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DE69023625D1 - Halbleitervorrichtung. - Google Patents

Halbleitervorrichtung.

Info

Publication number
DE69023625D1
DE69023625D1 DE69023625T DE69023625T DE69023625D1 DE 69023625 D1 DE69023625 D1 DE 69023625D1 DE 69023625 T DE69023625 T DE 69023625T DE 69023625 T DE69023625 T DE 69023625T DE 69023625 D1 DE69023625 D1 DE 69023625D1
Authority
DE
Germany
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69023625T
Other languages
English (en)
Other versions
DE69023625T2 (de
Inventor
John Alfred George Slatter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Publication of DE69023625D1 publication Critical patent/DE69023625D1/de
Application granted granted Critical
Publication of DE69023625T2 publication Critical patent/DE69023625T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/24Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only two potential barriers, e.g. bipolar phototransistors
    • H10F30/245Bipolar phototransistors
DE69023625T 1990-01-10 1990-12-18 Halbleitervorrichtung. Expired - Fee Related DE69023625T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9000531A GB2239986A (en) 1990-01-10 1990-01-10 A semiconductor device with increased breakdown voltage

Publications (2)

Publication Number Publication Date
DE69023625D1 true DE69023625D1 (de) 1995-12-21
DE69023625T2 DE69023625T2 (de) 1996-06-20

Family

ID=10669068

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69023625T Expired - Fee Related DE69023625T2 (de) 1990-01-10 1990-12-18 Halbleitervorrichtung.

Country Status (5)

Country Link
US (1) US5083176A (de)
EP (1) EP0436988B1 (de)
JP (1) JPH0793314B2 (de)
DE (1) DE69023625T2 (de)
GB (1) GB2239986A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0571027A1 (de) * 1992-05-21 1993-11-24 Koninklijke Philips Electronics N.V. Halbleiteranordnung, die einen lateralen DMOS-Transistor mit die Durchbruchspannung anhebenden Zonen und Vorkehrungen für den Ladungsaustausch mit dem Backgate-Gebiet enthält
ATE159126T1 (de) * 1992-07-20 1997-10-15 Koninkl Philips Electronics Nv Halbleiteranordnung für hohe spannungen
US5677562A (en) * 1996-05-14 1997-10-14 General Instrument Corporation Of Delaware Planar P-N junction semiconductor structure with multilayer passivation

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3936863A (en) * 1974-09-09 1976-02-03 Rca Corporation Integrated power transistor with ballasting resistance and breakdown protection
NL8005995A (nl) * 1980-11-03 1982-06-01 Philips Nv Halfgeleiderinrichting.
JPS60138963A (ja) * 1983-12-27 1985-07-23 Fuji Electric Co Ltd 半導体装置
JPH0646655B2 (ja) * 1985-04-01 1994-06-15 キヤノン株式会社 固体撮像装置
JPS6273680A (ja) * 1985-09-26 1987-04-04 Nec Corp ホト・トランジスタ
GB2201543A (en) * 1987-02-25 1988-09-01 Philips Electronic Associated A photosensitive device

Also Published As

Publication number Publication date
GB2239986A (en) 1991-07-17
EP0436988A3 (en) 1993-03-03
US5083176A (en) 1992-01-21
EP0436988B1 (de) 1995-11-15
DE69023625T2 (de) 1996-06-20
GB9000531D0 (en) 1990-03-14
EP0436988A2 (de) 1991-07-17
JPH0793314B2 (ja) 1995-10-09
JPH04211133A (ja) 1992-08-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee
8327 Change in the person/name/address of the patent owner

Owner name: NXP B.V., EINDHOVEN, NL