DE68926373D1 - Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur - Google Patents

Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur

Info

Publication number: DE68926373D1
Authority: DE; Germany
Prior art keywords: producing; mask structure; ray mask; ray; mask
Prior art date: 1988-09-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE68926373T

Other languages

English (en)

Other versions

DE68926373T2 (de

Inventor

Takeshi Miyachi

Yasuaki Fukuda

Keiko Chiba

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-09-30

Filing date

1989-09-29

Publication date

1996-06-05

1988-09-30 Priority claimed from JP63243916A external-priority patent/JPH0294426A/ja

1988-09-30 Priority claimed from JP63243912A external-priority patent/JPH0294423A/ja

1988-09-30 Priority claimed from JP63243918A external-priority patent/JPH0294428A/ja

1989-08-31 Priority claimed from JP1223276A external-priority patent/JPH0388319A/ja

1989-09-29 Application filed by Canon Inc filed Critical Canon Inc

1996-06-05 Publication of DE68926373D1 publication Critical patent/DE68926373D1/de

1996-09-26 Application granted granted Critical

1996-09-26 Publication of DE68926373T2 publication Critical patent/DE68926373T2/de

2009-09-30 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

DE68926373T 1988-09-30 1989-09-29 Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur Expired - Fee Related DE68926373T2 (de)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP63243916A JPH0294426A (ja)	1988-09-30	1988-09-30	Ｘ線マスク構造体及びその製造方法
JP63243912A JPH0294423A (ja)	1988-09-30	1988-09-30	Ｘ線マスク構造体
JP63243918A JPH0294428A (ja)	1988-09-30	1988-09-30	Ｘ線マスク構造体
JP1223276A JPH0388319A (ja)	1989-08-31	1989-08-31	Ｘ線マスク構造体の製造方法

Publications (2)

Publication Number	Publication Date
DE68926373D1 true DE68926373D1 (de)	1996-06-05
DE68926373T2 DE68926373T2 (de)	1996-09-26

Family

ID=27477071

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE68926373T Expired - Fee Related DE68926373T2 (de)	1988-09-30	1989-09-29	Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur

Country Status (3)

Country	Link
US (1)	US5656398A (de)
EP (1)	EP0361516B1 (de)
DE (1)	DE68926373T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0715880B2 (ja) *	1989-12-26	1995-02-22	信越化学工業株式会社	Ｘ線リソグラフィー用ＳｉＣ膜、その製造方法およびＸ線リソグラフィー用マスク
JP4252262B2 (ja) *	2002-07-11	2009-04-08	株式会社オクテック	露光用転写マスクの製造方法
US8377859B2 (en) *	2007-07-25	2013-02-19	Exxonmobil Research And Engineering Company	Hydrocarbon fluids with improved pour point
DE102008037387A1 (de) *	2008-09-24	2010-03-25	Aixtron Ag	Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske
US20140165906A1 (en) *	2012-12-13	2014-06-19	Varian Semiconductor Equipment Associates, Inc.	Magnetic masks for an ion implant apparatus

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3927943A (en) *	1974-07-01	1975-12-23	Bell Telephone Labor Inc	Mask alignment method
JPS5315256A (en) *	1976-07-28	1978-02-10	Sumitomo Light Metal Ind	Method of fabricating expanding material
US4522842A (en) *	1982-09-09	1985-06-11	At&T Bell Laboratories	Boron nitride X-ray masks with controlled stress
JPS6068340A (ja) *	1983-09-26	1985-04-18	Canon Inc	Ｘ線リソグラフィー用マスク構造体の保持方法
US4833051A (en) *	1984-08-20	1989-05-23	Nippon Kogaku K.K.	Protective device for photographic masks
CN1007847B (zh) *	1984-12-24	1990-05-02	住友特殊金属株式会社	制造具有改进耐蚀性磁铁的方法
US4963921A (en) *	1985-06-24	1990-10-16	Canon Kabushiki Kaisha	Device for holding a mask
DE3620970A1 (de) *	1985-06-24	1987-01-08	Canon Kk	Maskenhaltevorrichtung
US4735877A (en) *	1985-10-07	1988-04-05	Canon Kabushiki Kaisha	Lithographic mask structure and lithographic process
JPS62249066A (ja) *	1986-04-22	1987-10-30	Eruma:Kk	血液検査用校正液
JPS62260335A (ja) *	1986-05-06	1987-11-12	Hitachi Ltd	パタ−ン検査方法および装置
EP0248665B1 (de) *	1986-06-06	1994-05-18	Seiko Instruments Inc.	Seltene Erden-Eisenmagnet und Herstellungsverfahren
JPH0732113B2 (ja) *	1986-06-12	1995-04-10	日本電信電話株式会社	Ｘ線マスクの製法及びｘ線マスク製造用基板
JPS6351633A (ja) *	1986-08-20	1988-03-04	Nec Corp	Ｘ線露光マスク
JPH0746681B2 (ja) *	1986-10-28	1995-05-17	富士通株式会社	Ｘ線ステッパー用マスクの製造方法
JPS63210845A (ja) *	1987-02-27	1988-09-01	Hitachi Ltd	欠陥修正方法
AT392857B (de) *	1987-07-13	1991-06-25	Ims Ionen Mikrofab Syst	Vorrichtung und verfahren zur inspektion einer maske
JPH02310395A (ja) *	1989-05-26	1990-12-26	Johoku Riken Kogyo:Kk	ネオジウム―鉄―ボロン系焼結磁石の防食方法

1989
- 1989-09-29 EP EP89118070A patent/EP0361516B1/de not_active Expired - Lifetime
- 1989-09-29 DE DE68926373T patent/DE68926373T2/de not_active Expired - Fee Related
1995
- 1995-06-07 US US08/479,358 patent/US5656398A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US5656398A (en)	1997-08-12
EP0361516A2 (de)	1990-04-04
EP0361516A3 (de)	1991-05-02
DE68926373T2 (de)	1996-09-26
EP0361516B1 (de)	1996-05-01

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Legal Events

Date	Code	Title	Description
1997-05-28	8364	No opposition during term of opposition
1999-05-06	8328	Change in the person/name/address of the agent	Free format text: WESER & KOLLEGEN, 81245 MUENCHEN
2006-07-13	8339	Ceased/non-payment of the annual fee