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DE69501139D1 - Kathodenzerstäubungs-Drehkathode mit mehreren Targets - Google Patents

Kathodenzerstäubungs-Drehkathode mit mehreren Targets

Info

Publication number
DE69501139D1
DE69501139D1 DE69501139T DE69501139T DE69501139D1 DE 69501139 D1 DE69501139 D1 DE 69501139D1 DE 69501139 T DE69501139 T DE 69501139T DE 69501139 T DE69501139 T DE 69501139T DE 69501139 D1 DE69501139 D1 DE 69501139D1
Authority
DE
Germany
Prior art keywords
multiple targets
sputtering cathode
tube
cylinders
magnets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69501139T
Other languages
English (en)
Other versions
DE69501139T2 (de
Inventor
Louis Dresse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Vitrage SA
Original Assignee
Saint Gobain Vitrage SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Vitrage SA filed Critical Saint Gobain Vitrage SA
Application granted granted Critical
Publication of DE69501139D1 publication Critical patent/DE69501139D1/de
Publication of DE69501139T2 publication Critical patent/DE69501139T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3423—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Microwave Tubes (AREA)
  • Solid Thermionic Cathode (AREA)
  • Coating By Spraying Or Casting (AREA)
DE69501139T 1994-09-22 1995-09-21 Kathodenzerstäubungs-Drehkathode mit mehreren Targets Expired - Fee Related DE69501139T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9411319A FR2725073B1 (fr) 1994-09-22 1994-09-22 Cathode rotative de pulverisation cathodique a plusieurs cibles

Publications (2)

Publication Number Publication Date
DE69501139D1 true DE69501139D1 (de) 1998-01-15
DE69501139T2 DE69501139T2 (de) 1998-05-28

Family

ID=9467173

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501139T Expired - Fee Related DE69501139T2 (de) 1994-09-22 1995-09-21 Kathodenzerstäubungs-Drehkathode mit mehreren Targets

Country Status (5)

Country Link
EP (1) EP0703599B1 (de)
AT (1) ATE160901T1 (de)
DE (1) DE69501139T2 (de)
ES (1) ES2111378T3 (de)
FR (1) FR2725073B1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10213043B4 (de) * 2002-03-22 2008-10-30 Von Ardenne Anlagentechnik Gmbh Rohrmagnetron und seine Verwendung
EP1626432A1 (de) * 2004-08-10 2006-02-15 Applied Films GmbH & Co. KG Magnetronsputtereinrichtung, Zylinderkathode und Verfahren zur Aufbringung von dünnen Schichten aus unterschiedlichen Materialien auf einem Substrat
PT1626433E (pt) * 2004-08-10 2007-05-31 Applied Materials Gmbh & Co Kg Dispositivo de pulverização catódica por magnetrão, cátodo cilíndrico e processo de colocação de finas camadas de componentes múltiplos num substracto
DE502005000983D1 (de) 2005-05-13 2007-08-16 Applied Materials Gmbh & Co Kg Verfahren zum Betreiben einer Sputterkathode mit einem Target
US7842355B2 (en) 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties
EP1804275B1 (de) 2005-12-22 2009-03-11 Applied Materials GmbH & Co. KG Zerstäubungsvorrichtung mit einer Rohrkathode und Verfahren zum Betreiben dieser Zerstäubungsvorrichtung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57145983A (en) * 1981-03-04 1982-09-09 Murata Mfg Co Ltd Coaxial barrel sputtering device
US4424916A (en) 1981-06-11 1984-01-10 Pearson Donald L Toothpaste dispenser
US4443318A (en) 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
JPS63266062A (ja) * 1987-04-23 1988-11-02 Sumitomo Metal Mining Co Ltd 多元素スパツタ薄膜の製造方法及びスパツタ装置
EP0393344A1 (de) 1989-04-20 1990-10-24 Balzers Aktiengesellschaft Haltevorrichtung für Targets von Zerstäubungsquellen und Verfahren zum Festhalten eines Targets in einer Halterung
BE1003701A3 (fr) * 1990-06-08 1992-05-26 Saint Roch Glaceries Cathode rotative.
GB9121665D0 (en) * 1991-10-11 1991-11-27 Boc Group Plc Sputtering processes and apparatus
JPH05263225A (ja) * 1992-03-18 1993-10-12 Asahi Glass Co Ltd スパッタリング方法

Also Published As

Publication number Publication date
FR2725073A1 (fr) 1996-03-29
DE69501139T2 (de) 1998-05-28
EP0703599B1 (de) 1997-12-03
ES2111378T3 (es) 1998-03-01
ATE160901T1 (de) 1997-12-15
FR2725073B1 (fr) 1996-12-20
EP0703599A1 (de) 1996-03-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: GROSSE, BOCKHORNI, SCHUMACHER, 81476 MUENCHEN

8328 Change in the person/name/address of the agent

Representative=s name: BOCKHORNI & KOLLEGEN, 80687 MUENCHEN

8339 Ceased/non-payment of the annual fee