DE69323031D1 - Ohmsche Elektrode, Verfahren für ihre Herstellung und lichtemittierende Vorrichtung - Google Patents
Ohmsche Elektrode, Verfahren für ihre Herstellung und lichtemittierende VorrichtungInfo
- Publication number
- DE69323031D1 DE69323031D1 DE69323031T DE69323031T DE69323031D1 DE 69323031 D1 DE69323031 D1 DE 69323031D1 DE 69323031 T DE69323031 T DE 69323031T DE 69323031 T DE69323031 T DE 69323031T DE 69323031 D1 DE69323031 D1 DE 69323031D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacture
- light
- emitting device
- ohmic electrode
- ohmic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/18, H10D48/04 and H10D48/07, with or without impurities, e.g. doping materials
- H01L21/44—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
- H01L21/441—Deposition of conductive or insulating materials for electrodes
- H01L21/443—Deposition of conductive or insulating materials for electrodes from a gas or vapour, e.g. condensation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/327—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/816—Bodies having carrier transport control structures, e.g. highly-doped semiconductor layers or current-blocking structures
- H10H20/8162—Current-blocking structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/823—Materials of the light-emitting regions comprising only Group II-VI materials, e.g. ZnO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Electrodes Of Semiconductors (AREA)
- Led Devices (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30960392 | 1992-10-23 | ||
JP3274193A JP3278951B2 (ja) | 1992-10-23 | 1993-01-28 | オーミック電極の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69323031D1 true DE69323031D1 (de) | 1999-02-25 |
DE69323031T2 DE69323031T2 (de) | 1999-07-15 |
Family
ID=26371319
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69323031T Expired - Fee Related DE69323031T2 (de) | 1992-10-23 | 1993-10-22 | Ohmsche Elektrode, Verfahren für ihre Herstellung und lichtemittierende Vorrichtung |
Country Status (6)
Country | Link |
---|---|
US (1) | US5373175A (de) |
EP (1) | EP0594212B1 (de) |
JP (1) | JP3278951B2 (de) |
KR (1) | KR100296182B1 (de) |
DE (1) | DE69323031T2 (de) |
TW (1) | TW240342B (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07263372A (ja) * | 1994-03-24 | 1995-10-13 | Sharp Corp | Ii−vi族化合物半導体装置およびその製造方法 |
JP3586293B2 (ja) * | 1994-07-11 | 2004-11-10 | ソニー株式会社 | 半導体発光素子 |
JPH0945890A (ja) * | 1995-05-25 | 1997-02-14 | Sharp Corp | オーミック電極構造、半導体装置およびその製造方法 |
US5760423A (en) * | 1996-11-08 | 1998-06-02 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device, electrode of the same device and method of manufacturing the same device |
JP3854693B2 (ja) * | 1996-09-30 | 2006-12-06 | キヤノン株式会社 | 半導体レーザの製造方法 |
US5952778A (en) * | 1997-03-18 | 1999-09-14 | International Business Machines Corporation | Encapsulated organic light emitting device |
US6448648B1 (en) * | 1997-03-27 | 2002-09-10 | The United States Of America As Represented By The Secretary Of The Navy | Metalization of electronic semiconductor devices |
US6087725A (en) * | 1997-09-29 | 2000-07-11 | Matsushita Electric Industrial Co., Ltd. | Low barrier ohmic contact for semiconductor light emitting device |
JP3414371B2 (ja) * | 2000-07-31 | 2003-06-09 | 株式会社村田製作所 | 弾性表面波装置及びその製造方法 |
JP2004170545A (ja) * | 2002-11-18 | 2004-06-17 | Nippon Petrochemicals Co Ltd | 光学素子の製造方法 |
CN100428504C (zh) * | 2003-11-06 | 2008-10-22 | 厦门市三安光电科技有限公司 | 一种半导体器件及其制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4098921A (en) * | 1976-04-28 | 1978-07-04 | Cutler-Hammer | Tantalum-gallium arsenide schottky barrier semiconductor device |
US4350990A (en) * | 1979-02-28 | 1982-09-21 | General Motors Corporation | Electrode for lead-salt diodes |
US4414561A (en) * | 1979-09-27 | 1983-11-08 | Bell Telephone Laboratories, Incorporated | Beryllium-gold ohmic contact to a semiconductor device |
EP0045644B1 (de) * | 1980-08-04 | 1987-03-18 | Santa Barbara Research Center | Metallische Kontakte für Mischhalbleiteranordnungen |
US4514896A (en) * | 1981-03-25 | 1985-05-07 | At&T Bell Laboratories | Method of forming current confinement channels in semiconductor devices |
JPS5947790A (ja) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | 半導体レ−ザ装置 |
JPH0658977B2 (ja) * | 1984-07-16 | 1994-08-03 | 株式会社小糸製作所 | 半導体素子 |
JPH084170B2 (ja) * | 1986-10-13 | 1996-01-17 | セイコーエプソン株式会社 | 半導体発光素子及びその製造方法 |
US5187547A (en) * | 1988-05-18 | 1993-02-16 | Sanyo Electric Co., Ltd. | Light emitting diode device and method for producing same |
JP2632975B2 (ja) * | 1988-10-31 | 1997-07-23 | 日本電信電話株式会社 | p型ZnSeに対するオーミック電極形成法 |
US5081632A (en) * | 1989-01-26 | 1992-01-14 | Hitachi, Ltd. | Semiconductor emitting device |
US5217539A (en) * | 1991-09-05 | 1993-06-08 | The Boeing Company | III-V solar cells and doping processes |
DE4021199A1 (de) * | 1990-06-11 | 1991-12-19 | Smartdiskette Gmbh | In edv-einrichtungen einsteckbares element |
US5045502A (en) * | 1990-05-10 | 1991-09-03 | Bell Communications Research, Inc. | PdIn ohmic contact to GaAs |
US5274248A (en) * | 1991-06-05 | 1993-12-28 | Matsushita Electric Industrial Co., Ltd. | Light-emitting device with II-VI compounds |
JP3221073B2 (ja) * | 1992-06-19 | 2001-10-22 | ソニー株式会社 | 発光素子 |
-
1993
- 1993-01-28 JP JP3274193A patent/JP3278951B2/ja not_active Expired - Fee Related
- 1993-10-14 KR KR1019930021265A patent/KR100296182B1/ko not_active IP Right Cessation
- 1993-10-18 US US08/136,870 patent/US5373175A/en not_active Expired - Lifetime
- 1993-10-20 TW TW082108721A patent/TW240342B/zh not_active IP Right Cessation
- 1993-10-22 DE DE69323031T patent/DE69323031T2/de not_active Expired - Fee Related
- 1993-10-22 EP EP93117183A patent/EP0594212B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH06188524A (ja) | 1994-07-08 |
EP0594212B1 (de) | 1999-01-13 |
EP0594212A1 (de) | 1994-04-27 |
KR940010435A (ko) | 1994-05-26 |
TW240342B (de) | 1995-02-11 |
US5373175A (en) | 1994-12-13 |
DE69323031T2 (de) | 1999-07-15 |
JP3278951B2 (ja) | 2002-04-30 |
KR100296182B1 (ko) | 2001-10-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |