[go: up one dir, main page]

DE68926516D1 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE68926516D1
DE68926516D1 DE68926516T DE68926516T DE68926516D1 DE 68926516 D1 DE68926516 D1 DE 68926516D1 DE 68926516 T DE68926516 T DE 68926516T DE 68926516 T DE68926516 T DE 68926516T DE 68926516 D1 DE68926516 D1 DE 68926516D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68926516T
Other languages
English (en)
Other versions
DE68926516T2 (de
Inventor
Kaitaro Aoshima
Akira Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE68926516D1 publication Critical patent/DE68926516D1/de
Application granted granted Critical
Publication of DE68926516T2 publication Critical patent/DE68926516T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE68926516T 1988-02-25 1989-02-27 Lichtempfindliche Zusammensetzung Expired - Lifetime DE68926516T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4263188 1988-02-25
JP63270087A JPH0769605B2 (ja) 1988-02-25 1988-10-26 感光性組成物

Publications (2)

Publication Number Publication Date
DE68926516D1 true DE68926516D1 (de) 1996-06-27
DE68926516T2 DE68926516T2 (de) 1996-09-26

Family

ID=26382350

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68926516T Expired - Lifetime DE68926516T2 (de) 1988-02-25 1989-02-27 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5141838A (de)
EP (1) EP0330239B1 (de)
JP (1) JPH0769605B2 (de)
DE (1) DE68926516T2 (de)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2522693B2 (ja) * 1988-12-08 1996-08-07 富士写真フイルム株式会社 感光性組成物
JP2930310B2 (ja) * 1988-12-21 1999-08-03 富士写真フイルム株式会社 感光性平版印刷版
US5178989A (en) * 1989-07-21 1993-01-12 Board Of Regents, The University Of Texas System Pattern forming and transferring processes
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
GB9105750D0 (en) * 1991-03-19 1991-05-01 Minnesota Mining & Mfg Speed stabilised positive-acting photoresist compositions
JPH05150453A (ja) * 1991-11-27 1993-06-18 Fuji Photo Film Co Ltd 感光性組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US5206348A (en) * 1992-07-23 1993-04-27 Morton International, Inc. Hexahydroxybenzophenone sulfonate esters of diazonaphthoquinone sensitizers and positive photoresists employing same
DE4242050A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung
JP3393919B2 (ja) * 1993-06-15 2003-04-07 住友化学工業株式会社 カラーフィルター形成用ポジ型レジスト組成物
JP3281714B2 (ja) * 1994-03-10 2002-05-13 富士写真フイルム株式会社 リード・フレーム形成材料
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
DE19507618A1 (de) * 1995-03-04 1996-09-05 Hoechst Ag Polymere und diese enthaltendes lichtempfindliches Gemisch
US5656412A (en) * 1995-03-07 1997-08-12 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
JP3779444B2 (ja) * 1997-07-28 2006-05-31 富士写真フイルム株式会社 赤外線レーザ用ポジ型感光性組成物
US6132929A (en) * 1997-10-08 2000-10-17 Fuji Photo Film Co., Ltd. Positive type photosensitive composition for infrared lasers
DE69815622T2 (de) 1997-10-17 2004-04-29 Fuji Photo Film Co., Ltd., Fujinomiya Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser
DE19803564A1 (de) 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
DE69905959T2 (de) 1998-04-06 2003-12-04 Fuji Photo Film Co., Ltd. Lichtempfindliche Harzzusammensetzung
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6294311B1 (en) * 1999-12-22 2001-09-25 Kodak Polychrome Graphics Llc Lithographic printing plate having high chemical resistance
JP2001281856A (ja) * 2000-01-24 2001-10-10 Fuji Photo Film Co Ltd 赤外線感応性画像形成材料
ATE307025T1 (de) 2000-03-01 2005-11-15 Fuji Photo Film Co Ltd Bildaufzeichnungsmaterial
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
US6555291B1 (en) 2000-08-14 2003-04-29 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6660445B2 (en) * 2000-10-13 2003-12-09 Fuji Photo Film Co., Ltd. Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
US6376140B1 (en) 2000-11-03 2002-04-23 Kodak Polychrome Graphics Llc Electrostatically imaged printing plate and method of preparation
US6541188B2 (en) 2001-05-11 2003-04-01 Kodak Polychrome Graphics Llc Developer for alkaline-developable lithographic printing plates
US6699636B2 (en) 2001-12-12 2004-03-02 Kodak Polychrome Graphics Llc Imaging element comprising a thermally activated crosslinking agent
US6675710B2 (en) 2001-12-21 2004-01-13 Kodak Polychrome Graphics Llc Method of preparation of electrostatically imaged printing plates
JP2003241399A (ja) 2002-02-20 2003-08-27 Fuji Photo Film Co Ltd 平版印刷版の製版方法
JP4095821B2 (ja) 2002-04-22 2008-06-04 富士フイルム株式会社 感光性平版印刷版
US20040023160A1 (en) * 2002-07-30 2004-02-05 Kevin Ray Method of manufacturing imaging compositions
US6849372B2 (en) * 2002-07-30 2005-02-01 Kodak Polychrome Graphics Method of manufacturing imaging compositions
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
US6858359B2 (en) 2002-10-04 2005-02-22 Kodak Polychrome Graphics, Llp Thermally sensitive, multilayer imageable element
US7067103B2 (en) 2003-03-28 2006-06-27 Headwaters Nanokinetix, Inc. Direct hydrogen peroxide production using staged hydrogen addition
US7569508B2 (en) 2004-11-17 2009-08-04 Headwaters Technology Innovation, Llc Reforming nanocatalysts and method of making and using such catalysts
US7045479B2 (en) 2003-07-14 2006-05-16 Headwaters Nanokinetix, Inc. Intermediate precursor compositions used to make supported catalysts having a controlled coordination structure and methods for preparing such compositions
US7011807B2 (en) 2003-07-14 2006-03-14 Headwaters Nanokinetix, Inc. Supported catalysts having a controlled coordination structure and methods for preparing such catalysts
US7144565B2 (en) 2003-07-29 2006-12-05 Headwaters Nanokinetix, Inc. Process for direct catalytic hydrogen peroxide production
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
US7166418B2 (en) * 2003-09-03 2007-01-23 Matsushita Electric Industrial Co., Ltd. Sulfonamide compound, polymer compound, resist material and pattern formation method
US7169530B2 (en) * 2003-10-02 2007-01-30 Matsushita Electric Industrial Co., Ltd. Polymer compound, resist material and pattern formation method
JP3978215B2 (ja) 2004-05-25 2007-09-19 松下電器産業株式会社 レジスト材料及びパターン形成方法
JP4410714B2 (ja) 2004-08-13 2010-02-03 富士フイルム株式会社 平版印刷版用支持体の製造方法
JP4499507B2 (ja) 2004-08-23 2010-07-07 コダック株式会社 平版印刷版原版
US7632775B2 (en) 2004-11-17 2009-12-15 Headwaters Technology Innovation, Llc Multicomponent nanoparticles formed using a dispersing agent
JP4474309B2 (ja) 2005-03-22 2010-06-02 富士フイルム株式会社 平版印刷版原版及びその作製方法
EP1712368B1 (de) 2005-04-13 2008-05-14 FUJIFILM Corporation Verfahren zur Herstellung eines Flachdruckplattenträgers
US7396795B2 (en) 2005-08-31 2008-07-08 Headwaters Technology Innovation, Llc Low temperature preparation of supported nanoparticle catalysts having increased dispersion
EP1826022B1 (de) * 2006-02-28 2008-11-26 Agfa Graphics N.V. Verfahren zur Herstellung eines lithographischen Druckplattenträgers
US7541309B2 (en) 2006-05-16 2009-06-02 Headwaters Technology Innovation, Llc Reforming nanocatalysts and methods of making and using such catalysts
DE602006009919D1 (de) * 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
US7563742B2 (en) 2006-09-22 2009-07-21 Headwaters Technology Innovation, Llc Supported nickel catalysts having high nickel loading and high metal dispersion and methods of making same
EP1972460B1 (de) * 2007-03-19 2009-09-02 Agfa Graphics N.V. Verfahren zur Herstellung eines lithographischen Druckplattenträgers
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
DE602007006822D1 (de) 2007-11-30 2010-07-08 Agfa Graphics Nv Verfahren zur Behandlung einer Lithografiedruckplatte
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
JP2009208140A (ja) 2008-03-06 2009-09-17 Fujifilm Corp 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体
ES2365885T3 (es) * 2008-03-31 2011-10-13 Agfa Graphics N.V. Un método para tratar una plancha de impresión litográfica.
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
EP2213690B1 (de) 2009-01-30 2015-11-11 Agfa Graphics N.V. Neues alkalisches lösliches harz
EP2284005B1 (de) 2009-08-10 2012-05-02 Eastman Kodak Company Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
US8980750B2 (en) * 2012-07-06 2015-03-17 Basf Se Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt
EP2941349B1 (de) 2013-01-01 2017-07-19 AGFA Graphics NV (ethylen-,vinylacetal-)copolymere und ihre verwendung in lithographiedruckplattenvorläufern
EP2933278B1 (de) 2014-04-17 2018-08-22 Agfa Nv (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (de) 2014-06-30 2017-04-05 Agfa Graphics NV Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren
EP3032334B1 (de) 2014-12-08 2017-10-18 Agfa Graphics Nv System zur Reduzierung von Ablationsrückständen
EP3130465B1 (de) 2015-08-12 2020-05-13 Agfa Nv Wärmeempfindlicher lithografiedruckplattenvorläufer
EP3170662B1 (de) 2015-11-20 2019-08-14 Agfa Nv Flachdruckplattenvorläufer
BR112018068709A2 (pt) 2016-03-16 2019-01-15 Agfa Nv método para processar uma chapa de impressão litográfica
EP3637188A1 (de) 2018-10-08 2020-04-15 Agfa Nv Sprudelnder entwicklervorläufer zur verarbeitung eines lithografischen druckplattenvorläufers
EP3778253A1 (de) 2019-08-13 2021-02-17 Agfa Nv Verfahren zur verarbeitung einer lithografiedruckplatte
EP4382306A1 (de) 2022-12-08 2024-06-12 Eco3 Bv Make-ready-verfahren für eine lithographische druckmaschine

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3422075A (en) * 1966-07-01 1969-01-14 Polaroid Corp Polymers modified with a monosulfonyl isocyanate
DE2027466A1 (de) * 1970-06-04 1971-12-09 Kalle Ag Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung
JPS55121447A (en) * 1979-03-15 1980-09-18 Fuji Photo Film Co Ltd Lithographic printing plate correcting agent
US4335254A (en) * 1979-03-21 1982-06-15 Eastman Kodak Company Polymerizable acryloyloxyarylenesulfonamides
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US4885232A (en) * 1985-03-11 1989-12-05 Hoechst Celanese Corporation High temperature post exposure baking treatment for positive photoresist compositions
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer
JPH06105355B2 (ja) * 1986-12-15 1994-12-21 富士写真フイルム株式会社 感光性組成物
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
US4865950A (en) * 1988-01-21 1989-09-12 Eastman Kodak Co. Laminate for the formation of beam leads for IC chip bonding featuring improved positive-working resist

Also Published As

Publication number Publication date
US5141838A (en) 1992-08-25
EP0330239B1 (de) 1996-05-22
EP0330239A3 (en) 1990-11-28
JPH02866A (ja) 1990-01-05
DE68926516T2 (de) 1996-09-26
JPH0769605B2 (ja) 1995-07-31
EP0330239A2 (de) 1989-08-30

Similar Documents

Publication Publication Date Title
DE68926516D1 (de) Lichtempfindliche Zusammensetzung
DE68921146D1 (de) Lichtempfindliche Zusammensetzung.
BR8905204A (pt) Composicao colutoria
DE68921019D1 (de) Lichtempfindliche Zusammensetzungen.
DK55889A (da) Substituerede pyrroler
ES2012750A4 (es) Conjunto recipiente-aplicador
DE69014913D1 (de) Lichtempfindliche Zusammensetzung.
DE69302650D1 (de) Lichtempfindliche Zusammensetzung
DE68927140D1 (de) Photolackzusammensetzung
DE69226920D1 (de) Lichtempfindliche Zusammensetzung
DE68926401D1 (de) Lichtempfindliches Material
ATA172889A (de) Furanderivate
DE69027263D1 (de) Tonerzusammensetzung
DE69031785D1 (de) Lichtempfindliche Zusammensetzung
BR8906787A (pt) Composicao
KR900007237A (ko) 투영장치
DE69032715D1 (de) Lichtempfindliche Zusammensetzung
DE68924246D1 (de) Tonerzusammensetzung.
DE69030484D1 (de) Fotoempfindliche Harzzusammensetzung
KR900006817A (ko) 레지스트 조성물
DE69219747D1 (de) Lichtempfindliche Zusammensetzung
DE69029222D1 (de) Lichtempfindliche Zusammensetzung
DE68926993D1 (de) Toner
BR8902491A (pt) Composicao
KR910700486A (ko) 현상액

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP