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DE69202164D1 - Stabilisierung von Thiolenzusammensetzungen. - Google Patents

Stabilisierung von Thiolenzusammensetzungen.

Info

Publication number
DE69202164D1
DE69202164D1 DE69202164T DE69202164T DE69202164D1 DE 69202164 D1 DE69202164 D1 DE 69202164D1 DE 69202164 T DE69202164 T DE 69202164T DE 69202164 T DE69202164 T DE 69202164T DE 69202164 D1 DE69202164 D1 DE 69202164D1
Authority
DE
Germany
Prior art keywords
stabilization
thiol compositions
thiol
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69202164T
Other languages
English (en)
Other versions
DE69202164T2 (de
Inventor
David M Glaser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel Loctite Corp
Original Assignee
Henkel Loctite Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/651,271 external-priority patent/US5167882A/en
Application filed by Henkel Loctite Corp filed Critical Henkel Loctite Corp
Application granted granted Critical
Publication of DE69202164D1 publication Critical patent/DE69202164D1/de
Publication of DE69202164T2 publication Critical patent/DE69202164T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69202164T 1991-02-05 1992-02-04 Stabilisierung von Thiolenzusammensetzungen. Expired - Fee Related DE69202164T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/651,271 US5167882A (en) 1990-12-21 1991-02-05 Stereolithography method
US07/746,649 US5208281A (en) 1991-02-05 1991-08-16 Stabilization of thiolene compositions

Publications (2)

Publication Number Publication Date
DE69202164D1 true DE69202164D1 (de) 1995-06-01
DE69202164T2 DE69202164T2 (de) 1995-11-23

Family

ID=27096034

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69202164T Expired - Fee Related DE69202164T2 (de) 1991-02-05 1992-02-04 Stabilisierung von Thiolenzusammensetzungen.

Country Status (9)

Country Link
US (1) US5208281A (de)
EP (1) EP0498618B1 (de)
JP (1) JPH05155987A (de)
KR (1) KR100215272B1 (de)
BR (1) BR9200323A (de)
CA (1) CA2060521A1 (de)
DE (1) DE69202164T2 (de)
ES (1) ES2072092T3 (de)
HK (1) HK1005473A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0428342B1 (de) * 1989-11-13 1997-01-15 LOCTITE (IRELAND) Ltd. Stabile Thiol/ene-Zusammensetzungen
US5459175A (en) * 1990-11-28 1995-10-17 Loctite Corporation Optical fiber primary coatings and fibers coated therewith
US5371181A (en) * 1990-11-28 1994-12-06 Loctite Corporation Thiol-ene compositions with improved cure speed retention
US5399624A (en) * 1990-12-21 1995-03-21 Loctite Corporation High purity resins for thiol-ene polymerizations and method for producing same
US5459173A (en) * 1993-06-22 1995-10-17 Loctite Corporation Stabilizer system for thiol-ene and thiol-nene compositions
JPH1060114A (ja) * 1996-05-28 1998-03-03 Loctite Ireland Ltd 鉄化合物を用いるポリチオールおよびポリエンの貯蔵−安定性の１パーツ系空気活性化される配合組成物
US5744514A (en) * 1996-10-31 1998-04-28 Borden Chemical, Inc. Coated optical fibers having a reduced content of extractable and volatile material
JPH11184084A (ja) 1997-12-22 1999-07-09 Brother Ind Ltd 速硬化性感光性組成物及び記録用シート
EP1477511A1 (de) * 2003-05-15 2004-11-17 DSM IP Assets B.V. Strahlungshärtbare Thiol-ene-Zusammensetzung
WO2006126415A1 (ja) * 2005-05-24 2006-11-30 Tosoh Corporation 含硫黄環状オレフィン樹脂およびその製造方法
US9243083B2 (en) 2008-04-03 2016-01-26 Henkel IP & Holding GmbH Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications
WO2013008509A1 (ja) * 2011-07-13 2013-01-17 東ソー有機化学株式会社 アリルブロミド化合物の安定化方法、及び安定化されたアリルブロミド化合物組成物
TWI593755B (zh) 2012-10-18 2017-08-01 Mitsubishi Gas Chemical Co Polymerizable composition and hardened | cured material
WO2015036421A1 (en) * 2013-09-13 2015-03-19 Basf Se Scratch-resistant radiation-cured coatings
EP2878613B1 (de) * 2013-12-02 2016-09-14 Allnex Belgium, S.A. Stabilisator für Thiolenzusammensetzungen
KR20170086566A (ko) 2014-11-17 2017-07-26 쓰리엠 이노베이티브 프로퍼티즈 캄파니 티올-알켄 매트릭스를 갖는 양자점 물품
KR20170137882A (ko) 2015-04-16 2017-12-13 쓰리엠 이노베이티브 프로퍼티즈 캄파니 티올-에폭시 매트릭스를 갖는 양자점 물품
WO2016168048A1 (en) 2015-04-16 2016-10-20 3M Innovative Properties Company Quantum dot article with thiol-alkene-epoxy matrix
CN108431172B (zh) 2015-12-31 2021-04-13 3M创新有限公司 包含具有量子点的颗粒的制品
CN108473861A (zh) 2015-12-31 2018-08-31 3M创新有限公司 可固化量子点组合物和制品
WO2018051269A1 (en) 2016-09-19 2018-03-22 3M Innovative Properties Company Fluorescent nanoparticles stabilized with a functional aminosilicone

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661744A (en) * 1966-07-26 1972-05-09 Grace W R & Co Photocurable liquid polyene-polythiol polymer compositions
US3582521A (en) * 1970-05-27 1971-06-01 Thiokol Chemical Corp Halogen adduct of ethylene sulfide
JPS5729692B2 (de) * 1974-09-17 1982-06-24
JPS5314800A (en) * 1976-07-28 1978-02-09 Showa Highpolymer Co Ltd Curable resin composition
US4157421A (en) * 1976-09-07 1979-06-05 Thiokol Corporation Photocurable compositions comprising a polythiol and a polyene derived from a vinyl acetal
US4230740A (en) * 1979-04-23 1980-10-28 W. R. Grace & Co. Heat stable, non-yellowing photopolymer compositions
IE60271B1 (en) * 1986-01-07 1994-06-29 Loctite Ireland Ltd "Thiol/ene compositions"
US4808638A (en) * 1986-10-14 1989-02-28 Loctite Corporation Thiolene compositions on based bicyclic 'ene compounds
WO1988002902A2 (en) * 1986-10-14 1988-04-21 Loctite Corporation Thiolene compositions based on bicyclic 'ene compounds
US5034490A (en) * 1986-10-14 1991-07-23 Loctite Corporation Curable norbornenyl functional silicone formulations
JPS63260971A (ja) * 1987-04-20 1988-10-27 Hitachi Chem Co Ltd 放射線硬化型粘着剤組成物

Also Published As

Publication number Publication date
JPH05155987A (ja) 1993-06-22
HK1005473A1 (en) 1999-01-08
EP0498618B1 (de) 1995-04-26
DE69202164T2 (de) 1995-11-23
ES2072092T3 (es) 1995-07-01
BR9200323A (pt) 1992-10-13
EP0498618A1 (de) 1992-08-12
KR920016508A (ko) 1992-09-24
US5208281A (en) 1993-05-04
KR100215272B1 (ko) 1999-08-16
CA2060521A1 (en) 1992-08-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee