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DE69204400D1 - Dünne Filmbeschichtungen, hergestellt unter Verwendung von plasmaaktivierter chemischer Dampfphasen-Abscheidung von fluorierten Cyclosiloxanen. - Google Patents

Dünne Filmbeschichtungen, hergestellt unter Verwendung von plasmaaktivierter chemischer Dampfphasen-Abscheidung von fluorierten Cyclosiloxanen.

Info

Publication number
DE69204400D1
DE69204400D1 DE69204400T DE69204400T DE69204400D1 DE 69204400 D1 DE69204400 D1 DE 69204400D1 DE 69204400 T DE69204400 T DE 69204400T DE 69204400 T DE69204400 T DE 69204400T DE 69204400 D1 DE69204400 D1 DE 69204400D1
Authority
DE
Germany
Prior art keywords
cyclosiloxanes
fluorinated
thin film
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69204400T
Other languages
English (en)
Other versions
DE69204400T2 (de
Inventor
Agostino Riccardo D
Gerardo Caporiccio
Pietro Favia
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Application granted granted Critical
Publication of DE69204400D1 publication Critical patent/DE69204400D1/de
Publication of DE69204400T2 publication Critical patent/DE69204400T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Paints Or Removers (AREA)
DE69204400T 1991-07-22 1992-07-16 Dünne Filmbeschichtungen, hergestellt unter Verwendung von plasmaaktivierter chemischer Dampfphasen-Abscheidung von fluorierten Cyclosiloxanen. Expired - Fee Related DE69204400T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITMI912018A IT1255257B (it) 1991-07-22 1991-07-22 Rivestimenti con pellicole sottili realizzati mediante il deposito di vapore migliorato con plasma di silossani ciclici fluorati

Publications (2)

Publication Number Publication Date
DE69204400D1 true DE69204400D1 (de) 1995-10-05
DE69204400T2 DE69204400T2 (de) 1996-04-04

Family

ID=11360395

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69204400T Expired - Fee Related DE69204400T2 (de) 1991-07-22 1992-07-16 Dünne Filmbeschichtungen, hergestellt unter Verwendung von plasmaaktivierter chemischer Dampfphasen-Abscheidung von fluorierten Cyclosiloxanen.

Country Status (5)

Country Link
EP (1) EP0528540B1 (de)
JP (1) JPH05202478A (de)
CA (1) CA2074331A1 (de)
DE (1) DE69204400T2 (de)
IT (1) IT1255257B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5618619A (en) * 1994-03-03 1997-04-08 Monsanto Company Highly abrasion-resistant, flexible coatings for soft substrates
US5846649A (en) * 1994-03-03 1998-12-08 Monsanto Company Highly durable and abrasion-resistant dielectric coatings for lenses
US5560800A (en) * 1994-08-31 1996-10-01 Mobil Oil Corporation Protective coating for pressure-activated adhesives
SG81281A1 (en) * 1999-05-19 2001-06-19 Tokyo Electron Ltd Plasma thin-film deposition method
US6541367B1 (en) 2000-01-18 2003-04-01 Applied Materials, Inc. Very low dielectric constant plasma-enhanced CVD films
TWI273090B (en) 2002-09-09 2007-02-11 Mitsui Chemicals Inc Method for modifying porous film, modified porous film and use of same
US6905773B2 (en) 2002-10-22 2005-06-14 Schlage Lock Company Corrosion-resistant coatings and methods of manufacturing the same
FR2847346B1 (fr) * 2002-11-15 2005-02-18 Essilor Int Procede d'obtention d'un marquage sur une lentille ophtalmique a basse energie de surface
CN100446193C (zh) 2004-02-13 2008-12-24 松下电器产业株式会社 有机无机混合绝缘膜的形成方法
US7662726B2 (en) * 2007-09-13 2010-02-16 Infineon Technologies Ag Integrated circuit device having a gas-phase deposited insulation layer
CN116583131A (zh) 2017-04-26 2023-08-11 Oti照明公司 用于图案化表面上覆层的方法和包括图案化覆层的装置
KR20220017918A (ko) 2019-05-08 2022-02-14 오티아이 루미오닉스 인크. 핵 생성 억제 코팅 형성용 물질 및 이를 포함하는 디바이스
US12113279B2 (en) 2020-09-22 2024-10-08 Oti Lumionics Inc. Device incorporating an IR signal transmissive region
KR20230116914A (ko) 2020-12-07 2023-08-04 오티아이 루미오닉스 인크. 핵 생성 억제 코팅 및 하부 금속 코팅을 사용한 전도성 증착 층의 패턴화

Also Published As

Publication number Publication date
IT1255257B (it) 1995-10-20
DE69204400T2 (de) 1996-04-04
EP0528540B1 (de) 1995-08-30
ITMI912018A0 (it) 1991-07-22
ITMI912018A1 (it) 1993-01-22
CA2074331A1 (en) 1993-01-23
JPH05202478A (ja) 1993-08-10
EP0528540A3 (en) 1993-08-04
EP0528540A2 (de) 1993-02-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee