposition
2007-09-20	8327	Change in the person/name/address of the patent owner	Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP